公开(公告)号：US07907383B2

公开(公告)日：2011-03-15

申请号：US12086967

申请日：2007-02-08

申请人： Masami Ando ,  Jun Miyaji ,  Osamu Okamoto

发明人： Masami Ando ,  Jun Miyaji ,  Osamu Okamoto

IPC分类号： H01T23/00 ,  C04B35/00

CPC分类号： H02N13/00 ,  C04B35/111 ,  C04B35/6455 ,  C04B2235/3232 ,  C04B2235/5445 ,  C04B2235/656 ,  C04B2235/6582 ,  C04B2235/661 ,  C04B2235/72 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/85 ,  H01L21/6833

摘要： The present invention provides an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a silicon wafer from being contaminated with particles, and which is excellent in clamping and releasing a material to be clamped and easy to manufacture by low-temperature firing. The electrostatic chuck includes a dielectric material in which alumina is 99.4 wt % or more, and titanium oxide is more than 0.2 wt % and equal to or less than 0.6 wt %, wherein the electrostatic chuck's volume resistivity is 108-1011 Ωcm in room temperature, and wherein the titanium oxide segregates in boundaries of particles of the alumina.

摘要翻译： 本发明提供了一种静电卡盘，其中表面可以在暴露于等离子体之后保持光滑，以保护待被夹持的材料如硅晶片免受颗粒污染，并且夹紧和释放 待夹紧的材料并通过低温烧制容易制造。 静电卡盘包括氧化铝为99.4重量％以上，氧化钛大于0.2重量％且为0.6重量％以下的电介质材料，其中静电卡盘的体积电阻率为108-1011质量％ 室温，其中氧化钛在氧化铝颗粒的边界分离。

公开(公告)号：US20090273877A1

公开(公告)日：2009-11-05

申请号：US12086967

申请日：2007-02-08

申请人： Masami Ando ,  Jun Miyaji ,  Osamu Okamoto

发明人： Masami Ando ,  Jun Miyaji ,  Osamu Okamoto

IPC分类号： H01L21/683

CPC分类号： H02N13/00 ,  C04B35/111 ,  C04B35/6455 ,  C04B2235/3232 ,  C04B2235/5445 ,  C04B2235/656 ,  C04B2235/6582 ,  C04B2235/661 ,  C04B2235/72 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/85 ,  H01L21/6833

摘要： The present invention provides an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a silicon wafer from being contaminated with particles, and which is excellent in clamping and releasing a material to be clamped and easy to manufacture by low-temperature firing. The electrostatic chuck includes a dielectric material in which alumina is 99.4 wt % or more, and titanium oxide is more than 0.2 wt % and equal to or less than 0.6 wt %, wherein the electrostatic chuck's volume resistivity is 108-1011 Ωcm in room temperature, and wherein the titanium oxide segregates in boundaries of particles of the alumina.

摘要翻译： 本发明提供了一种静电卡盘，其中表面可以在暴露于等离子体之后保持光滑，以保护待被夹持的材料如硅晶片免受颗粒污染，并且夹紧和释放 待夹紧的材料并通过低温烧制容易制造。 静电卡盘包括氧化铝为99.4重量％以上且氧化钛大于0.2重量％且为0.6重量％以下的电介质材料，其中静电吸盘的体积电阻率为室温下的108-1011欧姆 ，并且其中所述氧化钛在所述氧化铝颗粒的边界分离。

公开(公告)号：US20070258187A1

公开(公告)日：2007-11-08

申请号：US11879204

申请日：2007-07-16

申请人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

发明人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

IPC分类号： H01T23/00

CPC分类号： H02N13/00

摘要： The object of the present invention is to provide an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a silicon wafer from being contaminated with particles, and which is excellent in clamping and releasing a material to be clamped. According to the present invention, there is provided an electrostatic chuck comprising a dielectric material in which alumina is 99.4 wt % or more, titanium oxdde is more than 0.2 wt % and equal to or less than 0.6 wt %, whose average particle diameter is 2 pm or less, and whose volume resistivity is 108-1011 Ωcm in room temperature, wherein the electrostatic chuck is used in a low lo temperature of 100 ° C. or less.

摘要翻译： 本发明的目的是提供一种静电卡盘，其中在暴露于等离子体之后该表面可以保持光滑，以保护被夹持的材料如硅晶片免受颗粒污染，并且这是优异的 夹紧和释放待夹紧的材料。 根据本发明，提供了一种静电卡盘，其包括氧化铝为99.4重量％以上的电介质材料，钛氧化物的平均粒径为2重量％以上且0.2重量％以上且0.6重量％以下 pm或更小，其体积电阻率为室温下的10±10℃，其中静电吸盘以低的温度为100℃使用，或 减。

公开(公告)号：US07248457B2

公开(公告)日：2007-07-24

申请号：US11272788

申请日：2005-11-15

申请人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

发明人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

IPC分类号： H01T23/00

CPC分类号： H02N13/00

摘要： The object of the present invention is to provide an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a silicon wafer from being contaminated with particles, and which is excellent in clamping and releasing a material to be clamped. According to the present invention, there is provided an electrostatic chuck comprising a dielectric material in which alumina is 99.4 wt % or more, titanium oxide is more than 0.2 wt % and equal to or less than 0.6 wt %, whose average particle diameter is 2 μm or less, and whose volume resistivity is 108-1011 Ωcm in room temperature, wherein the electrostatic chuck is used in a low temperature of 100° C. or less.

公开(公告)号：US07450365B2

公开(公告)日：2008-11-11

申请号：US11879204

申请日：2007-07-16

申请人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

发明人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

IPC分类号： H01T23/00

CPC分类号： H02N13/00

摘要： The object of the present invention is to provide an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a silicon wafer from being contaminated with particles, and which is excellent in clamping and releasing a material to be clamped. According to the present invention, there is provided an electrostatic chuck comprising a dielectric material in which alumina is 99.4 wt % or more, titanium oxide is more than 0.2 wt % and equal to or less than 0.6 wt %, whose average particle diameter is 2 μm or less, and whose volume resistivity is 108-1011 Ωcm in room temperature, wherein the electrostatic chuck is used in a low temperature of 100° C or less.

摘要翻译： 本发明的目的是提供一种静电卡盘，其中在暴露于等离子体之后该表面可以保持光滑，以保护被夹持的材料如硅晶片免受颗粒污染，并且这是优异的 夹紧和释放待夹紧的材料。 根据本发明，提供了一种静电卡盘，其包括电介质材料，其中氧化铝为99.4重量％以上，氧化钛大于0.2重量％且等于或小于0.6重量％，其平均粒径为2 在室温下体积电阻率为10 -8 -10 11Ω，其中静电卡盘的使用温度低于100℃或更低。

公开(公告)号：US20070109713A1

公开(公告)日：2007-05-17

申请号：US11272788

申请日：2005-11-15

申请人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

发明人： Jun Miyaji ,  Osamu Okamoto ,  Tetsuo Kitabayashi

IPC分类号： H01T23/00

CPC分类号： H02N13/00

摘要： The object of the present invention is to provide an electrostatic chuck in which the surface can be kept smooth after being exposed to plasma, so as to protect a material to be clamped such as a silicon wafer from being contaminated with particles, and which is excellent in clamping and releasing a material to be clamped. According to the present invention, there is provided an electrostatic chuck comprising a dielectric material in which alumina is 99.4 wt % or more, titanium oxide is more than 0.2 wt % and equal to or less than 0.6 wt %, whose average particle diameter is 2 μm or less, and whose volume resistivity is 108-1011 Ωcm in room temperature, wherein the electrostatic chuck is used in a low temperature of 100° C. or less.

摘要翻译： 本发明的目的是提供一种静电卡盘，其中在暴露于等离子体之后该表面可以保持光滑，以保护被夹持的材料如硅晶片免受颗粒污染，并且这是优异的 夹紧和释放待夹紧的材料。 根据本发明，提供了一种静电卡盘，其包括电介质材料，其中氧化铝为99.4重量％以上，氧化钛大于0.2重量％且等于或小于0.6重量％，其平均粒径为2 在室温下其体积电阻率为10 -8 -10 11Ω，其中静电吸盘在100℃以下的低温下使用 。

公开(公告)号：US08311470B2

公开(公告)日：2012-11-13

申请号：US12844008

申请日：2010-07-27

申请人： Osamu Okamoto

发明人： Osamu Okamoto

IPC分类号： G03G15/20

CPC分类号： G03G15/206

摘要： An image heating apparatus includes: a belt member; an inclinable steering roller configured to support the belt member; a heating member configured to contact the belt member and heat an image on a recording material; a detecting member configured to detect a position of a belt end in a widthwise direction of the belt member; a correcting device configured to correct a position of the belt member in the widthwise direction by inclining the steering roller in accordance with a detected position of the belt end by the detecting member; and a supporting device configured to support the detecting member. The supporting device is provided with a contact portion for press-contacting an end surface of one end portion of a pressing roller configured to press the belt member against the heating member.

摘要翻译： 图像加热装置包括：带构件; 构造成支撑所述带构件的倾斜转向辊; 加热构件，其构造成接触所述带构件并加热记录材料上的图像; 检测构件，其构造成检测所述带构件的宽度方向上的带端部的位置; 校正装置，被配置为通过根据所述检测构件的所述带端的检测位置使所述转向辊倾斜来校正所述带构件在宽度方向上的位置; 以及配置为支撑所述检测部件的支撑装置。 支撑装置设置有用于将构造成将带构件压靠加热构件的加压辊的一个端部的端面压接的接触部。

公开(公告)号：US20110008084A1

公开(公告)日：2011-01-13

申请号：US12827058

申请日：2010-06-30

申请人： Osamu Okamoto

发明人： Osamu Okamoto

IPC分类号： G03G15/20

CPC分类号： G03G15/2025 ,  G03G2215/2009

摘要： An image heating apparatus includes an endless belt; a rotatable member, contactable to an outer surface of the endless belt, for forming a nip in which a recording material is nipped and conveyed; a stretching member for stretching the endless belt; an urging member, contacting an inner surface of the endless belt, for urging the stretching member by movement of the endless belt so as to include a contact portion at which the urging member contacts the stretching member; a lubricant application member for applying a lubricant onto the inner surface of the endless belt; and a collecting member, contacting the stretching member at a position downstream of an area in which the stretching member contacts the endless belt and upstream of the contact portion with respect to a rotational direction of the stretching member, for collecting the lubricant from the stretching member. The collecting member includes a guiding portion for guiding the lubricant, collected from the stretching member, onto the inner surface of the endless belt.

摘要翻译： 图像加热装置包括环形带; 可旋转构件，其可接触到所述环形带的外表面，用于形成记录材料被夹持和传送的辊隙; 用于拉伸环形带的拉伸构件; 促动构件，其与所述环形带的内表面接触，用于通过所述环形带的移动来推动所述拉伸构件，以包括所述推动构件与所述拉伸构件接触的接触部; 用于将润滑剂施加到环形带的内表面上的润滑剂施加构件; 以及收集构件，其在所述拉伸构件与所述环形带接触的区域的下游位置和所述接触部分的上游侧相对于所述拉伸构件的旋转方向接触所述拉伸构件，用于从所述拉伸构件收集所述润滑剂 。 收集构件包括用于将从拉伸构件收集的润滑剂引导到环形带的内表面上的引导部分。

公开(公告)号：US20110008083A1

公开(公告)日：2011-01-13

申请号：US12821410

申请日：2010-06-23

申请人： Osamu Okamoto

发明人： Osamu Okamoto

IPC分类号： G03G15/20

CPC分类号： G03G15/206 ,  G03G2215/2009

摘要： An image heating apparatus includes a rotatable member; a belt member contactable to the rotatable member; a pressing member for pressing the belt member against the rotatable member to form a nip in which a recording material is nipped and conveyed; and a sheet member for covering a pressing surface of the pressing member at which the pressing member presses the belt member. The sheet member is mounted on the pressing member so as to have a first area in which an end portion thereof is located outside an end portion of the belt member with respect to a widthwise direction perpendicular to a conveying direction of the recording material and which includes a portion opposing the pressing surface, and so as to have a second area in which the end portion thereof is located inside the end portion of the belt member with respect to the widthwise direction.

摘要翻译： 图像加热装置包括可旋转构件; 可旋转构件可接触的带构件; 按压构件，用于将带构件压靠在可旋转构件上以形成记录材料被夹持和传送的辊隙; 以及片状部件，用于覆盖按压部件按压带部件的按压部件的按压面。 片状部件安装在按压部件上，以具有第一区域，其端部位于带部件的端部相对于与记录材料的传送方向垂直的宽度方向的外侧，并且包括 与所述按压面相对的部分，并且具有其端部相对于所述宽度方向位于所述带部件的端部内的第二区域。

公开(公告)号：US20090324933A1

公开(公告)日：2009-12-31

申请号：US12381225

申请日：2009-03-09

申请人： Hironori Hatono ,  Masahiro Mizukane ,  Osamu Okamoto

发明人： Hironori Hatono ,  Masahiro Mizukane ,  Osamu Okamoto

IPC分类号： B32B5/16 ,  B05D1/12 ,  B05C19/00

CPC分类号： B05B7/144 ,  B01J2/16 ,  B02C19/0043 ,  B02C19/065 ,  B02C19/066 ,  B05B7/1404 ,  B05B7/1445 ,  B05B12/085 ,  B05D1/12 ,  B28B19/00 ,  C23C24/04 ,  Y10T428/25 ,  Y10T428/2982

摘要： A composite structure formation method based on an aerosol deposition method by which an aerosol with brittle material fine particles dispersed in a gas is sprayed toward a substrate to form a structure made of the brittle material fine particles, the composite structure formation method includes: storing a plurality of controlled particles in a storage mechanism, the controlled particle being an assembly packed with a plurality of particles including the brittle material fine particles; supplying the controlled particles from the storage mechanism to an aerosolation mechanism; disaggregating the supplied controlled particles in the aerosolation mechanism to form an aerosol; and spraying the aerosol toward the substrate to form a composite structure having the structure and the substrate.

摘要翻译： 一种基于气溶胶沉积方法的复合结构形成方法，其中将分散在气体中的脆性材料微粒的气溶胶喷射到基板上以形成由脆性材料微粒构成的结构，所述复合结构形成方法包括： 多个受控颗粒在储存机构中，受控颗粒是装有多个包含脆性材料微粒的颗粒的组件; 将控制的颗粒从储存机构供应到气溶胶机构; 在气溶胶机构中分解供应的受控颗粒以形成气溶胶; 并将气溶胶喷射到基板上以形成具有该结构和基底的复合结构。