-
1.发明申请公开(公告)号：US20140228488A1
公开(公告)日：2014-08-14
申请号：US14343923
申请日：2012-09-06
CPC分类号： C09J179/04 , C08G59/26 , C08G59/3236 , C08G73/06 , C08G73/0633 , C08G73/0638 , C08G73/0677 , C08K5/04 , C08K5/07 , C09D11/10 , C09D11/102 , C09J11/06 , C09J163/00 , G03F7/09 , G03F7/094 , G03F7/11 , H01L21/02118 , H01L21/02282 , H01L23/293 , H01L2924/0002 , H01L2924/00
摘要： There is provided a novel polymer, a composition containing the polymer, and a novel adhesive composition containing the polymer from which a cured film having desired properties is obtained. A polymer comprising a structural unit of Formula (1): wherein Q is a bivalent group, R1 is a C1-10 alkylene group, a C2-10 alkenylene group or C2-10 alkynylene group, a C6-14 arylene group, a C4-10 cyclic alkylene group, etc., or a polymer comprising a structural unit of Formula (6): wherein Q4 is an allyl group, a vinyl group, an epoxy group, or a glycidyl group, and R5 is a bivalent organic group having a main chain containing only carbon atom or at least one of oxygen atom, nitrogen atom and sulfur atom in addition to carbon atom, a composition comprising the polymer, and an adhesive composition comprising the polymer and a solvent.
摘要翻译： 提供了一种新型聚合物，含有该聚合物的组合物，以及含有聚合物的新型粘合剂组合物，由此得到具有所需性能的固化膜。 一种包含式（1）的结构单元的聚合物：其中Q是二价基团，R1是C1-10亚烷基，C2-10亚烯基或C2-10亚炔基，C6-14亚芳基，C4 -10环状亚烷基等，或包含式（6）的结构单元的聚合物：其中Q4是烯丙基，乙烯基，环氧基或缩水甘油基，R5是具有式 除了碳原子以外，仅含有碳原子或氧原子，氮原子和硫原子中的至少一个的主链，包含聚合物的组合物和包含该聚合物和溶剂的粘合剂组合物。
-
2.发明授权公开(公告)号：US07816067B2
公开(公告)日：2010-10-19
申请号：US11921790
申请日：2006-05-24
摘要： To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative.A coating-type underlayer coating forming composition for lithography comprising a compound of formula (1): wherein A is an organic group having an aromatic group, R1 is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1 to 6, m2 is the number of R1 substituted on the naphthalene ring and is an integer of 0 to 5, a sum of m1 and m2 (m1+m2) is an integer of 1 to 6, in cases where the sum is an integer other than 6, the reminder is hydrogen atom, and n is the number of repeating units ranging from 2 to 7000.
摘要翻译： 提供含有萘树脂衍生物的涂布型下层涂层形成组合物。 一种用于光刻的涂料型下层涂料组合物，其包含式（1）化合物：其中A为具有芳基的有机基团，R 1为羟基，烷基，烷氧基，卤素基团，硫醇基 氨基或酰胺基，m1是在萘环上取代的A的数，为1〜6的整数，m2为在萘环上取代的R 1的数，为0〜5的整数，a m1和m2的和（m1 + m2）为1〜6的整数，在和为6以外的整数的情况下，提醒为氢原子，n为2〜7000的重复单元数。
-
公开(公告)号：US20060290429A1
公开(公告)日：2006-12-28
申请号：US10530349
申请日：2003-10-08
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Kanayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Kanayama , Yasuo Kawamura
IPC分类号： H03F1/14
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
摘要翻译： 提供了一种用于形成用于抗反射涂层的抗反射涂层的组合物，其在用于制造半导体器件的波长处具有良好的吸收，其对光反射具有高保护效果，其具有高的干蚀刻速率 与光致抗蚀剂层相比。 具体地，用于形成抗反射涂层的组合物含有在氮原子上具有羟烷基结构作为取代基的三嗪三酮化合物，低聚物化合物或高分子化合物。
-
公开(公告)号：US20080206680A1
公开(公告)日：2008-08-28
申请号：US11979448
申请日：2007-11-02
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
-
5.发明授权公开(公告)号：US07425399B2
公开(公告)日：2008-09-16
申请号：US10530349
申请日：2003-10-08
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
IPC分类号： G03C1/825 , C07D251/30 , C07D251/72
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
摘要翻译： 提供了一种用于形成用于抗反射涂层的抗反射涂层的组合物，其在用于制造半导体器件的波长处具有良好的吸收，其对光反射具有高保护效果，其具有高的干蚀刻速率 与光致抗蚀剂层相比。 具体地，用于形成抗反射涂层的组合物含有在氮原子上具有羟烷基结构作为取代基的三嗪三酮化合物，低聚物化合物或高分子化合物。
-
6.发明授权公开(公告)号：US07846638B2
公开(公告)日：2010-12-07
申请号：US11979448
申请日：2007-11-02
申请人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
发明人： Takahiro Kishioka , Ken-ichi Mizusawa , Tomoyuki Enomoto , Rikimaru Sakamoto , Keisuke Nakayama , Yasuo Kawamura
CPC分类号： H01L21/0276 , G03F7/038 , G03F7/091 , Y10S430/106
摘要： There is provided a composition for forming anti-reflective coating for anti-reflective coating that has a good absorption of light at a wavelength utilized for manufacturing a semiconductor device, that exerts a high protection effect against light reflection, that has a high dry etching rate compared with the photoresist layer. Concretely, the composition for forming anti-reflective coating contains a triazine trione compound, oligomer compound or polymer compound having hydroxyalkyl structure as substituent on nitrogen atom.
摘要翻译： 提供了一种用于形成用于抗反射涂层的抗反射涂层的组合物，其在用于制造半导体器件的波长处具有良好的吸收，其对光反射施加高的保护效果，其具有高的干蚀刻速率 与光致抗蚀剂层相比。 具体地，用于形成抗反射涂层的组合物含有在氮原子上具有羟烷基结构作为取代基的三嗪三酮化合物，低聚物化合物或高分子化合物。
-
7.发明申请公开(公告)号：US20090053647A1
公开(公告)日：2009-02-26
申请号：US11921790
申请日：2006-05-24
摘要： [Object] To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative. [Means for Solving Problems] A coating-type underlayer coating forming composition for lithography comprising a compound of formula (1): wherein A is an organic group having an aromatic group, R1 is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1 to 6, m2 is the number of R1 substituted on the naphthalene ring and is an integer of 0 to 5, a sum of m1 and m2 (m1+m2) is an integer of 1 to 6, in cases where the sum is an integer other than 6, the reminder is hydrogen atom, and n is the number of repeating units ranging from 2 to 7000.
摘要翻译： 提供一种含有萘树脂衍生物的涂布型下层涂料形成组合物。 [用于解决问题的方法]一种用于光刻的涂布型下层涂料组合物，其包含式（1）化合物：其中A是具有芳基的有机基团，R 1是羟基，烷基，烷氧基， 卤素基，硫醇基，氨基或酰胺基，m1是在萘环上取代的A的数，为1〜6的整数，m2为在萘环上取代的R 1的数，为整数 为0〜5，m1和m2（m1 + m2）的和为1〜6的整数，在和为6以外的整数的情况下，提醒为氢原子，n为重复单元数 范围从2到7000。
-
8.发明授权公开(公告)号：US09505962B2
公开(公告)日：2016-11-29
申请号：US13814386
申请日：2011-07-29
申请人： Hiroshi Ogino , Mamoru Tamura , Tomoyuki Enomoto
发明人： Hiroshi Ogino , Mamoru Tamura , Tomoyuki Enomoto
IPC分类号： C08G75/00 , C09J171/12 , C09J171/08 , C08G65/40 , C09J171/00 , C08L71/00 , C08G65/00
CPC分类号： C09J171/12 , C08G65/007 , C08G65/40 , C08G65/4012 , C08G2650/40 , C08G2650/60 , C08L71/00 , C09J171/00 , C09J171/08 , Y10T428/269
摘要： An adhesive composition has a polymer that contains a unit structure of Formula (1): L1-O-T1-O Formula (1) where L1 is an arylene group or a combination of an arylene group and a sulfonyl group or a carbonyl group, and T1 is a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group optionally having a substituent and a fluoroalkylene group or a cyclic alkylene group and contains, at a terminal or in a side chain or the main chain, at least one group containing a structure of Formula (2-A), a structure of Formula (2-B), or both structures:
-
9.发明申请公开(公告)号：US20130177763A1
公开(公告)日：2013-07-11
申请号：US13814386
申请日：2011-07-29
申请人： Hiroshi Ogino , Mamoru Tamura , Tomoyuki Enomoto
发明人： Hiroshi Ogino , Mamoru Tamura , Tomoyuki Enomoto
IPC分类号： C09J171/12
CPC分类号： C09J171/12 , C08G65/007 , C08G65/40 , C08G65/4012 , C08G2650/40 , C08G2650/60 , C08L71/00 , C09J171/00 , C09J171/08 , Y10T428/269
摘要： An adhesive composition has a polymer that contains a unit structure of Formula (1): L1-O-T1-O Formula (1) (where L1 is an arylene group or a combination of an arylene group and a sulfonyl group or a carbonyl group, and T1 is a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group optionally having a substituent and a fluoroalkylene group or a cyclic alkylene group) and contains, at a terminal or in a side chain or the main chain, at least one group containing a structure of Formula (2-A), a structure of Formula (2-B), or both structures:
摘要翻译： 粘合剂组合物具有包含式（1）的单元结构的聚合物：其中，L 1为亚芳基或亚芳基和磺酰基的组合或 羰基，T1是氟代亚烷基，环状亚烷基，具有取代基的亚芳基，或者可以具有取代基的亚芳基和氟代亚烷基或环状亚烷基的组合），并且在末端或 在侧链或主链中含有至少一个含有式（2-A）结构的基团，式（2-B）的结构或两种结构：
-
10.发明授权Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom 有权含有萘环的具有卤素原子的光刻用底层涂料组合物公开(公告)号：US08088546B2
公开(公告)日：2012-01-03
申请号：US11630891
申请日：2005-06-24
IPC分类号： G03F7/004
CPC分类号： G03F7/094 , C08F220/28 , C08F220/32 , G03F7/091 , G03F7/11
摘要： There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition comprising a polymer having a structural unit containing naphthalene ring substituted with halogen atom in a molar ratio of 0.3 or more in the structural units constituting the polymer, a solvent.
摘要翻译： 提供了一种用于光刻的底层涂层形成组合物和与光致抗蚀剂相比具有高干蚀刻速率的下层涂层，并且不与用于制造半导体器件的光刻工艺中的光致抗蚀剂混合。 具体地说，它是一种下层涂层形成组合物，它包括具有在构成聚合物的结构单元中的摩尔比为0.3以上的由卤原子取代的萘环的结构单元的聚合物，溶剂。
-
-
-
-
-
-
-
-
-
搜索结果
39 条记录 (耗时 0.035 秒)
