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公开(公告)号：US11919850B2
公开(公告)日：2024-03-05
申请号：US16971043
申请日：2019-02-20
发明人： Satoshi Kakuta , Hiromitsu Baba , Teruyo Ikeda , Ryo Fujisawa , Kazuhiko Haba
IPC分类号： C08F283/01 , C07C69/013 , C07C69/608 , C08F22/10 , C08F122/10 , C08F222/10 , C08F290/08 , C08L33/14 , G03F7/004 , C08F2/48
CPC分类号： C07C69/608 , C07C69/013 , C08F22/10 , C08F122/10 , C08F222/10 , C08F222/102 , C08F283/01 , C08F290/08 , C08L33/14 , G03F7/004 , C08F2/48 , C08F212/24 , C08F220/1806 , C08F222/102 , C08F222/14 , C08F220/1805 , C08F222/102
摘要： Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1):
(wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).-
公开(公告)号：US11814351B2
公开(公告)日：2023-11-14
申请号：US16971025
申请日：2019-02-20
发明人： Satoshi Kakuta , Hiromitsu Baba , Teruyo Ikeda , Ryo Fujisawa , Kazuhiko Haba
IPC分类号： C07C69/602 , C08F22/26 , C08F12/24 , G03F7/027
CPC分类号： C07C69/602 , C08F12/24 , C08F22/26 , G03F7/027
摘要： Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1):
(wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
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