Method for manufacturing shadow mask and etching-resistant layer-coating
apparatus
    1.
    发明授权
    Method for manufacturing shadow mask and etching-resistant layer-coating apparatus 失效
    荫罩和耐蚀刻层涂装置的制造方法

    公开(公告)号:US6117774A

    公开(公告)日:2000-09-12

    申请号:US943939

    申请日:1997-09-30

    摘要: A method of manufacturing a shadow mask by making use of a coating apparatus, wherein a gravure roll 20 mm to 60 mm in diameter is disposed below a metallic thin plate and any supporting member is not disposed at an opposite side portion of the metallic thin plate to be contacted with the gravure roll. An etching resistant liquid is fed onto the gravure roll being rotated in a direction opposite to that of the metallic thin plate and at a peripheral speed of 4 to 25 times as high as that of a feeding speed of the metallic thin plate, and an excessive portion of the etching resistant liquid is wiped away by the doctor blade before the etching resistant liquid is transferred to the metallic thin plate thereby to form an etching resistant layer on the metallic thin plate.

    摘要翻译: 通过使用涂布装置制造荫罩的方法,其中直径为20mm至60mm的凹版辊设置在金属薄板的下方,并且任何支撑构件不设置在金属薄板的相对侧部分 与凹版辊接触。 将耐蚀刻液体供给到沿与金属薄板的方向相反的方向旋转的凹版辊,并且以与金属薄板的进给速度相同的4至25倍的圆周速度进给, 在将耐腐蚀液体转移到金属薄板之前,防刮蚀液体的一部分被刮刀擦拭,从而在金属薄板上形成耐蚀刻层。

    Color cathode ray tube and method of manufacturing the same
    2.
    发明授权
    Color cathode ray tube and method of manufacturing the same 失效
    彩色阴极射线管及其制造方法

    公开(公告)号:US6060112A

    公开(公告)日:2000-05-09

    申请号:US151654

    申请日:1998-09-11

    IPC分类号: H01J9/14 H01J29/07 B05D5/06

    CPC分类号: H01J9/146

    摘要: A color cathode ray tube is disclosed in which a coating containing an aluminum-phosphorus compound and fine particles of at least one of tungsten oxide and bismuth oxide is formed on the surface of a shadow mask on the side of an electron gun.

    摘要翻译: 公开了一种彩色阴极射线管,其中在电子枪一侧的荫罩的表面上形成含有铝 - 磷化合物的涂层和氧化钨和氧化铋中的至少一种的微粒子的涂层。

    Method for manufacturing a shadow mask
    4.
    发明授权
    Method for manufacturing a shadow mask 失效
    荫罩制造方法

    公开(公告)号:US5006432A

    公开(公告)日:1991-04-09

    申请号:US261617

    申请日:1988-10-24

    IPC分类号: B05C9/04 H01J9/14

    摘要: A shadow mask is formed by forming two photosensitive resin layers respectively on both major surfaces of a band-like metal sheet. The first resin layer is formed by coating a resin solution on the first major surface with the first major surface directed upward, and drying the solution while maintaining the metal sheet horizontal. Likewise, the second resin layer is formed by coating a resin solution of the second major surface with the second major surface directed upward, and drying the solution while maintaining the metal sheet horizontal. Predetermined openings are made in the first and second resin layers by exposing and developing. Then, the bared portions of metal sheet are etched to form apertures therein.

    Method of manufacturing shadow mask
    5.
    发明授权
    Method of manufacturing shadow mask 失效
    荫罩制作方法

    公开(公告)号:US4565755A

    公开(公告)日:1986-01-21

    申请号:US583329

    申请日:1984-02-24

    CPC分类号: G03F1/20 H01J9/142

    摘要: A method of manufacturing a shadow mask comprises the steps of: forming photoresist films on two major surfaces of a sheet made of a shadow mask material; forming latent images by selectively exposing the photoresist films, respectively; developing the latent images to form photoresist film patterns, respectively; and spraying an etching solution for etching the shadow mask sheet having the photoresist film patterns onto the two major surfaces thereof to etch bared portions of the shadow mask sheet, wherein the photoresist film formed on one of the two major surfaces of the shadow mask sheet is thicker than that formed on the other of the two major surfaces. The step of spraying the etching solution comprises a first step and a subsequent second step, wherein an impact of the etching solution against the shadow mask sheet in the first step is greater than that in the second step.

    摘要翻译: 制造荫罩的方法包括以下步骤:在由荫罩材料制成的片材的两个主表面上形成光致抗蚀剂膜; 通过分别选择性地曝光光致抗蚀剂膜来形成潜像; 显影潜像分别形成光致抗蚀剂图案; 并且将用于将具有光致抗蚀剂膜图案的荫罩片蚀刻到其两个主表面上的蚀刻溶液来蚀刻荫罩片的裸露部分,其中形成在荫罩片的两个主表面之一上的光致抗蚀剂膜是 比在两个主表面的另一个上形成的厚。 喷涂蚀刻溶液的步骤包括第一步骤和随后的第二步骤,其中在第一步骤中蚀刻溶液对荫罩薄片的冲击大于第二步骤中的蚀刻溶液对荫罩薄片的冲击。

    Method of manufacturing an aperture pattern printing plate
    6.
    发明授权
    Method of manufacturing an aperture pattern printing plate 失效
    制作光刻图案印版的方法

    公开(公告)号:US5128224A

    公开(公告)日:1992-07-07

    申请号:US486746

    申请日:1990-03-01

    IPC分类号: G03F1/00 H01J9/14

    CPC分类号: H01J9/142

    摘要: A method of manufacturing an aperture pattern printing plate in a limited number of steps using only one original printing plate. The method produces transparent portions on a portion of the printing plate corresponding to a non-effective area of a shadow mask, and opaque portions on a portion of the printing plate corresponding to an effective area of a shadow mask. The method has the steps of bringing a transparent plate having an unexposed transparent photosensitive layer formed on at least one of its principal surfaces into contact with an original plate having opaque areas corresponding to apertures in a to be constructed shadow mask. A first exposure is performed on the photosensitive layer through the original plate. The photosensitive layer is then developed to render exposed portions of the photosensitive layer opaque. These opaque portions are then etched away. A portion of the photosensitive layer corresponding to the non-effective area of a shadow mask is then covered to prevent exposure. A second exposure of the photosensitive layer is then performed; thereby achieving exposure of only the portion of the photosensitive layer corresponding to an effective area of a shadow mask. The photosensitive layer is then developed to render the exposed portions of the photosensitive layer opaque. By etching away the opaque portions produced after development of the first exposure, air passages are produced on the whole surface of the transparent plate.

    Front end elements for a color cathode ray tube
    8.
    发明授权
    Front end elements for a color cathode ray tube 失效
    用于彩色阴极射线管的前端元件

    公开(公告)号:US4665338A

    公开(公告)日:1987-05-12

    申请号:US647924

    申请日:1984-05-17

    摘要: A front end element, such as a shadow mask, for a color cathode ray tube is made from an alloy including iron and nickel as its principal components; and a black oxide layer is formed integrally on the alloy base. The black oxide layer consists essentially of a spinel-type oxide with the formula Ni.sub.x Fe.sub.(3-x) O.sub.4, where x is a positive number less than 3. A front end element constructed in this way produces a higher quality picture because of reduced thermal expansion.

    摘要翻译: 用于彩色阴极射线管的诸如荫罩的前端元件由包括铁和镍作为其主要成分的合金制成; 并且在合金基体上一体地形成黑色氧化物层。 黑色氧化物层基本上由具有式NixFe(3-x)O4的尖晶石型氧化物组成,其中x是小于3的正数。以这种方式构造的前端元件由于热量降低而产生更高质量的图像 扩张。

    Method of manufacturing shadow mask
    9.
    发明授权
    Method of manufacturing shadow mask 失效
    荫罩制作方法

    公开(公告)号:US4662984A

    公开(公告)日:1987-05-05

    申请号:US769885

    申请日:1985-08-27

    摘要: A method of perforating through pores by etching in the manufacture of a shadow mask. This perforating method comprises the steps of selectively covering both surfaces of a thin metal plate with etching resistant film except a predetermined pore region; performing an etching to form recesses on the opening region of one surface of the metal plate; covering the one surface of the metal plate with an etching resistance material; etching the opening region of the other surface of the metal plate until the bottom of the etching resistance material buried in the recesses of the one surface of the metal plate is exposed; exposing both surfaces of the metal plate including the through holes by removing the etching resistant film and the etching resistant material; and etching the exposed surfaces of the metal plate again by contacting the exposed surface with an etchant.

    摘要翻译: 一种在荫罩的制造中通过蚀刻穿透孔的方法。 该穿孔方法包括以下步骤:除了预定的孔隙区域之外,选择性地覆盖薄金属板的两个表面,并具有耐蚀刻膜; 进行蚀刻以在金属板的一个表面的开口区域上形成凹部; 用耐腐蚀材料覆盖金属板的一个表面; 蚀刻金属板的另一个表面的开口区域,直到隐藏在金属板的一个表面的凹部中的耐蚀刻材料的底部露出; 通过去除耐腐蚀膜和耐蚀刻材料,暴露包括通孔的金属板的两个表面; 并且通过使暴露的表面与蚀刻剂接触来再次蚀刻金属板的暴露表面。

    Method of manufacturing shadow mask
    10.
    发明授权
    Method of manufacturing shadow mask 失效
    荫罩制作方法

    公开(公告)号:US4585518A

    公开(公告)日:1986-04-29

    申请号:US714551

    申请日:1985-03-21

    申请人: Yasuhisa Ohtake

    发明人: Yasuhisa Ohtake

    CPC分类号: C23F1/02 C23F1/28

    摘要: A method of manufacturing a shadow mask having apertures of precise shape and size, comprises the steps of forming an etching-protective film having a pattern of a number of apertures on a surface of a thin metal plate containing iron and nickel as major components, and etching the thin metal plate using an etching solution with a viscosity of 1 to 5 centipoise (cP) so as to form a number of apertures therein.

    摘要翻译: 制造具有精细形状和尺寸的孔的荫罩的方法包括以下步骤:在含有铁和镍作为主要成分的薄金属板的表面上形成具有多个孔的图案的蚀刻保护膜,以及 使用粘度为1至5厘泊(cP)的蚀刻溶液蚀刻薄金属板,以在其中形成多个孔。