公开(公告)号：US20060110604A1

公开(公告)日：2006-05-25

申请号：US11320961

申请日：2005-12-30

申请人： Masafumi Mizuguchi ,  Norio Komine ,  Hiroki Jinbo

发明人： Masafumi Mizuguchi ,  Norio Komine ,  Hiroki Jinbo

IPC分类号： B32B17/06

CPC分类号： G03F7/70075 ,  G02B5/04 ,  G03F7/70958

摘要： An exposure apparatus includes an illumination optical system configured to illuminate a mask by using a laser beam having a wavelength shorter than 250 nm as a light source, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed substrate, in which an optical element made of a synthetic quartz member is disposed in the illumination optical system and/or the projection optical system. The synthetic quartz member satisfies the following conditions of initial transmittance relative to light having a wavelength of 150 nm being equal to or above 60% per centimeter, striae therein satisfying either grade 1 or grade 2 as defined in Japan Optical Glass Industry Society Standard (JOGIS), an absorption coefficient α for an infrared absorption band of a hydroxyl group located at 3585 cm−1 being equal to or below 0.035/cm, and the content of aluminum being equal to or below 1 ppm while the content of lithium being equal to or below 0.5 ppm.

摘要翻译： 曝光装置包括：照明光学系统，被配置为通过使用波长短于250nm的激光束照射掩模作为光源;以及投影光学系统，被配置为将掩模的图案图像投射并暴露在暴露的基板上 其中由合成石英部件制成的光学元件设置在照明光学系统和/或投影光学系统中。 合成石英部件相对于波长为150nm的光等于或高于60％/厘米的初始透射率满足以下条件，其条纹满足日本光学玻璃工业协会标准（JOGIS）中定义的1级或2级 ），位于3585cm -1处的羟基的红外吸收带的吸收系数α等于或低于0.035 / cm，铝的含量等于或低于1ppm，同时 锂的含量等于或低于0.5ppm。

公开(公告)号：US20060158636A1

公开(公告)日：2006-07-20

申请号：US11384448

申请日：2006-03-21

申请人： Masafumi Mizuguchi ,  Norio Komine

发明人： Masafumi Mizuguchi ,  Norio Komine

IPC分类号： G03B27/72

CPC分类号： G03F7/70958 ,  G03F7/70041 ,  G03F7/70591 ,  G03F7/70883 ,  G03F7/70941

摘要： In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. In ultraviolet light applied to the synthetic silica glass component, a width between adjacent top portions of energy density inhomogeneity in a plane perpendicular to an optical axis is larger than 0.1 mm, and a difference between a top portion and a bottom portion of the energy density is 5% or less of an average energy density.

摘要翻译： 在曝光装置中，通过施加波长为300nm以下且已经通过多个光学部件的脉冲光使曝光对象物曝光。 多个光学部件中的至少一个由合成石英玻璃部件制成。 在施加到合成石英玻璃部件的紫外线中，与光轴垂直的面内的能量密度不均匀性的相邻顶部之间的宽度大于0.1mm，顶部与底部之间的能量密度 是平均能量密度的5％以下。

公开(公告)号：US20050047986A1

公开(公告)日：2005-03-03

申请号：US10947366

申请日：2004-09-23

申请人： Masafumi Mizuguchi ,  Seishi Fujiwara ,  Norio Komine

发明人： Masafumi Mizuguchi ,  Seishi Fujiwara ,  Norio Komine

IPC分类号： C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C01B33/12

CPC分类号： C03C3/06 ,  C03B19/1469 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C23/0025 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

摘要： In a method for producing a quartz glass member, an F2 laser is radiated onto a sample obtained from a quartz glass base material under a predetermined condition to judge whether or not a peak intensity of H2 Raman scattering light is decreased by not less than 80% as compared with a peak intensity of H2 Raman scattering light obtained for a sample not irradiated with the F2 laser. If the peak intensity of H2 Raman scattering light is decreased by less than 80%, then it is judged that the laser resistance of the quartz glass base material is sufficient, and the synthetic quartz glass member is processed from the base material. The compaction of the sample is also measured.

摘要翻译： 在石英玻璃构件的制造方法中，在预定条件下将F2激光照射到由石英玻璃基材获得的样品上，以判断H2拉曼散射光的峰值强度是否降低不小于80％ 与未用F2激光照射的样品获得的H2拉曼散射光的峰值强度相比。 如果H2拉曼散射光的峰强度降低小于80％，则判断石英玻璃基材的激光电阻是足够的，并且合成石英玻璃构件从基材加工。 也测量样品的压实度。

公开(公告)号：US6075607A

公开(公告)日：2000-06-13

申请号：US166528

申请日：1998-10-06

申请人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara

发明人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara

IPC分类号： G01N21/88 ,  G01N17/00 ,  G01N21/59 ,  G01N21/958 ,  G01B11/00

CPC分类号： G01N17/004

摘要： A method is provided for estimating durability of an optical member against pulsed excimer laser beam irradiation. The method includes the steps of (a) irradiating a test sample for the optical member with a pulsed excimer laser beam to induce changes in transparency of the test sample with respect to the pulsed excimer laser beam, the irradiation being performed for such a time period as to cover not only a linear region and a saturation region and (b) measuring changes in the transparency of the test sample with respect to the pulsed excimer laser beam as a function of the cumulative number of the excimer laser pulses that have irradiated the test sample in step (a). The method further includes the step of (c) repeating steps (a) and (b) with a plurality of different first predetermined energy densities of the pulsed excimer laser beam to derive a correlation equation representing the changes in the transparency of the test sample in the linear region and the saturated region in terms of the energy density of the pulsed excimer laser beam and the cumulative number of the excimer laser pulses and (d) estimating the durability of the optical member under actual usage conditions using the derived correlation equation.

摘要翻译： 提供了一种用于估计光学构件对脉冲准分子激光束照射的耐久性的方法。 该方法包括以下步骤：（a）用脉冲准分子激光束照射光学部件的测试样品，以引起测试样品相对于脉冲准分子激光束的透明度变化，照射进行这样一段时间 不仅覆盖线性区域和饱和区域，并且（b）测量相对于脉冲准分子激光束的测试样品的透明度的变化，作为照射测试的准分子激光脉冲的累积数量的函数 步骤（a）中的样品。 该方法还包括以下步骤：（c）用脉冲准分子激光束的多个不同的第一预定能量密度重复步骤（a）和（b），以得出表示测试样品透明度变化的相关方程式 根据脉冲准分子激光束的能量密度和准分子激光脉冲的累积数量的线性区域和饱和区域，以及（d）使用导出的相关方程估计实际使用条件下的光学构件的耐久性。

公开(公告)号：US5703712A

公开(公告)日：1997-12-30

申请号：US509223

申请日：1995-07-31

申请人： Norio Komine ,  Hiroki Jinbo ,  Seishi Fujiwara ,  Hiroyuki Hiraiwa

发明人： Norio Komine ,  Hiroki Jinbo ,  Seishi Fujiwara ,  Hiroyuki Hiraiwa

IPC分类号： C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20 ,  G02B6/00 ,  C03C3/04 ,  C03C4/08 ,  C03C13/00

CPC分类号： C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

摘要： Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of the using a secondary treatment for hydrogen introduction.

摘要翻译： 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。 另外，通过在二氧化硅玻璃的合成时，通过引入氢分子，可以提供对紫外线照射的耐久性优异的二氧化硅玻璃构件，而不是使用二次氢气导入处理。

公开(公告)号：US5696624A

公开(公告)日：1997-12-09

申请号：US648867

申请日：1996-05-16

申请人： Norio Komine ,  Hiroki Jinbo ,  Seishi Fujiwara ,  Hiroyuki Hiraiwa

发明人： Norio Komine ,  Hiroki Jinbo ,  Seishi Fujiwara ,  Hiroyuki Hiraiwa

IPC分类号： C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C4/00 ,  G02B1/00 ,  G02B13/14 ,  G03F7/20

CPC分类号： C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03C4/0085 ,  G02B1/00 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2203/22 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C2201/21 ,  C03C2203/44 ,  C03C2203/52 ,  Y10S359/90 ,  Y10S501/905

摘要： Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of silica glass, instead of the secondary treatment for hydrogen introduction.

摘要翻译： 需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。 本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。 另外，在二氧化硅玻璃的合成中，通过引入氢分子，而不是进行氢的二次处理，提供了对紫外线照射的耐久性优异的二氧化硅玻璃。

公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

申请人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

发明人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC分类号： C03C306

CPC分类号： C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

摘要： A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

摘要翻译： 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US06518210B1

公开(公告)日：2003-02-11

申请号：US09593441

申请日：2000-06-14

申请人： Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

发明人： Hiroki Jinbo ,  Norio Komine ,  Hiroyuki Hiraiwa

IPC分类号： C03C306

CPC分类号： G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/52 ,  G03F7/70241 ,  Y02P40/57

摘要： A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

摘要翻译： 石英玻璃的结构测定温度为1200K以下，OH基浓度为1,000ppm以上。 石英玻璃与波长400nm以下的光一起用于光刻。

公开(公告)号：US06339033B2

公开(公告)日：2002-01-15

申请号：US09736279

申请日：2000-12-15

申请人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida

发明人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida

IPC分类号： C03C306

CPC分类号： C03B32/00 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/40 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

摘要： A silica glass is provided for use in an optical system processing an excimer laser beam. The silica glass has a molecular hydrogen concentration of about 5×1018 molecules/cm3 or less and is substantially free from defects which become precursors susceptible to an one-photon absorption process and a two-photon absorption process upon irradiation of the excimer laser beam to the silica glass.

摘要翻译： 提供石英玻璃用于处理准分子激光束的光学系统中。 二氧化硅玻璃的分子氢浓度约为5×1018分/ cm 3或更低，并且基本上没有成为对单光子吸收过程敏感的前体的缺陷和在将准分子激光束照射到二氧化硅上时的双光子吸收过程 玻璃。

公开(公告)号：US06269661B1

公开(公告)日：2001-08-07

申请号：US09347403

申请日：1999-07-06

申请人： Hiroki Jinbo ,  Akiko Moriya ,  Norio Komine

发明人： Hiroki Jinbo ,  Akiko Moriya ,  Norio Komine

IPC分类号： C03C1500

CPC分类号： C03C23/007 ,  C03C15/00 ,  C03C17/245 ,  C03C19/00 ,  C03C23/008 ,  Y10S65/08

摘要： The present invention provides a method for manufacturing an optical component that have increased transmittance in the ultraviolet region of the spectrum. The method includes the steps of cutting out a part from a block material; polishing optical sides of the part; subjecting the part to heat treatment at a temperature of between 100 and 900° C.; and subjecting the part to acid treatment.

摘要翻译： 本发明提供一种在光谱的紫外区域具有增加的透射率的光学部件的制造方法。 该方法包括从块材料切割零件的步骤; 抛光部分光学面; 在100至900℃的温度下对该部件进行热处理; 并对该部件进行酸处理。