Multilayer dielectric diffraction gratings
    3.
    发明授权
    Multilayer dielectric diffraction gratings 失效
    多层介质衍射光栅

    公开(公告)号:US5907436A

    公开(公告)日:1999-05-25

    申请号:US536874

    申请日:1995-09-29

    摘要: The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.

    摘要翻译: 描述了用于反射或透射的具有高衍射效率的介质光栅结构的设计和制造。 通过形成交替折射率介电材料的多层结构并将光栅结构放置在多层的顶部上,可以获得可调效率的衍射光栅和可变的光带宽。 通过控制多层的设计以及包括光栅结构的凹槽的深度,形状和材料,已经实现了在1至98%之间变化的反射一阶衍射效率。 描述了不使用离子蚀刻技术制造这些光栅的方法。

    Method for cleaning diffraction gratings
    6.
    发明申请
    Method for cleaning diffraction gratings 审中-公开
    衍射光栅的清洗方法

    公开(公告)号:US20080047584A1

    公开(公告)日:2008-02-28

    申请号:US11895392

    申请日:2007-08-23

    IPC分类号: C23G1/02

    CPC分类号: G02B27/0006 G02B5/18

    摘要: A method of cleaning a diffraction grating preferably includes exposing the grating surface to an aqueous base to remove an organic photoresist mask thereon; rinsing the grating surface with de-ionized water; oxidizing acid solution (such as Nanostrip™ or Nanostrip™ 2X) to remove metallic contaminants and residue organic compounds; rinsing the grating surface with de-ionized water; exposing the grating surface to an oxygen plasma ashing process using reactive oxygen species to oxidize and remove fluorinated hydrocarbon residue; exposing the grating surface again to an oxidizing acid solution to remove metallic contaminants and residue organic compounds; and rinsing the grating surface with de-ionized water.

    摘要翻译: 清洁衍射光栅的方法优选包括将光栅表面暴露于水性基底以在其上去除有机光致抗蚀剂掩模; 用去离子水冲洗光栅表面; 氧化酸溶液(例如Nanostrip TM或Nanostrip TM 2X)以除去金属污染物和残留的有机化合物; 用去离子水冲洗光栅表面; 将光栅表面暴露于氧等离子体灰化过程中,使用活性氧来氧化和除去氟化烃残基; 将光栅表面再次暴露于氧化酸溶液以除去金属污染物和残余物有机化合物; 并用去离子水冲洗光栅表面。