摘要:
An electron-emitting device having favorable electron emitting characteristic stable for a long time, which is manufactured by a method comprising the steps of disposing an electrically conductive member having a second gap on a substrate, and applying a voltage to the electrically conductive member while irradiating at least the second gap with an electron beam from electron emitting means disposed apart from the electrically conductive member in an atmosphere comprising a carbon compound.
摘要:
An electron-emitting device having favorable electron emitting characteristic stable for a long time, which is manufactured by a method comprising the steps of disposing an electrically conductive member having a second gap on a substrate, and applying a voltage to the electrically conductive member while irradiating at least the second gap with an electron beam from electron emitting means disposed apart from the electrically conductive member in an atmosphere comprising a carbon compound.
摘要:
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.
摘要:
An image display apparatus uses electron-emitting devices each having: a pair of device electrodes on an insulating substrate; and an electroconductive film connecting the device electrodes. The insulating substrate has concave portions in a gap between the device electrodes. The film has opening portions having a first gap in a region adjacent to the opening portions along such a gap. A carbon film having a second gap is formed in the first gap and has extending portions extending from side surfaces of the concave portions toward the bottom. The extending portions of the adjacent carbon films are not coupled.
摘要:
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.
摘要:
The present invention provides an electron-emitting device which does not need a fresh electrode to be added thereto, has excellent convergence and shows little change of a discharged electric current for short and long periods of time, and an image display apparatus using the device. The electron-emitting device includes at least a pair of device electrodes formed on an insulating substrate, and a plurality of electroconductive films which are formed so as to connect the device electrodes to each other and have gaps therein, wherein the surface of a region which is at least adjacent to the gap between the electroconductive films and is not covered with the electroconductive film is higher than the surface of the electroconductive film.
摘要:
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4 Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csub is a specific heat J/kg·K of the substrate, ρsub is a specific gravity kg/m3 of the substrate, λsub is a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9 sec to 10 sec.
摘要:
A base body includes a first part and a second part. The second part has a lower thermal conductivity than the first part and is arranged adjacently to the first part. A first conductive film is formed on the first part and a second conductive film is formed on the second part. At least part of a gap is located above a boundary between the first part and the second part.
摘要:
A base body includes a first part and a second part, The second part has a lower thermal conductivity than the first part and is arranged adjacently to the first part. A first conductive film is formed on the first part and a second conductive film is formed on the second part. At least part of a gap is located above a boundary between the first part and the second part.
摘要:
To provide a method for manufacturing an electron source having electron-emitting devices with excellent electron-emitting property arranged on a substrate and enabling an image-forming apparatus capable of displaying an image with high brightness and uniformity to be enhanced in terms of screen size and production scale. The method for manufacturing the electron source includes a step of disposing a plurality of units and a plurality of wirings connected to the plurality of units on a substrate, each unit including a polymer film and a pair of electrodes with the polymer film interposed therebetween, and a step of forming electron-emitting devices from the plurality of units by repeatedly performing a process including a selecting substep of selecting a desired number of units from the plurality of units, a resistance-reducing substep of reducing resistance of the polymer films of the selected units and a gap-forming substep of forming a gap in each of the films formed by the resistance-reducing substep.