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公开(公告)号：US20240375343A1
公开(公告)日：2024-11-14
申请号：US18783962
申请日：2024-07-25
Applicant: Magic Leap, Inc.
Inventor： Roy Patterson , Charles Scott Carden , Satish Sadam , Ryan Christiansen , Matthew S. Shafran , Christopher John Fleckenstein , Vikramjit Singh , Michael Nevin Miller , Kang LUO
IPC: B29C59/04 , B29C43/22 , B29C43/28 , B29C43/30 , B29C43/34 , B29C43/48 , B29C43/50 , B29C43/52 , B29C43/58 , B29C51/26 , G03F7/00
Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.
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公开(公告)号：US11679533B2
公开(公告)日：2023-06-20
申请号：US17200239
申请日：2021-03-12
Applicant: Magic Leap, Inc.
Inventor： Jeremy Lee Sevier , Matthew S. Shafran , Satish Sadam , Roy Matthew Patterson , Kangkang Wang , Chieh Chang , Charles Scott Carden
CPC classification number: B29C39/44 , B29C39/10 , B29C71/04 , B29L2011/0066
Abstract: In an example method of forming an optical film for an eyepiece, a curable material is dispensed into a space between a first and a second mold surface. A position of the first mold surface relative to the second mold surface is measured using a plurality of sensors. Each sensor measures a respective relative distance along a respective measurement axis between a respective point on a planar portion of the first mold surface and a respective point on a planar portion of the second mold surface. The measurement axes are parallel to each other, and the points define corresponding triangles on the first and second mold surfaces, respectively. The position of the first mold surface is adjusted relative to the second mold surface based on the measured position, and the curable material is cured to form the optical film.
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公开(公告)号：US12204258B2
公开(公告)日：2025-01-21
申请号：US18014327
申请日：2021-08-06
Applicant: Magic Leap, Inc.
Inventor： Jeremy Lee Sevier , Satish Sadam , Joseph Michael Imhof , Kang Luo , Kangkang Wang , Roy Matthew Patterson , Qizhen Xue , Brett William Best , Charles Scott Carden , Matthew S. Shafran , Michael Nevin Miller
Abstract: Systems and methods for managing multi-objective alignments in imprinting (e.g., single-sided or double-sided) are provided. An example system includes rollers for moving a template roll, a stage for holding a substrate, a dispenser for dispensing resist on the substrate, a light source for curing the resist to form an imprint on the substrate when a template of the template roll is pressed into the resist on the substrate, a first inspection system for registering a fiducial mark of the template to determine a template offset, a second inspection system for registering the imprint on the substrate to determine a wafer registration offset between a target location and an actual location of the imprint, and a controller for controlling to move the substrate with the resist below the template based on the template offset, and determine an overlay bias of the imprint on the substrate based on the wafer registration offset.
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公开(公告)号：US12083733B2
公开(公告)日：2024-09-10
申请号：US17938550
申请日：2022-10-06
Applicant: Magic Leap, Inc.
Inventor： Roy Patterson , Charles Scott Carden , Satish Sadam , Ryan Christiansen , Matthew S. Shafran , Christopher John Fleckenstein , Vikramjit Singh , Michael Nevin Miller , Kang Luo
IPC: B29C59/04 , B29C43/22 , B29C43/28 , B29C43/30 , B29C43/34 , B29C43/48 , B29C43/50 , B29C43/52 , B29C43/58 , B29C51/26 , G03F7/00
CPC classification number: B29C59/04 , B29C43/222 , B29C43/28 , B29C43/305 , B29C43/34 , B29C43/48 , B29C43/50 , B29C43/52 , B29C43/58 , B29C51/262 , G03F7/0002 , B29C2043/3433
Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.
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公开(公告)号：US20180339437A1
公开(公告)日：2018-11-29
申请号：US15990155
申请日：2018-05-25
Applicant: Magic Leap, Inc.
Inventor： Roy Patterson , Charles Scott Carden , Satish Sadam , Ryan Christiansen , Matthew S. Shafran , Christopher John Fleckenstein , Vikramjit Singh , Michael Nevin Miller , Kang Luo
IPC: B29C43/30 , B29C43/58 , G03F7/00 , B29C43/22 , B29C43/28 , B29C43/52 , B29C43/34 , B29C43/48 , B29C43/50
Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.
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Patent Agency Ranking
公开(公告)号：US20240329282A1
公开(公告)日：2024-10-03
申请号：US18740415
申请日：2024-06-11
Applicant: Magic Leap, Inc.
Inventor： Ling Li , Chieh Chang , Sharad D. Bhagat , Christophe Peroz , Brian George Hill , Roy Matthew Patterson , Satish Sadam
CPC classification number: G02B3/0062 , B29C39/026 , G02B27/4272
Abstract: A system includes a first chuck operable to support a stencil including a plurality of apertures, a wafer chuck operable to support and move a wafer including a plurality of incoupling gratings, a first light source operable to direct light to impinge on a first surface of the stencil, and one or more second light sources operable to direct light to impinge on the wafer. The system also includes one or more lens and camera assemblies operable to receive light from the first light source passing through the plurality of apertures in the stencil and receive light from the one or more second light sources diffracted from the plurality of incoupling gratings in the wafer. The system also includes an alignment system operable to move the wafer with respect to the stencil to reduce an offset between aperture locations and incoupling grating locations.
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公开(公告)号：US20230036098A1
公开(公告)日：2023-02-02
申请号：US17938550
申请日：2022-10-06
Applicant: Magic Leap, Inc.
Inventor： Roy Patterson , Charles Scott Carden , Satish Sadam , Ryan Christiansen , Matthew S. Shafran , Christopher John Fleckenstein , Vikramjit Singh , Michael Nevin Miller , Kang LUO
IPC: B29C59/04 , B29C51/26 , B29C43/22 , B29C43/28 , B29C43/30 , B29C43/34 , B29C43/48 , B29C43/50 , B29C43/52 , B29C43/58 , G03F7/00
Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.
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公开(公告)号：US20210170668A1
公开(公告)日：2021-06-10
申请号：US17153774
申请日：2021-01-20
Applicant: Magic Leap, Inc.
Inventor： Roy Patterson , Charles Scott Carden , Satish Sadam , Ryan Christiansen , Matthew S. Shafran , Christopher John Fleckenstein , Vikramjit Singh , Michael Nevin Miller , Kang Luo
IPC: B29C59/04 , B29C43/34 , B29C43/30 , B29C43/58 , G03F7/00 , B29C43/28 , B29C43/22 , B29C43/52 , B29C43/48 , B29C43/50
Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.
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公开(公告)号：US20250102928A1
公开(公告)日：2025-03-27
申请号：US18975299
申请日：2024-12-10
Applicant: Magic Leap, Inc.
Inventor： Jeremy Lee Sevier , Satish Sadam , Joseph Michael Imhof , Kang LUO , Kangkang Wang , Roy Matthew Patterson , Qizhen XUE , Brett William Best , Charles Scott Carden , Matthew S. Shafran , Michael Nevin MILLER
Abstract: Systems and methods for managing multi-objective alignments in imprinting (e.g., single-sided or double-sided) are provided. An example system includes rollers for moving a template roll, a stage for holding a substrate, a dispenser for dispensing resist on the substrate, a light source for curing the resist to form an imprint on the substrate when a template of the template roll is pressed into the resist on the substrate, a first inspection system for registering a fiducial mark of the template to determine a template offset, a second inspection system for registering the imprint on the substrate to determine a wafer registration offset between a target location and an actual location of the imprint, and a controller for controlling to move the substrate with the resist below the template based on the template offset, and determine an overlay bias of the imprint on the substrate based on the wafer registration offset.
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公开(公告)号：US12038591B2
公开(公告)日：2024-07-16
申请号：US16909760
申请日：2020-06-23
Applicant: Magic Leap, Inc.
Inventor： Ling Li , Chieh Chang , Sharad D. Bhagat , Christophe Peroz , Brian George Hill , Roy Matthew Patterson , Satish Sadam
CPC classification number: G02B3/0062 , B29C39/026 , G02B27/4272
Abstract: A method of aligning a stencil to an eyepiece wafer includes providing the stencil, positioning the stencil with respect to a first light source, and determining locations of at least two stencil apertures. The method also includes providing the eyepiece wafer. The eyepiece wafer includes at least two eyepiece waveguides, each eyepiece waveguide including an incoupling grating and a corresponding diffraction pattern. The method further includes directing light from one or more second light sources to impinge on each of the corresponding diffraction patterns, imaging light diffracted from each incoupling grating, determining at least two incoupling grating locations, determining offsets between corresponding stencil aperture locations and incoupling grating locations, and aligning the stencil to the eyepiece wafer based on the determined offsets.
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