利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

6 条记录 (耗时 0.02 秒)

    OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS
    1.
    发明申请
    OPTICAL ELEMENT HAVING A PLURALITY OF REFLECTIVE FACET ELEMENTS 有权
    具有多重反射面元素的光学元件

    公开(公告)号：US20120293785A1

    公开(公告)日：2012-11-22

    申请号：US13486073

    申请日：2012-06-01

    申请人： Marc Kirch ,  Martin Endres ,  Damian Fiolka ,  Joachim Hartjes

    发明人： Marc Kirch ,  Martin Endres ,  Damian Fiolka ,  Joachim Hartjes

    IPC分类号： G03B27/72

    CPC分类号： G02B26/0816 ,  G02B5/0891 ,  G02B5/09 ,  G02B7/1822 ,  G02B27/0927 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116

    摘要： An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.

    摘要翻译： 用于EUV微光刻投影曝光装置的照明光学单元的光学元件包括多个反射小面元件。 每个反射小面元件具有至少一个反射表面。 在这种情况下，以围绕旋转轴线旋转的方式布置至少一个小面元件。 旋转轴与小面元件的至少一个反射表面相交。 利用这种光学元件，可以以简单的方式改变照明光学单元内的照明辐射的至少一部分的方向和/或强度。

    ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS
    3.
    发明申请
    ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND APPARATUS 有权
    EUV微观照相和相关系统和装置的照明光学

    公开(公告)号：US20110063598A1

    公开(公告)日：2011-03-17

    申请号：US12915785

    申请日：2010-10-29

    申请人： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

    发明人： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70191 ,  G03F7/70083

    摘要： An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.

    摘要翻译： 用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个 的场面在场景中设置定义的照明条件。 在场面反射镜下游的以下光学器件将照明光透射到物体场中。 以下光学器件包括具有多个光瞳面的光瞳小面镜。 场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。 场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正 通过相关联的校正照明光瞳面进行物体场。 结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

    ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY
    5.
    发明申请
    ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY 有权
    EUV微光学照明光学单元

    公开(公告)号：US20110141445A1

    公开(公告)日：2011-06-16

    申请号：US12949478

    申请日：2010-11-18

    申请人： Martin Endres ,  Sebastian Doern ,  Stig Bieling ,  Marc Kirch

    发明人： Martin Endres ,  Sebastian Doern ,  Stig Bieling ,  Marc Kirch

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70233 ,  G02B5/09 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/702

    摘要： An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field.

    摘要翻译： 用于EUV微光刻的照明光学单元包括具有多个第一反射小面元件的第一光学元件和具有多个第二反射小面元件的第二光学元件。 来自多个第一反射小面元件的每个第一反射小平面元件具有相应的最大数目的不同位置，其限定与第一小面元件相关联的组合 - 由第二反射小面元件组成，其中该组由所有第二小面元件 在照明光学单元的操作期间，第一刻面元件将辐射引导到其不同位置。 所述多个第二反射小面元件形成多个不相交组，其中所述组中的每一个和所述组中的每一个包含至少两个第二小面元件，并且不存在属于同一组的组的两个第二小面元素。 这种结构使得可以提供照明光学单元，该照明光学单元可用于在物场的位置处提供大量不同的取决于角度的强度分布。

    Illumination optical unit for EUV microlithography
    6.
    发明授权
    Illumination optical unit for EUV microlithography 有权
    用于EUV微光刻的照明光学单元

    公开(公告)号：US08395754B2

    公开(公告)日：2013-03-12

    申请号：US12949478

    申请日：2010-11-18

    申请人： Martin Endres ,  Sebastian Doern ,  Stig Bieling ,  Marc Kirch

    发明人： Martin Endres ,  Sebastian Doern ,  Stig Bieling ,  Marc Kirch

    IPC分类号： G03B27/54 ,  G03B27/68 ,  G03B27/52

    CPC分类号： G03F7/70233 ,  G02B5/09 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/702

    摘要： An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of second reflective facet elements. Each first reflective facet element from the plurality of the first reflective facet elements has a respective maximum number of different positions which defines a set—associated with the first facet element—consisting of second reflective facet elements in that the set consists of all second facet elements onto which the first facet element directs radiation in its different positions during the operation of the illumination optical unit. The plurality of second reflective facet element forms a plurality of disjoint groups, wherein each of the groups and each of the sets contain at least two second facet elements, and there are no two second facet elements of a set which belong to the same group. This construction makes it possible to provide an illumination optical unit which can be used to provide a large number of different angle-dependent intensity distributions at the location of the object field.

    摘要翻译： 用于EUV微光刻的照明光学单元包括具有多个第一反射小面元件的第一光学元件和具有多个第二反射小面元件的第二光学元件。 来自多个第一反射小面元件的每个第一反射小平面元件具有相应的最大数目的不同位置，其限定与第一小面元件相关联的组合 - 由第二反射小面元件组成，其中该组由所有第二小面元件 在照明光学单元的操作期间，第一刻面元件将辐射引导到其不同位置。 所述多个第二反射小面元件形成多个不相交组，其中所述组中的每一个和所述组中的每一个包含至少两个第二小面元件，并且不存在属于同一组的组的两个第二小面元素。 这种结构使得可以提供照明光学单元，该照明光学单元可用于在物场的位置处提供大量不同的取决于角度的强度分布。