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18 条记录 (耗时 0.02 秒)

    System for detecting minute particles on or above a substrate
    1.
    发明授权
    System for detecting minute particles on or above a substrate 失效
    用于检测基板上或上方的微小颗粒的系统

    公开(公告)号：US5008558A

    公开(公告)日：1991-04-16

    申请号：US373801

    申请日：1989-06-29

    申请人： Masao Koshinaka ,  Minoru Akiyama ,  Hitoshi Tanaka ,  Toshimasa Tomoda

    发明人： Masao Koshinaka ,  Minoru Akiyama ,  Hitoshi Tanaka ,  Toshimasa Tomoda

    IPC分类号： G01N21/88 ,  G01N15/02 ,  G01N15/14 ,  G01N21/89 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

    CPC分类号： G01N21/94 ,  G01N2015/0238 ,  G01N2021/8909 ,  G01N2021/945 ,  G01N21/9501

    摘要： A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate for a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles. The measuring apparatus comprises a laser beam scanning mechanism for irradiating a measuring space with a laser beam the angular position of which is minutely modulated at a predetermined frequency, a photodetector which receives light scattered by a fine particle and converts the received light into an electrical signal, and a signal processor which extracts from the electrical signal output by the photodetector a signal component whose frequency is the same as or double that of a modulating signal for the minute scanning with the laser beam and which has a constant phase difference in terms of time with respect to the modulating signal. Thus, it is possible to measure fine particles with high sensitivity without substantially disturbing the environment inside the process unit or the process itself.

    摘要翻译： 一种微粒测量装置，被设计用于测量附着在用于形成膜，蚀刻，清洁等的处理单元中的用于半导体器件的基板的表面的细颗粒，以及悬浮在基板表面上方的空间中的细颗粒 使用由这些细颗粒引起的激光束的散射。 该测量装置包括：激光束扫描机构，用于以预定频率微调其角度位置的激光束照射测量空间;光电检测器，其接收由微粒散射的光并将接收的光转换成电信号 以及信号处理器，其从由光电检测器输出的电信号中提取频率与用于用激光束进行微小扫描的调制信号的频率相同或者是两倍的信号分量，并且其在时间上具有恒定的相位差 相对于调制信号。 因此，可以以高灵敏度测量细颗粒，而基本上不会干扰处理单元内的环境或过程本身。

    Fine-particle measuring apparatus
    2.
    发明授权
    Fine-particle measuring apparatus 失效
    细颗粒测量仪

    公开(公告)号：US5030842A

    公开(公告)日：1991-07-09

    申请号：US540893

    申请日：1990-06-20

    申请人： Masao Koshinaka ,  Minoru Akiyama ,  Toshimasa Tomoda

    发明人： Masao Koshinaka ,  Minoru Akiyama ,  Toshimasa Tomoda

    IPC分类号： G01N21/88 ,  G01N15/02 ,  G01N15/14 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

    CPC分类号： G01N15/0205 ,  G01N21/94 ,  G01N2015/145 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501

    摘要： A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate of a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles. The measuring apparatus comprises a laser light phase modulator for generating two laser beams which have the same wavelength and the phase difference between which is modulated at a predetermined frequency, an optical system which causes the two laser beams to intersect each other within a space containing the fine particles being the objects of measurement, a photodetector which receives light scattered by any of the fine particles in the region which the two laser beams intersect, and converts the received light into an electrical signal, and a signal processor which extracts from the electrical signal based on the scattered light of a signal component whose frequency is the same as or double that of a phase modulating signal for the modulation effected in the laser beam phase modulator and which has a constant phase difference with respect to the phase modulating signal. Thus, it is possible to measure fine particles with high spatial resolving power without substantially disturbing the environment inside the process unit or the process itself.

    摘要翻译： 一种微粒测量装置，设计用于测量附着在半导体器件的基板的表面上的细颗粒，该半导体器件的基板的表面设置在用于形成膜，蚀刻，清洁等的处理单元中，以及悬浮在基板表面上方的空间中的细颗粒 使用由这些细颗粒引起的激光束的散射。 测量装置包括激光相位调制器，用于产生具有相同波长的两个激光束，并且其相位差以预定频率被调制;使得两个激光束在包含该两个激光束的空间内彼此相交的光学系统 作为测量对象的微粒子，接收由两个激光束相交的区域中的任何细颗粒散射的光并将接收的光转换为电信号的光检测器，以及从电信号中提取的信号处理器 基于在激光束相位调制器中进行的调制的相位调制信号的频率相同或相反的信号分量的散射光，并且相对于相位调制信号具有恒定的相位差。 因此，可以测量具有高空间分辨能力的细颗粒，而基本上不会干扰处理单元内的环境或过程本身。

    Thin film forming apparatus
    3.
    发明授权
    Thin film forming apparatus 失效
    薄膜成型装置

    公开(公告)号：US5305366A

    公开(公告)日：1994-04-19

    申请号：US817660

    申请日：1992-01-07

    申请人： Takehiko Nakahara ,  Masao Koshinaka ,  Nobuyuki Kosaka ,  Toshimasa Tomoda

    发明人： Takehiko Nakahara ,  Masao Koshinaka ,  Nobuyuki Kosaka ,  Toshimasa Tomoda

    IPC分类号： G01N23/223 ,  G01N23/225 ,  H01L21/66

    CPC分类号： G01N23/2252 ,  G01N23/223 ,  G01N23/2257 ,  G01N2223/076

    摘要： This invention relates to a method and apparatus for analyzing a plurality of elements that are present on the surface of a material of interest or in its neighborhood, as well as a thin-film forming apparatus that is capable of measuring the composition of a sample during thin film formation in the process of semi-conductor fabrication. The apparatus are characterized in that a detector is isolated from the light and heat generated in a sample making mechanism by means of a shield which is not only heat-resistant but also transmissive of fluorescent X-ray containing soft X-rays of 1 Kev and below and that a mirror for total reflection of X-rays which is equipped with slits capable of adjusting the incident and exit angles of fluorescent X-rays from the sample excited with an excitation source as well as the ranges of those angles is provided either at the entrance or exit of said shield or at both.

    摘要翻译： 本发明涉及一种用于分析存在于感兴趣的材料的表面上或其附近的多个元素的方法和装置，以及能够测量样品组成的薄膜形成装置 半导体制造过程中的薄膜形成。 该装置的特征在于，检测器借助于不仅耐热而且还透射含有1Kev的软X射线的荧光X射线的屏蔽而与样品制造机构中产生的光和热隔离， 并且配备有能够调节来自激发源激发的样品的荧光X射线的入射角和出射角度的狭缝以及这些角度的范围的X射线的全反射镜，可以在 所述护罩的入口或出口或两者。

    Inspection device for detecting defects in a periodic pattern on a semiconductor wafer
    5.
    发明授权
    Inspection device for detecting defects in a periodic pattern on a semiconductor wafer 失效
    用于检测半导体晶片周期性图案中的缺陷的检查装置

    公开(公告)号：US5170063A

    公开(公告)日：1992-12-08

    申请号：US661140

    申请日：1991-02-27

    申请人： Yoko Miyazaki ,  Hitoshi Tanaka ,  Nobuyuki Kosaka ,  Toshimasa Tomoda

    发明人： Yoko Miyazaki ,  Hitoshi Tanaka ,  Nobuyuki Kosaka ,  Toshimasa Tomoda

    IPC分类号： G01N21/88 ,  G01N21/956 ,  G03H1/00 ,  G06T1/00

    CPC分类号： G01N21/95623 ,  G03H1/00

    摘要： An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam is guided to a semiconductor wafer having a periodic pattern thereon by mirrors and a beam expander. The light scattered from the specimen is collected by a lens on a photographic plate. The reference beam is guided to the photographic plate via a second beam expander and another mirror. The intensity of the reference beam is adjusted to a level at which the reference beams interferes on the photographic plate with the light scattered from defects in the periodic pattern and collected by the lens. Thus, a hologram of the defects in the pattern is recorded on the photographic plate. After development, the photographic plate is returned to its original position and used to form a holographic image of the defects with a transmitted regeneration light beam.

    摘要翻译： 用于检测半导体晶片周期性图案中的缺陷的检查装置包括激光振荡器。 在曝光过程中，从激光振荡器发射的光被分成目标光束和参考光束。 目标光束通过反射镜和光束扩展器被引导到其上具有周期性图案的半导体晶片。 从样本散射的光由照相板上的透镜收集。 参考光束通过第二光束扩展器和另一个反射镜被引导到照相板。 参考光束的强度被调整到参考光束干涉照相板的水平，其中光从周期性图案中的缺陷散射并由透镜收集。 因此，图案上的缺陷的全息图被记录在照相板上。 在显影之后，照相板返回其原始位置，并用于通过发射的再生光束形成缺陷的全息图像。

    Neutron detector for use within nuclear reactor
    7.
    发明授权
    Neutron detector for use within nuclear reactor 失效
    用于核反应堆的中子检测器

    公开(公告)号：US4410483A

    公开(公告)日：1983-10-18

    申请号：US271880

    申请日：1981-06-09

    申请人： Toshimasa Tomoda

    发明人： Toshimasa Tomoda

    IPC分类号： G01T3/00 ,  H01J47/12

    CPC分类号： H01J47/1238 ,  H01J47/12

    摘要： An improved long operating lifetime ionization chamber type neutron detector for use within a nuclear reactor. The chamber contains uranium U-235 as the neutron sensitive material and helium or argon fill gas. The atom rate of U-235 to fill gas is from 0.45 to 1.8 for helium, and 2.3 to 9 for argon.

    摘要翻译： 在核反应堆内使用改进的长寿命电离室型中子探测器。 该腔室包含铀U-235作为中子敏感材料和氦气或氩气填充气体。 U-235填充气体的原子率为氦的0.45〜1.8，氩的原子比为2.3〜9。

    Ionization chamber having coaxially arranged cylindrical electrodes
    9.
    发明授权
    Ionization chamber having coaxially arranged cylindrical electrodes 失效
    电离室具有同轴排列的圆柱形电极

    公开(公告)号：US4379248A

    公开(公告)日：1983-04-05

    申请号：US36236

    申请日：1979-05-04

    申请人： Naoki Wakayama ,  Hideshi Yamagishi ,  Toshimasa Tomoda ,  Hiroji Tanaka

    发明人： Naoki Wakayama ,  Hideshi Yamagishi ,  Toshimasa Tomoda ,  Hiroji Tanaka

    IPC分类号： G01T1/185 ,  H01J47/02 ,  H01J1/92 ,  H01J17/04

    CPC分类号： H01J47/02

    摘要： An ionization chamber comprises a plurality of cylindrical electrodes which are coaxially arranged, and a casing which holds the cylindrical electrodes in it under the condition allowing the axial shifting of the edges of the cylindrical electrodes but preventing the radial shifting of the cylindrical electrodes whereby the slight relative deviation of parts for the ionization chamber can be minimized during use at high temperature or during a severe thermal cycle.

    摘要翻译： 电离室包括同轴布置的多个圆柱形电极和在允许圆柱形电极的边缘轴向移动但防止圆柱形电极的径向移动的条件下将圆柱形电极保持在其中的壳体，由此轻微 在高温使用期间或在严重的热循环期间，电离室的部件的相对偏差可以最小化。

    Gamma-ray compensated ionization chamber
    10.
    发明授权
    Gamma-ray compensated ionization chamber 失效
    伽马射线补偿电离室

    公开(公告)号：US4302696A

    公开(公告)日：1981-11-24

    申请号：US56265

    申请日：1979-07-10

    申请人： Naoaki Wakayama ,  Toshimasa Tomoda ,  Shinji Fukakusa

    发明人： Naoaki Wakayama ,  Toshimasa Tomoda ,  Shinji Fukakusa

    IPC分类号： H01J47/02 ,  G01T1/185 ,  G01T3/00 ,  H01J47/12 ,  H01J47/08

    CPC分类号： H01J47/1216

    摘要： A gamma-ray compensated ionization chamber having cylindrical multiplex electrodes comprises first cylindrical multiplex electrodes and second cylindrical multiplex electrodes being arranged in reverse orders to that of the first cylindrical multiplex electrodes in the longitudinal direction of the cylindrical electrodes to prevent the deterioration of compensating characteristics caused by the variation of an external temperature and variation of gamma-ray spectrum.

    摘要翻译： 具有圆柱形多路复用电极的伽马射线补偿电离室包括第一圆柱形多路复用电极和第二圆柱形多路复用电极，其与圆柱形电极的纵向方向上的第一圆柱形多路复用电极的顺序相反排列，以防止引起的补偿特性的劣化 通过外部温度的变化和伽马射线谱的变化。