摘要:
A device for manufacturing SiO2—TiO2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.
摘要:
A method for forming a porous soot body that includes depositing soot on a release coating supported by a bait substrate. Characteristics of the release coating control the strength of attachment of the porous soot body to the bait substrate. Weak attachment of the porous soot body to the bait substrate facilitates separation of the porous soot body from the bait substrate without damaging the porous soot body. The release coating may be formed from a brittle material or a material that oxidizes or otherwise depletes during deposition of the soot that forms the porous soot body. The release coating may include carbon. The separated porous soot body may be consolidated to form a core cane or may function as a sleeve (porous cladding) in a cane-in-soot fiber preform manufacturing process.
摘要:
Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.
摘要翻译:从用于透射波长在190nm和250nm之间的紫外线辐射的石英玻璃的光学部件开始,具有基本上没有氧缺陷的玻璃结构,氢含量范围为0.1×10 16分/ cm 3至5.0×10 16分/ cm 3,以及与 SiH基团的含量小于5×10 16分子/ cm 3,以提供特别适合用于线性偏振UV激光辐射的这种组分,本发明提出该组分的羟基含量范围为10〜 250重量ppm,假想温度高于1000℃
摘要:
Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.
摘要翻译:从用于透射波长在190nm和250nm之间的紫外线辐射的石英玻璃的光学部件开始,具有基本上没有氧缺陷的玻璃结构,氢含量范围为0.1×10 16分/ cm 3至5.0×10 16分/ cm 3,以及与 SiH基团的含量小于5×10 16分子/ cm 3,以提供特别适合用于线性偏振UV激光辐射的这种组分,本发明提出该组分的羟基含量范围为10〜 250重量ppm,假想温度高于1000℃
摘要:
A fused silica glass having a composition for use in bulk IR optical applications. The fused silica glass has a OH concentration of less than 5 ppm (parts per million) by weight and an absorbance of less than about 50 ppm/cm at a wavelength of about 1.3 μm. A method of making the fused silica glass is also described.
摘要:
Double clad large mode area planar lasers or amplifiers comprising rare-earth or transition metal doped planar core regions are used to generate near-diffraction-limited optical beams of ultra-high power. The amplified light is guided in the core using different guiding mechanisms in two orthogonal axes inside the core. Waveguiding along a first long core axis is obtained substantially by gain-guiding or thermal lensing. Waveguiding along a second short core axis is obtained by index guiding. This is accomplished by surrounding the planar core region with regions of different refractive index. The long sides of the planar core region are surrounded with a depressed refractive index cladding region. The short sides of the planar core region are surrounded with a cladding region substantially index-matched to the core region. The whole structure is surrounded by an outer cladding region with a low refractive index to enable cladding pumping of the planar waveguide with high-power diode lasers. The rare-earth or transition metal doping level inside the planar core can be constant and can also vary substantially without negatively affecting the waveguiding properties. To avoid bend losses along the long axis of the planar waveguide, the planar core region and the planar waveguide are aligned parallel to each other and the planar waveguide is coiled with the long side of the planar waveguide mounted to a drum. The drum can also be used as a heat sink. A planar waveguide comprising a planar core region can be manufactured using conventional fiber fabrication methods.
摘要:
The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1null1016 molecules/cm3 to 4.0null1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5null1016 molecules/cm3, a refractive index inhomogeneity, nulln, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm. In the use according to the invention, the quartz glass blank complies with dimensioning rules (2), (3), and (4) in terms of its minimal and maximal hydrogen contents and OH-content, CH2min, CH2max, and COH, respectively, with P being the pulse number and null being the energy density (in mJ/cm2): CH2minnullmolecules/cm3nullnull1null106 null2Pnullnull(2), CH2maxnullmolecules/cm3nullnull2null1018 nullnullnull(3), COHnullwt-ppmnullnull1,700nullnullnullmJ/cm2null0.4null50nullnull(4). The procedure according to the invention is characterized in that a mixed quartz glass is generated from a first and a second quartz glass by mixing the two quartz glasses in the course of a homogenization treatment.
摘要翻译:本发明涉及用于传输波长为250nm或更短波长的紫外线辐射的光学部件的石英玻璃坯料,以及微波平版印刷中使用石英玻璃毛坯与波长为250nm的紫外线辐射或 较短 此外,本发明涉及石英玻璃坯料的制造工序。 所述类型的石英玻璃坯料应显示出很少的诱导吸收,并且在压实和分解时优化。 根据本发明的石英玻璃坯料的特征在于以下性质:基本上不含氧缺陷部位的玻璃结构,H 2含量在0.1×10 16分/ cm 3至4.0×10 16分子/ cm 3范围内,OH-含量 125重量ppm至450重量ppm的范围,小于5×10 16分/厘米3的SiH基含量,小于2ppm的折射率不均匀性,DELTAn,应力双折射小于2nm / cm 。 在根据本发明的使用中,石英玻璃空白分别符合其最小和最大氢含量和OH-含量,CH 2 min,CH 2 max和COH的尺寸规则(2),(3)和(4) ,其中P是脉冲数,εi是能量密度(mJ / cm 2):CH 2min [分子/ cm 3] = 1×10 6 epsi 2 P(2),CH 2 max [分子/ cm 3] =2x1018εi(3) ppm] = 1,700xepsi [mJ / cm 2] 0.4±50(4)。 根据本发明的方法的特征在于,通过在均化处理过程中混合两个石英玻璃从第一和第二石英玻璃产生混合石英玻璃。
摘要:
A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.
摘要:
The invention includes inventive methods of treating a soot preform. One method includes heating a soot preform to a temperature of less than about 1000 null C. and exposing the preform to a substantially halide free reducing agent. Preferred reducing agents include carbon monoxide and sulfur dioxide. Another inventive method of treating the preform includes exposing the preform, in a furnace, to a substantially non-chlorine containing atmosphere comprising carbon monoxide. The preform is heated to a temperature of at least about 1000null C. Preferably this method is incorporated into the process for making an optical fiber. An additional method of treating the preform includes doping the preform with fluorine and exposing the fluorine doped preform to a substantially chlorine free atmosphere comprising at least carbon monoxide at a temperature of at least 1100null C., thereby reacting excess oxygen present in the furnace.
摘要:
A synthetic quartz glass substrate is prepared by annealing a synthetic quartz glass member having a higher hydroxyl content in a peripheral portion than in a central portion, machining off the peripheral portion of the member, slicing the member into a plate shaped substrate, chamfering and etching the substrate. The synthetic quartz glass substrate has a minimized birefringence and is suited for use as a photomask in photolithography.