摘要:
An air-treating article for dispensing a volatilizable material, such as air freshener fragrance, into the atmosphere of an enclosed area, such as an automobile interior. The device includes a housing and a reservoir of the volatilizable material therein, and also includes a dual-configured, articulating attachment clip which enables attachment of the device at a high-air-flow station, such as the forced air vent grille of the automobile, or at a low-air-flow station, such as the sun visor of the vehicle. The device enables use of the consistent delivery rates of a low-density polyethylene membranes while at the same producing a higher delivery rate than normally achieved with such membranes.
摘要:
An air-treating article for dispensing a volatilizable material, such as air freshener fragrance, into the atmosphere of an enclosed area, such as an automobile interior. The device includes a housing and a reservoir of the volatilizable material therein, and also includes a dual-configured, articulating attachment clip which enables attachment of the device at a high-air-flow station, such as the forced air vent grille of the automobile, or at a low-air-flow station, such as the sun visor of the vehicle. The device enables use of the consistent delivery rates of a low-density polyethylene membranes while at the same producing a higher delivery rate than normally achieved with such membranes.
摘要:
An apparatus for cleaning edges and/or bevel areas of substrates is described. In one embodiment, the present invention includes a core having a plurality of flexible leaves spaced along an external surface of the core. A motor is coupled to the core for rotating the core about an axis of rotation. The rotation of the core causes the flexible leaves to rotate such that the leaves extend outward to intermittently strike points along the edge and/or bevel areas of the wafer.
摘要:
An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
摘要:
An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
摘要:
A method and apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要:
An apparatus for cleaning the side-edge and top-edge of a semiconductor wafer. The present invention provides an edge cleaning mechanism that cleans both the side-edge and top-edge of a wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.
摘要:
Apparatus for dispensing a metered amount of ground coffee. The apparatus comprises a housing and a rotatable metering assembly. The housing has a storage chamber for the coffee and an isolated passageway terminating in a spout. The storage chamber has an outlet at its bottom. The metering assembly includes plural metering chambers located below the outlet of the storage chambers and which, when the assembly is rotated, brings a number of them under the outlet, whereupon the particulate material flows therein. The housing also has a wiper disposed at the outlet to wipe extra particulate material from the filled metering chambers as the metering assembly is rotated so that they do not overflow. The rotation of the metering assembly to selected rotational positions brings a selected number, i.e., one or more, of the filled receiving chambers into communication with the passageway, whereupon the user of the apparatus may invert it so that the coffee from the one or more receiving chambers flows into the passageway at one time to exit at the spout. The housing also includes a pair of covers, pivotally connected to each other, for closing off the cavity and the pouring spout.
摘要:
An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.
摘要:
An apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.