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    Lithographic apparatus and device manufacturing method
    3.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US07230674B2

    公开(公告)日：2007-06-12

    申请号：US11373503

    申请日：2006-03-13

    申请人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

    发明人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/72

    CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

    摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

    摘要翻译： 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。

    Lithographic apparatus and device manufacturing method
    4.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20060215132A1

    公开(公告)日：2006-09-28

    申请号：US11373503

    申请日：2006-03-13

    申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

    摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

    摘要翻译： 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    5.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20060176463A1

    公开(公告)日：2006-08-10

    申请号：US11345316

    申请日：2006-02-02

    申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

    摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

    摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。 该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。 表面远离光束入射区域和光束出射区域中的至少一个设置。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    6.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050140956A1

    公开(公告)日：2005-06-30

    申请号：US10748751

    申请日：2003-12-31

    申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

    IPC分类号： G03F7/20 ,  G03B27/72

    CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

    摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

    摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。 该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。 表面远离光束入射区域和光束出射区域中的至少一个设置。

    Sensor for Lithographic Apparatus and Method of Obtaining Measurements of Lithographic Apparatus
    8.
    发明申请
    Sensor for Lithographic Apparatus and Method of Obtaining Measurements of Lithographic Apparatus 有权
    用于平版印刷设备的传感器和获得光刻设备测量的方法

    公开(公告)号：US20070273869A1

    公开(公告)日：2007-11-29

    申请号：US10582247

    申请日：2004-12-09

    申请人： Frits Van Hout ,  Josephus Van Bommel ,  Peter Dirksen ,  Mark Kroon ,  Casparus Juffermans ,  Renatus Maria Van Den Eijnden

    发明人： Frits Van Hout ,  Josephus Van Bommel ,  Peter Dirksen ,  Mark Kroon ,  Casparus Juffermans ,  Renatus Maria Van Den Eijnden

    IPC分类号： G01B9/00

    CPC分类号： G03F7/70591 ,  G03F7/7085

    摘要： A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.

    摘要翻译： 可以使用传感器装置来测量布置成处理衬底的器件的性质，例如光学性质。 所述传感器装置包括具有以下基板：多个传感器元件，作为所述基板中的集成电路设置，所述多个传感器元件中的每一个相关联的电子电路包括连接到所述传感器元件的处理电路和输入/输出 接口连接到处理电路，以及电源单元，被配置为仅向与所使用的多个传感器元件中的一个或多个相关联的电子电路提供工作电力。 至少一个传感器元件以及可能的处理电子器件，输入/输出单元和/或电源单元可以被提供为衬底中的一个或多个集成电路或其他结构。