Photosensitive resin composition
    3.
    发明授权
    Photosensitive resin composition 有权
    感光树脂组合物

    公开(公告)号:US08043899B2

    公开(公告)日:2011-10-25

    申请号:US12531803

    申请日:2008-03-25

    申请人: Tomohiro Yorisue

    发明人: Tomohiro Yorisue

    IPC分类号: H01L21/44

    摘要: A photosensitive resin composition comprising a photosensitive silicone compound of specified molecular weight having any of specified photosensitive substituents and a photopolymerization initiator in any of specified proportions is used. Thus, there can be obtained a resin composition containing a photosensitive silicone compound that provides a material suitable for a rewiring layer or a buffer coat material of LSI chip, less in a film loss between before and after curing and improved in the stickiness of pre-exposure stage. Further, there can be obtained a resin insulating film utilizing the resin composition.

    摘要翻译: 使用包含具有特定光敏性取代基的特定分子量的感光性硅氧烷化合物和任意规定比例的光聚合引发剂的感光性树脂组合物。 因此,可以获得含有光敏性硅酮化合物的树脂组合物,其提供适合于LSI芯片的重新布线层或缓冲涂层材料的材料,固化前后的薄膜损耗少, 暴露阶段 此外,可以获得利用树脂组合物的树脂绝缘膜。

    PHOTOSENSITIVE RESIN COMPOSITION
    4.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION 有权
    感光树脂组合物

    公开(公告)号:US20100123259A1

    公开(公告)日:2010-05-20

    申请号:US12531803

    申请日:2008-03-25

    申请人: Tomohiro Yorisue

    发明人: Tomohiro Yorisue

    摘要: A photosensitive resin composition comprising a photosensitive silicone compound of specified molecular weight having any of specified photosensitive substituents and a photopolymerization initiator in any of specified proportions is used. Thus, there can be obtained a resin composition containing a photosensitive silicone compound that provides a material suitable for a rewiring layer or a buffer coat material of LSI chip, less in a film loss between before and after curing and improved in the stickiness of pre-exposure stage. Further, there can be obtained a resin insulating film utilizing the resin composition.

    摘要翻译: 使用包含具有特定光敏性取代基的特定分子量的感光性硅氧烷化合物和任意规定比例的光聚合引发剂的感光性树脂组合物。 因此,可以获得含有光敏性硅酮化合物的树脂组合物,其提供适合于LSI芯片的重新布线层或缓冲涂层材料的材料,固化前后的薄膜损耗少, 暴露阶段 此外,可以获得利用该树脂组合物的树脂绝缘膜。

    Anaerobic compositions with enhanced toughness and crack resistance
    5.
    发明申请
    Anaerobic compositions with enhanced toughness and crack resistance 有权
    具有增强韧性和抗裂性的厌氧组合物

    公开(公告)号:US20030036601A1

    公开(公告)日:2003-02-20

    申请号:US10169607

    申请日:2002-07-03

    IPC分类号: C08L033/06

    摘要: An anaerobic adhesive composition having enhanced toughness and resistance to crack propagation, particularly subsequent to thermal exposure, comprising a combination of three monomers consisting of (a) at least one (meth)acrylate monomer, (b) at least one (meth)acrylate-terminated urethane modified acrylonitrile/butadiene prepolymer, and (c) at least one (meth)acrylate-terminated acrylic/polyisocyanate adduct.

    摘要翻译: 一种厌氧粘合剂组合物,其具有增强的韧性和抗裂纹扩展性,特别是在热暴露后,包含由(a)至少一种(甲基)丙烯酸酯单体组成的三种单体,(b)至少一种(甲基)丙烯酸酯 - 封端的氨基甲酸酯改性丙烯腈/丁二烯预聚物,和(c)至少一种(甲基)丙烯酸酯封端的丙烯酸/多异氰酸酯加合物。

    Fluorine- and chromophore-containing polymer
    7.
    发明授权
    Fluorine- and chromophore-containing polymer 失效
    含氟和含发色团的聚合物

    公开(公告)号:US5030701A

    公开(公告)日:1991-07-09

    申请号:US461545

    申请日:1990-01-05

    申请人: James E. Garbe

    发明人: James E. Garbe

    摘要: Chromophoric-moiety-containing, polymeric materials, containing at least one fluoroaliphatic radical, which are useful as dyes or colorants for fluorine-containing liquids, as coatings or components of coatings which are colored, light-absorbing, or fluorescing and characteristic properties of flurocarbon polymers, e.g. chemical inertness and hydrophobicity; and a method of detecting leaks in normally sealed devices, e.g. electronic devices, using a coating which includes the polymeric material, and a bath of fluorine-containing liquid in which the coating is soluble.

    摘要翻译: 含有发色团部分的聚合物材料,其含有至少一个氟代脂族基团,其可用作含氟液体的染料或着色剂,作为有色,光吸收或发荧光的涂层或涂层组分,以及氟碳的特征性质 聚合物,例如 化学惰性和疏水性; 以及检测常密封装置中的泄漏的方法。 电子设备,使用包括聚合物材料的涂层,以及涂层可溶于其中的含氟液体浴。