公开(公告)号：US09409238B2

公开(公告)日：2016-08-09

申请号：US14389879

申请日：2012-04-09

申请人： Masatoshi Sakurai ,  Takaomi Toihara

发明人： Masatoshi Sakurai ,  Takaomi Toihara

IPC分类号： B23B27/14 ,  B23B51/00 ,  C23C30/00 ,  C23C14/34 ,  C23C28/00

CPC分类号： B23B51/00 ,  B23B2222/04 ,  B23B2222/76 ,  C22C2204/00 ,  C23C14/345 ,  C23C28/321 ,  C23C28/34 ,  C23C28/341 ,  C23C28/3455 ,  C23C28/42 ,  C23C30/005 ,  Y10T428/24975

摘要： A hard coating for a cutting tool being highly resistant to both wear and seizure; and a cutting tool coated with the hard coating. This hard coating is a multilayer film including two or more of the following layered in alternation: first coating layers including AgaCu1-a; and second coating layers including a nitride, oxide, carbide, carbonitride, or boride containing at least one element selected from among group IVA, VA, and VIA elements, aluminum, and silicon. Since the atomic proportion for the first coating layers is between 0.2 and 0.4, inclusive, the layering pitch of the first and second coating layers is between 0.2 and 100 nm, inclusive, and the total thickness is between 0.2 and 10.0 μm, inclusive, the coefficient of friction and cutting resistance can be reduced by the inclusion of silver in the coating, and provide a hard coating that exhibits superb lubricity and resistance to seizure.

摘要翻译： 用于切削工具的硬涂层对于磨损和咬合具有高度抗性; 以及用硬涂层涂覆的切削工具。 这种硬涂层是包括交替层叠的两个或更多个以下的多层膜：包括AgaCu1-a的第一涂层; 以及包含含有选自IVA，VA和VIA族元素中的至少一种元素的氮化物，氧化物，碳化物，碳氮化物或硼化物的第二涂层，铝和硅。 由于第一涂层的原子比例在0.2和0.4之间，因此第一和第二涂层的层叠间距在0.2-100nm之间，总厚度在0.2和10.0μm之间， 可以通过在涂层中包含银来降低摩擦系数和切割阻力，并提供显示出极好的润滑性和抗咬合性的硬涂层。

公开(公告)号：US20150072126A1

公开(公告)日：2015-03-12

申请号：US14389879

申请日：2012-04-09

申请人： Masatoshi Sakurai ,  Takaomi Toihara

发明人： Masatoshi Sakurai ,  Takaomi Toihara

IPC分类号： B23B51/00

CPC分类号： B23B51/00 ,  B23B2222/04 ,  B23B2222/76 ,  C22C2204/00 ,  C23C14/345 ,  C23C28/321 ,  C23C28/34 ,  C23C28/341 ,  C23C28/3455 ,  C23C28/42 ,  C23C30/005 ,  Y10T428/24975

摘要： A hard coating for a cutting tool being highly resistant to both wear and seizure; and a cutting tool coated with the hard coating. This hard coating is a multilayer film including two or more of the following layered in alternation: first coating layers including AgaCu1-a; and second coating layers including a nitride, oxide, carbide, carbonitride, or boride containing at least one element selected from among group IVA, VA, and VIA elements, aluminum, and silicon. Since the atomic proportion for the first coating layers is between 0.2 and 0.4, inclusive, the layering pitch of the first and second coating layers is between 0.2 and 100 nm, inclusive, and the total thickness is between 0.2 and 10.0 μm, inclusive, the coefficient of friction and cutting resistance can be reduced by the inclusion of silver in the coating, and provide a hard coating that exhibits superb lubricity and resistance to seizure.

摘要翻译： 用于切削工具的硬涂层对于磨损和咬合具有高度抗性; 以及用硬涂层涂覆的切削工具。 这种硬涂层是包括交替层叠的两个或更多个以下的多层膜：包括AgaCu1-a的第一涂层; 以及包含含有选自IVA，VA和VIA族元素中的至少一种元素的氮化物，氧化物，碳化物，碳氮化物或硼化物的第二涂层，铝和硅。 由于第一涂层的原子比例在0.2和0.4之间，因此第一和第二涂层的层叠间距在0.2-100nm之间，总厚度在0.2和10.0μm之间， 可以通过在涂层中包含银来降低摩擦系数和切割阻力，并提供显示出极好的润滑性和抗咬合性的硬涂层。

公开(公告)号：US20150072135A1

公开(公告)日：2015-03-12

申请号：US14389929

申请日：2012-04-02

申请人： Masatoshi Sakurai ,  Takaomi Toihara

发明人： Masatoshi Sakurai ,  Takaomi Toihara

IPC分类号： B23B51/00 ,  B23C5/16 ,  B23B27/14

CPC分类号： B23B51/00 ,  B23B27/14 ,  B23B2224/00 ,  B23B2226/00 ,  B23C5/16 ,  B23C2224/00 ,  B23C2226/00 ,  C23C14/0057 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/083 ,  C23C14/165 ,  C23C14/3464 ,  C23C30/005 ,  Y10T428/25 ,  Y10T428/257 ,  Y10T428/259

摘要： A cutting tool hard film disposed as coating on a surface of a cutting tool, includes: a hard phase that is a nitride phase, an oxide phase, a carbide phase, a carbonitride phase, or a boride phase containing at least one element out of group IVa elements, group Va elements, group VIa elements, Al, and Si; and a binding phase that is a phase containing at least one element out of Au, Ag, and Cu, the cutting tool hard film having composite structure with the hard phase and the binding phase three-dimensionally arranged.

摘要翻译： 一种在切削工具的表面上作为涂层设置的切削工具硬质膜，包括：硬质相，其为氮化物相，氧化物相，碳化物相，碳氮化物相或含有至少一种元素的硼化物相 Ⅳa族元素，Ⅴa族元素，Ⅵa族元素，Al和Si元素; 以及结合相，其是包含Au，Ag和Cu中的至少一种元素的相，所述切削工具硬膜具有三相排列的硬相和结合相的复合结构。

公开(公告)号：US20060269789A1

公开(公告)日：2006-11-30

申请号：US11434832

申请日：2006-05-17

申请人： Takaomi Toihara ,  Masatoshi Sakurai ,  Yasuo Fukui ,  Masuo Saitoh

发明人： Takaomi Toihara ,  Masatoshi Sakurai ,  Yasuo Fukui ,  Masuo Saitoh

IPC分类号： B32B9/00 ,  B32B19/00

CPC分类号： C04B35/58007 ,  C04B35/58014 ,  C04B35/58021 ,  C04B35/581 ,  C04B2235/3826 ,  C04B2235/3895 ,  Y10T428/24975 ,  Y10T428/265

摘要： A hard multilayer coating that is to be disposed on a body, including: (a) a first coating layer disposed to be held in contact with the body, the first coating layer consisting of TiAlCrX1-aNa (wherein “X” represents carbon or oxygen, and “a” represents a mixed crystal ratio satisfying 0.5≦a≦1); (b) a second coating layer disposed on the first coating layer, the second coating layer being provided by a mixture layer consisting of TiAlCrX1-bNb (wherein “b” represents a mixed crystal ratio satisfying 0.5≦b≦1) and TiAl(SiC)X1-cNc (wherein “c” represents a mixed crystal ratio satisfying 0.5≦c≦1), or provided by a multilayer including a first sublayer consisting of the TiAlCrX1-bNb and a second sublayer consisting of the TiAl(SiC)X1-cNc, which are alternately superposed on each other; and (c) a third coating layer disposed on the second coating layer and constituting an outermost layer of the hard multilayer coating, the third coating layer consisting of TiAl(SiC)X1-dNd (wherein “d” represents a mixed crystal ratio satisfying 0.5≦d≦1).

摘要翻译： 要设置在主体上的硬质多层涂层，包括：（a）设置成与本体保持接触的第一涂层，由TiAlCrX 1-a N组成的第一涂层 （其中“X”表示碳或氧，“a”表示满足0.5 <= a <= 1的混合晶体比）。 （b）设置在第一涂层上的第二涂层，第二涂层由由TiAlCr x 1-b N b b组成的混合层提供（其中“b” “表示满足0.5 <= b <= 1）和TIAL（SIC）X 1-c N C c的混合晶体比（其中”c“表示混合晶体比 满足0.5≤c<= 1），或由包括由TiAlCr x 1-b N b B组成的第一子层的多层构成，以及由TiAl （SiC）X 1-c N C c C，其彼此交替重叠; 和（c）设置在第二涂层上并构成硬质多层涂层的最外层的第三涂层，由TiAl（SiC）X 1-n N d（其中“d”表示满足0.5 <= d <1的混合晶体比）。

公开(公告)号：US07504149B2

公开(公告)日：2009-03-17

申请号：US11434832

申请日：2006-05-17

申请人： Takaomi Toihara ,  Masatoshi Sakurai ,  Yasuo Fukui ,  Masuo Saitoh

发明人： Takaomi Toihara ,  Masatoshi Sakurai ,  Yasuo Fukui ,  Masuo Saitoh

IPC分类号： B32B9/00

CPC分类号： C04B35/58007 ,  C04B35/58014 ,  C04B35/58021 ,  C04B35/581 ,  C04B2235/3826 ,  C04B2235/3895 ,  Y10T428/24975 ,  Y10T428/265

摘要： A hard multilayer coating that is to be disposed on a body, including: (a) a first coating layer disposed to be held in contact with the body, the first coating layer consisting of TiAlCrX1-aNa (wherein “X” represents carbon or oxygen, and “a” represents a mixed crystal ratio satisfying 0.5≦a≦1); (b) a second coating layer disposed on the first coating layer, the second coating layer being provided by a mixture layer consisting of TiAlCrX1-bNb (wherein “b” represents a mixed crystal ratio satisfying 0.5≦b≦1) and TiAl(SiC)X1-cNc (wherein “c” represents a mixed crystal ratio satisfying 0.5≦c≦1), or provided by a multilayer including a first sublayer consisting of the TiAlCrX1-bNb and a second sublayer consisting of the TiAl(SiC)X1-cNc, which are alternately superposed on each other; and (c) a third coating layer disposed on the second coating layer and constituting an outermost layer of the hard multilayer coating, the third coating layer consisting of TiAl(SiC)X1-dNd (wherein “d” represents a mixed crystal ratio satisfying 0.5≦d≦1).

摘要翻译： 要设置在主体上的硬质多层涂层，包括：（a）设置成与本体保持接触的第一涂层，由TiAlCrX1-aNa组成的第一涂层（其中“X”表示碳或氧 ，“a”表示满足0.5 <= a <= 1的混晶比; （b）设置在第一涂层上的第二涂层，第二涂层由由TiAlCrX1-bNb组成的混合层（其中“b”表示满足0.5≤b≤1的混晶比）和TiAl （SiC）X1-cNc（其中“c”表示满足0.5 <= c <1的混合晶体比），或由包括由TiAlCrX1-bNb组成的第一子层和由TiAl（ SiC）X1-cNc，它们彼此交替重叠; 和（c）设置在第二涂层上并构成硬多层涂层的最外层的第三涂层，由TiAl（SiC）X1-dNd组成的第三涂层（其中“d”表示满足0.5的混合晶体比 <= d <= 1）。

公开(公告)号：US08778162B2

公开(公告)日：2014-07-15

申请号：US13077537

申请日：2011-03-31

申请人： Masatoshi Sakurai ,  Takuya Shimada ,  Shinobu Sugimura ,  Satoshi Shirotori

发明人： Masatoshi Sakurai ,  Takuya Shimada ,  Shinobu Sugimura ,  Satoshi Shirotori

IPC分类号： C25D1/00 ,  C25D1/20

CPC分类号： G11B5/82 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/855 ,  G11B5/858

摘要： According to one embodiment, a stamper manufacturing method comprises electroless plating by using a master includes a substrate, a conductive underlayer formed on the substrate and having catalytic activity, projecting patterns having no catalytic activity and partially formed on a surface of the conductive underlayer having catalytic activity, and regions in which the conductive underlayer having catalytic activity is exposed between the projecting patterns to deposit selectively an amorphous conductive layer between the projecting patterns and in the regions in which the conductive underlayer is exposed, and forming stamper projections, electroplating on the stamper projections includes the projecting patterns and the amorphous conductive layer by using the amorphous conductive layer and the conductive underlayer as electrodes to form a stamper main body made of a crystalline metal, and releasing a stamper includes the stamper projections and the stamper main body from the master.

摘要翻译： 根据一个实施例，压模制造方法包括使用主体的无电镀，其包括基板，形成在基板上的具有催化活性的导电底层，具有催化活性的突出图案，并部分地形成在具有催化作用的导电底层的表面上 活性以及其中具有催化活性的导电底层在突出图案之间暴露的区域，以选择性地沉积在突出图案之间的非晶导体层和导电底层暴露的区域中，并且形成压模突起，在压模上电镀 突起包括通过使用非晶导体层和导电底层作为电极形成由结晶金属制成的压模主体的突出图案和非晶导体层，并且释放压模包括压模主体和压模主体 。

公开(公告)号：US20130309469A1

公开(公告)日：2013-11-21

申请号：US13982860

申请日：2011-02-01

申请人： Masatoshi Sakurai ,  Toshihiro Ohchi

发明人： Masatoshi Sakurai ,  Toshihiro Ohchi

IPC分类号： C23C14/14

CPC分类号： C23C14/14 ,  C23C14/06 ,  C23C14/067 ,  C23C28/044 ,  C23C28/42 ,  Y10T428/24975

摘要： A hard laminar coating having a first film and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (AlaCrbBc), while the second film is TiB2, the hard laminar coating configured to include atomic ratios a, b and c in the first film satisfying a=1−b−c, 0.2≦b≦0.7, and 0

摘要翻译： 一种硬层状涂层，其具有第一膜和第二膜，其具有各自不同的组成并且交替地层压在基底结构的表面上，其中所述第一膜为碳化物，氮化物，羧化物，氮氧化物，碳氮化物或碳 - （AlaCrbBc）的氮氧化物，而第二膜为TiB2时，硬质层状涂层被配置为包含第一膜中的原子比a，b和c，满足a = 1-bc，0.2 @ b @ 0.7和0

公开(公告)号：US20130258452A1

公开(公告)日：2013-10-03

申请号：US13730321

申请日：2012-12-28

申请人： Yuuzo KAMIGUCHI ,  Masahiro Kanamaru ,  Katsuya Sugawara ,  Keiichiro Yusu ,  Masatoshi Sakurai

发明人： Yuuzo KAMIGUCHI ,  Masahiro Kanamaru ,  Katsuya Sugawara ,  Keiichiro Yusu ,  Masatoshi Sakurai

IPC分类号： G02F1/29

CPC分类号： G02F1/29 ,  G02F1/2955

摘要： According to an embodiment, a light deflecting element includes a dielectric body, a first electrode, a second electrode, and a third electrode. Each of the second electrode and third electrode is configured to sandwich the dielectric body with the first electrode. The second electrode includes an electrode having a side that lies substantially orthogonal to an incident direction of a light beam, a side that is substantially parallel to the incident direction, and a side that intersects with the incident direction. The third electrode includes an electrode having a side that is aligned with the second electrode, a side that is substantially parallel to an incident direction of the light beam, and a side that intersects with the light beam, and that slopes in an opposite to that of the side of the second electrode that intersects with the light beam.

摘要翻译： 根据实施例，光偏转元件包括电介质体，第一电极，第二电极和第三电极。 第二电极和第三电极中的每一个被配置为将电介质体与第一电极夹在中间。 第二电极包括具有基本上垂直于光束的入射方向的一侧的电极，基本上平行于入射方向的一侧以及与入射方向相交的一侧。 第三电极包括具有与第二电极对准的一侧的电极，基本上平行于光束的入射方向的一侧和与光束相交的一侧，并且与该光束相反的一侧倾斜。 与第二电极的与光束相交的一侧。

公开(公告)号：US08507116B2

公开(公告)日：2013-08-13

申请号：US13175485

申请日：2011-07-01

申请人： Takeshi Iwasaki ,  Kaori Kimura ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

发明人： Takeshi Iwasaki ,  Kaori Kimura ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

IPC分类号： G11B5/127

CPC分类号： G11B5/8404 ,  G11B5/746 ,  G11B5/82 ,  G11B5/855 ,  Y10T428/11

摘要： According to one embodiment, a magnetic recording medium includes a substrate, a soft magnetic layer, an underlayer, a magnetic recording layer, and a protective layer, wherein the magnetic recording layer is provided with a pattern including recording portions and non-recording portions, the non-recording portions have a composition that is equal to a composition obtained by demagnetizing the recording portions, the non-recording portions contain at least one metal element selected from the group consisting of vanadium and zirconium and at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen, and the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen is contained in the non-recording portions at a higher content than the content of the at least one element selected from the group consisting of nitrogen, carbon, boron and oxygen in the recording portions.

摘要翻译： 根据一个实施例，磁记录介质包括衬底，软磁层，底层，磁记录层和保护层，其中磁记录层设置有包括记录部分和非记录部分的图案， 非记录部分的组成等于通过使记录部分退磁获得的组合物，非记录部分含有至少一种选自钒和锆的金属元素和至少一种选自组中的元素 由氮，碳，硼和氧组成，并且所述至少一种选自氮，碳，硼和氧的元素以比所述至少一种元素的含量更高的含量包含在非记录部分中 在记录部分中选自氮，碳，硼和氧。

公开(公告)号：US08440091B2

公开(公告)日：2013-05-14

申请号：US12638841

申请日：2009-12-15

申请人： Kaori Kimura ,  Yoshiyuki Kamata ,  Satoshi Shirotori ,  Masatoshi Sakurai

发明人： Kaori Kimura ,  Yoshiyuki Kamata ,  Satoshi Shirotori ,  Masatoshi Sakurai

IPC分类号： B44C1/22 ,  G11B5/82

CPC分类号： G11B5/855

摘要： According to one embodiment, a method of manufacturing a magnetic recording medium comprises forming a protective film on a ferromagnetic recording layer containing Cobalt (Co) on a substrate and forming a recess in both the protective film and the ferromagnetic recording layer at a part where a nonmagnetic layer is to be formed. The method further comprises removing Co from a part of the recess of the ferromagnetic recording layer to form the nonmagnetic layer that separates magnetic patterns made of the ferromagnetic recording layer containing Co. The nonmagnetic layer has an identical chemical composition as the ferromagnetic recording layer, except for the nonmagnetic layer having a lower Co concentration than the magnetic patterns.

摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在包含钴（Co）的铁磁记录层上形成保护膜，并在保护膜和铁磁记录层中形成凹部， 将形成非磁性层。 该方法还包括从铁磁记录层的凹部的一部分去除Co以形成分离由含有Co的铁磁记录层制成的磁图案的非磁性层。非磁性层具有与铁磁记录层相同的化学成分， 对于具有比磁图案低的Co浓度的非磁性层。