公开(公告)号：US12104064B2

公开(公告)日：2024-10-01

申请号：US17172139

申请日：2021-02-10

Applicant: Hiroki Kobayashi

Inventor： Hiroki Kobayashi

IPC: C09D11/00 ,  B41J11/00 ,  C08F220/18 ,  C08F220/28 ,  C08F220/30 ,  C08F220/58 ,  C08F222/10 ,  C08F226/06 ,  C08K5/5397 ,  C09D11/037 ,  C09D11/101 ,  C09D11/107 ,  C09D17/00

CPC classification number: C09D11/101 ,  B41J11/00214 ,  C08F220/1806 ,  C08F220/1811 ,  C08F220/281 ,  C08F220/282 ,  C08F220/301 ,  C08F220/58 ,  C08F222/102 ,  C08F222/1061 ,  C08F226/06 ,  C08K5/5397 ,  C09D11/037 ,  C09D11/107 ,  C09D17/008

Abstract: An active energy curable white ink composition contains a nitrogen atom-containing monofunctional monomer (A), a nitrogen atom-free monofunctional monomer (B) having a glass transition temperature of 15 degrees or higher, a polyfunctional monomer (C), a polymerizable oligomer (D), an acylphosphine oxide-based polymerization initiator (E), and a white pigment (F), wherein the proportion of (D) in the active energy curable white ink composition is 0.2% by mass or less, the proportion of (E) in the active energy curable white ink composition is from 6% to 10% by mass, and the proportion of (F) in the active energy curable white ink composition is from 12% to 17% by mass.

公开(公告)号：US12024574B2

公开(公告)日：2024-07-02

申请号：US17444616

申请日：2021-08-06

Applicant: Henkel AG & Co. KGaA

Inventor： Heqiang Zhang ,  Chongjian Song ,  Zuohe Wang ,  Chongyang Sun

IPC: C08F2/50 ,  C08F210/10 ,  C08F220/18 ,  C08J5/12 ,  C08K5/07 ,  C08K5/5397

CPC classification number: C08F2/50 ,  C08F210/10 ,  C08F220/1806 ,  C08F220/1811 ,  C08J5/124 ,  C08K5/07 ,  C08K5/5397

Abstract: The present invention provides a light curable (meth)acrylate resin composition for thermoplastic elastomer bonding. The light curable (meth)acrylate resin composition of the present invention comprises: a (meth)acrylic monomer, a polyolefin (meth)acrylate oligomer having a viscosity of 200 000 to 2 500 000 mPa*s at 25° C., and a photoinitiator. The present invention also provides a cured product of the light curable (meth)acrylate resin composition and a use of the composition.

公开(公告)号：US20240192591A1

公开(公告)日：2024-06-13

申请号：US18380970

申请日：2023-10-17

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Takayuki Fujiwara

IPC: G03F7/004 ,  C08F216/02 ,  C08F220/18 ,  C08F220/22 ,  C08F220/38 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C08F216/02 ,  C08F220/1806 ,  C08F220/22 ,  C08F220/38 ,  G03F7/0048 ,  G03F7/0397 ,  G03F7/2004 ,  G03F7/2053 ,  G03F7/2059

Abstract: A resist composition comprising an acid generator containing a sulfonium salt containing a sulfonic acid anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having formula (1).

公开(公告)号：US20240184200A1

公开(公告)日：2024-06-06

申请号：US18383101

申请日：2023-10-24

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Tomomi Watanabe ,  Masahiro Fukushima

IPC: G03F7/004 ,  C07C219/14 ,  C07D295/088 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C219/14 ,  C07D295/088 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/1818 ,  C08F220/283 ,  G03F7/0382 ,  G03F7/0392 ,  C07C2601/08 ,  C07C2601/14

Abstract: A chemically amplified resist composition comprising a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

公开(公告)号：US20240092951A1

公开(公告)日：2024-03-21

申请号：US18502573

申请日：2023-11-06

Applicant: DONGJIN SEMICHEM CO., LTD.

Inventor： Tai Hoon YEO ,  Hyoc Min YOUN ,  Sang Hoon LEE ,  Jong Hyuk PARK ,  Jea Young LEE ,  Ja Young KIM

IPC: C08F210/06 ,  C08F210/02 ,  C08F220/18 ,  C08F220/30 ,  G02B1/04

CPC classification number: C08F210/06 ,  C08F210/02 ,  C08F220/1806 ,  C08F220/301 ,  G02B1/04 ,  C08F2800/20

Abstract: The present disclosure relates to a photo-curable composition, a cured product thereof, and an optical member and a display device comprising same. The photo-curable composition has excellent low refractive index, light transmittance, and low haze characteristics by comprising a first olefinic monomer containing fluorine, a second olefinic monomer having an absolute viscosity of 7 cP or less at 25° C., a photo-polymerization initiator, and an amine compound.

公开(公告)号：US11919850B2

公开(公告)日：2024-03-05

申请号：US16971043

申请日：2019-02-20

Applicant: Maruzen Petrochemical Co., Ltd.

Inventor： Satoshi Kakuta ,  Hiromitsu Baba ,  Teruyo Ikeda ,  Ryo Fujisawa ,  Kazuhiko Haba

IPC: C08F283/01 ,  C07C69/013 ,  C07C69/608 ,  C08F22/10 ,  C08F122/10 ,  C08F222/10 ,  C08F290/08 ,  C08L33/14 ,  G03F7/004 ,  C08F2/48

CPC classification number: C07C69/608 ,  C07C69/013 ,  C08F22/10 ,  C08F122/10 ,  C08F222/10 ,  C08F222/102 ,  C08F283/01 ,  C08F290/08 ,  C08L33/14 ,  G03F7/004 ,  C08F2/48 ,  C08F212/24 ,  C08F220/1806 ,  C08F222/102 ,  C08F222/14 ,  C08F220/1805 ,  C08F222/102

Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1):




(wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).

公开(公告)号：US11815851B2

公开(公告)日：2023-11-14

申请号：US17213295

申请日：2021-03-26

Applicant: Xerox Corporation

Inventor： Richard Philip Nelson Veregin ,  Kimberly D. Nosella ,  Raysa Rodriguez Diaz ,  Cuong Vong ,  Sandra J. Gardner ,  Majid Kamel

IPC: G03G9/087 ,  G03G9/093 ,  G03G9/08 ,  C08F220/22 ,  C08F220/18 ,  C08F220/34 ,  C08F212/36 ,  C08K3/22 ,  G03G9/097

CPC classification number: G03G9/08728 ,  C08F212/36 ,  C08F220/1806 ,  C08F220/22 ,  C08F220/34 ,  C08K3/22 ,  G03G9/0806 ,  G03G9/0819 ,  G03G9/08755 ,  G03G9/08793 ,  G03G9/09321 ,  G03G9/09725 ,  C08K2003/2227 ,  C08K2003/2241

Abstract: Disclosed herein is a toner composition, developer and additive for a toner composition. The toner composition includes toner particles having at least one resin, an optional colorant, an optional wax, and a crosslinked polymer particle on at least a portion of an external surface of the toner particles. The crosslinked polymeric particle on a surface of the toner particles includes at least a hydrophobic monomer comprising a non-fluorinated monomer having a carbon to oxygen (C/O) ratio of 3 or greater or a fluorinated monomer. The crosslinked polymer particle includes a second monomer comprising two or more vinyl groups present in an amount from about 8 wt % to about 40 wt % of the copolymer, a metal oxide and optionally a charge control agent monomer.

公开(公告)号：US11787968B2

公开(公告)日：2023-10-17

申请号：US16954131

申请日：2018-12-13

Applicant: PPG Industries Ohio, Inc.

Inventor： Debra L. Singer ,  William H. Retsch, Jr. ,  Dennis A. Simpson ,  Kam Lun Lock ,  Michael G. Olah ,  Hongying Zhou ,  Maria Magdalena Vladan

IPC: C09D133/02 ,  C08F220/18 ,  C08F2/04 ,  C08F2/22 ,  C08F220/06 ,  C08K5/00

CPC classification number: C09D133/02 ,  C08F2/04 ,  C08F2/22 ,  C08F220/06 ,  C08F220/1806 ,  C08K5/0025

Abstract: The present invention relates to a coating composition, the coating composition comprising: a) a solution polymerised acrylic material; b) an emulsion polymerised acrylic latex material, wherein one or both of the solution polymerised acrylic material and the emulsion polymerised acrylic latex material have acid functionality; and c) a crosslinker material operable to crosslink the acid functionality on the solution polymerised acrylic material and/or emulsion polymerised acrylic latex material, the present invention also extends to a food and/or beverage package coated on at least a portion thereof with said coating composition.

公开(公告)号：US20230322985A1

公开(公告)日：2023-10-12

申请号：US18330791

申请日：2023-06-07

Applicant: FUJIFILM Corporation

Inventor： Takafumi NAKAYAMA

IPC: C08F220/18 ,  C08F220/56 ,  C08F220/20 ,  C08F222/24 ,  C08F2/48 ,  C08K5/20 ,  C09J133/10 ,  C09J133/14 ,  G02B3/00 ,  G02B1/04 ,  G02B13/00

CPC classification number: C08F220/1806 ,  C08F220/1804 ,  C08F220/56 ,  C08F220/20 ,  C08F222/24 ,  C08F2/48 ,  C08K5/20 ,  C09J133/10 ,  C09J133/14 ,  G02B3/00 ,  G02B1/041 ,  G02B13/006 ,  C09J2433/00

Abstract: Provided are a curable resin composition containing a compound represented by General Formula (1) and a component (B); and a cemented lens using the composition. Component (B): a polymer including a structural unit (bi) having an aromatic ring and a structural unit (b2) having a hydrogen bonding group, in which a proportion of the structural unit (b1) in all structural units constituting the polymer is 10% by mass or more and a proportion of the structural unit (b2) in all structural units constituting the polymer is 3% by mass or more, where the structural unit (bi) has no hydrogen bonding group.


Pol1-Spa-L1-Ar-L2-Spb-Pol2  General Formula (1)

Ar represents an aromatic ring group represented by a specific formula, L1, L2, Spa, and Spb represent a single bond or a specific group, and Pol1 and Pol2 represent a polymerizable group.

公开(公告)号：US20230288800A1

公开(公告)日：2023-09-14

申请号：US18095249

申请日：2023-01-10

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Jun Hatakeyama ,  Masahiro Fukushima

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C08F220/22 ,  C08F212/14

CPC classification number: G03F7/0045 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1811 ,  C08F220/22 ,  G03F7/0397 ,  C08F2800/10

Abstract: A resist composition comprising a sulfonium salt having an acid labile group of triple bond-containing tertiary ester type in the cation as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.