摘要:
A plasma processing apparatus includes a main body that has an inlet for a purification target gas and an outlet for a purified gas, an insulator honeycomb that includes a plurality of cells that are partitioned by a partition wall and serve as gas passages, a conductor honeycomb that is disposed to be able to transmit heat to the insulator honeycomb, a discharge electrode that is disposed opposite to the conductor honeycomb and forms a pair of electrodes with the conductor honeycomb, and a pulse power supply that applies a pulse voltage between the pair of electrodes, the insulator honeycomb, the conductor honeycomb, and the discharge electrode being disposed in an inner space of the main body. The plasma processing apparatus generates plasma by applying a pulse voltage to promote purification of the purification target gas in the insulator honeycomb by utilizing heat generated by plasma.
摘要:
A plasma generating electrode 1 of the present invention includes two or more electrodes 2 disposed to face each other, and holding members 3 for holding electrodes 2 at a predetermined interval, and can generate plasma by applying voltage between electrodes 2. At least one of electrodes facing each other 2 has a plate-shaped ceramic body 6 serving as a dielectric body, and a conductive film 7 disposed inside the body 6, and the holding members 3 fix the opposite side end portions 5 (fixed end portions 5a) of electrodes facing each other 2 in the state of a cantilever in such a condition that electrodes 2 are held by holding members in the state of cantilevers of the different directions alternately at a predetermined interval as a whole. This relaxes the thermal stress and effectively prevents distortion and breakage of electrodes caused by to a temperature change.
摘要:
An exhaust gas treating apparatus 1 includes; a case body 2 and a plasma producing means 3 capable of producing plasma inside the case body 2 and treats the substances to be treated contained in the exhaust gas by the plasma producing means 3. The plasma producing means 3 has one or more each of a pulse electrode 4 and a ground electrode 5 that are oppositely disposed in the case body 2 and has a pulse power source 6 capable of feeding a pulse current to the pulse electrode 4 by switching frequency and/or voltage for different values at predetermined time intervals. The substances to be treated contained in the exhaust gas can selectively be treated by switching frequency and/or voltage value for different values at predetermined time intervals so that plasma of a kind adequate for the substances to be treated contained in an exhaust gas is produced between the pulse electrode 4 and the ground electrode 5.
摘要:
A plasma generating electrode 1 of the invention includes at least a pair of electrodes 5, at least one electrode 5a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a plurality of conductive films 3 disposed in the ceramic body 2 and each having a plurality of through-holes 4 formed through the conductive film 3 in its thickness direction in a predetermined arrangement pattern, the through-holes 4 having a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction, an arrangement pattern of the through-holes 4a formed in at least one conductive film 3a being different from an arrangement pattern of the through-holes 4b formed in the other conductive film 3b. The plasma generating electrode 1 is capable of simultaneously generating different states of plasma upon application of voltage between the pair of electrodes 5 due to the different arrangement patterns of the through-holes 4 in the conductive films 3.
摘要:
An exhaust gas treating apparatus 1 includes: a case body 2 and a plasma producing means 3 capable of producing plasma inside the case body 2 and treats the substances to be treated contained in the exhaust gas by the plasma producing means 3. The plasma producing means 3 has one or more each of a pulse electrode 4 and a ground electrode 5 that are oppositely disposed in the case body 2 and has a pulse power source 6 capable of feeding a pulse current to the pulse electrode 4 by switching frequency and/or voltage for different values at predetermined time intervals. The substances to be treated contained in the exhaust gas can selectively be treated by switching frequency and/or voltage value for different values at predetermined time intervals so that plasma of a kind adequate for the substances to be treated contained in an exhaust gas is produced between the pulse electrode 4 and the ground electrode 5.
摘要:
A plasma generating electrode of the invention present includes at least a pair of electrodes 5, at least one electrode 5a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a conductive film 3 disposed inside the ceramic plate 2 and having a plurality of through-holes 4 formed through the conductive film 3 in its thickness direction, the through-holes having a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction. The plasma generating electrode can generate uniform and stable plasma at low power consumption.
摘要:
A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in which the conductive film 4 does not have an absent portion. Spaces V formed between the unit electrodes 2 include a normal space Va formed so that the distance between conductive films 4 corresponds to the distance between the unit electrodes 2 and a deficient space Vb formed so that the distance between the conductive films 4 is greater than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.
摘要:
A plasma generating electrode of the invention present includes at least a pair of electrodes 5, at least one electrode 5a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a conductive film 3 disposed inside the ceramic plate 2 and having a plurality of through-holes 4 formed through the conductive film 3 in its thickness direction, the through-holes having a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction. The plasma generating electrode can generate uniform and stable plasma at low power consumption.
摘要:
A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in which the conductive film 4 does not have an absent portion. Spaces V formed between the unit electrodes 2 include a normal space Va formed so that the distance between conductive films 4 corresponds to the distance between the unit electrodes 2 and a deficient space Vb formed so that the distance between the conductive films 4 is greater than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.
摘要:
A plasma generating electrode of the present invention includes a pair of unit electrodes 2, each of the pair of unit electrodes 2 including a plate-like ceramic body 19 and a conductive film 12 disposed inside the ceramic body 19 and including a plurality of protrusions 13 on a front surface, the pair of unit electrodes 2 constituting a basic unit 1 by being hierarchically layered at intervals corresponding to thickness of the protrusion 13 in a state that a plurality of spaces which are open on each end in the arrangement direction of the protrusion are formed, the basic units 1 constituting an electrode unit in which the basic units 1 are hierarchically layered at intervals corresponding to the thickness of the protrusion 13, and the plasma generating electrode being capable of generating plasma in the three-dimensionally arranged spaces V upon application of voltage between the unit electrodes 2 constituting the electrode unit. Therefore, the plasma generating electrode is capable of generating uniform and stable plasma and exhibiting excellent heat resistance.