公开(公告)号：US20240198431A1

公开(公告)日：2024-06-20

申请号：US18286558

申请日：2022-02-09

申请人： Sumitomo Electric Hardmetal Corp.

发明人： Haruyo FUKUI ,  Daiji TABAYASHI ,  Momoko IIDA ,  Taisei TANAKA

IPC分类号： B23B27/14 ,  C23C14/06 ,  C23C14/32

CPC分类号： B23B27/148 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0664 ,  C23C14/067 ,  C23C14/0676 ,  C23C14/325 ,  B23B2228/105

摘要： A cutting tool comprising a base material and a coating disposed on the base material, wherein the coating comprises a first layer, the first layer consists of a MoC1-x layer formed from a compound represented by MoC1-x or a TaC1-y layer formed from a compound represented by TaC1-y, the compound represented by MoC1-x consists of a hexagonal crystal structure, the x is 0.40 or more and 0.60 or less, the compound represented by TaC1-y comprises 95% by mass or more of a hexagonal crystal structure, and the y is 0:40 or more and 0.60 or less.

公开(公告)号：US12006565B2

公开(公告)日：2024-06-11

申请号：US17821367

申请日：2022-08-22

申请人： Wilsonart LLC

发明人： Muyuan M. Ma

IPC分类号： B32B15/00 ,  B30B15/06 ,  B32B15/01 ,  B32B37/00 ,  C23C14/02 ,  C23C14/06 ,  C23C14/35

CPC分类号： C23C14/0688 ,  B30B15/062 ,  B32B15/00 ,  B32B15/01 ,  B32B15/012 ,  B32B37/0046 ,  C23C14/025 ,  C23C14/067 ,  C23C14/352

摘要： A method for coating stainless steel press plates includes preparing the stainless steel press plate for coating and coating the stainless steel press plate with a diboride doped with 1%-5% by weight aluminum to produce a diboride-aluminum coating. The step of coating includes applying the diboride-aluminum coating to a stainless steel press plate using a magnetron sputter coating system.

公开(公告)号：US11858158B2

公开(公告)日：2024-01-02

申请号：US18147260

申请日：2022-12-28

申请人： DORCO CO., LTD.

发明人： Min Joo Park ,  Sung Hoon Oh ,  Seong Won Jeong

IPC分类号： B26B21/60 ,  B26B21/40 ,  C23C14/06 ,  C23C14/34

CPC分类号： B26B21/60 ,  B26B21/4068 ,  C23C14/067 ,  C23C14/34

摘要： The present disclosure provides an improvement to razor blade coating by a physical vapor deposition method, by forming a hard coating layer as a thin coating layer in which chromium boride, which is a nanocrystalline structure having high hardness, is dispersed in an amorphous mixture of chromium and boron, thereby improving the strength and hardness of the thin coating layer and securing the bonding force by chromium in the amorphous mixture between the hard coating layer and a blade substrate on which an edge of the razor blade is formed.

公开(公告)号：US11685987B2

公开(公告)日：2023-06-27

申请号：US17081375

申请日：2020-10-27

申请人： The Swatch Group Research and Development Ltd

发明人： Christian Manasterski ,  Marion Gstalter

IPC分类号： C23C14/06 ,  C23C14/02 ,  C23C14/34 ,  C23C14/58

CPC分类号： C23C14/067 ,  C23C14/021 ,  C23C14/34 ,  C23C14/5813

摘要： A layer of lanthanum boride of stoichiometry LaBx where x is between 9 and 12 is deposited on substrate, for example a stainless steel watch dial, and subsequently treated with a laser, such that the portion(s) of the layer treated with the laser change colour according to the laser power. This produces multicoloured surfaces having high resistance to corrosion and abrasion. The layer of LaBx is deposited by PVD and by cathode sputtering, using a LaB6 target of purple-violet colour, such that the colour of the deposited layer differs from the colour of the target. The laser treatment at specific powers changes the stoichiometry of the layer in the treatment portions, such that the colour of these portions changes according to the stoichiometry obtained. At higher powers, the laser will remove the layer of LaBx. Thus the colour of the treated portions is determined by the material of the substrate.

公开(公告)号：US20180019389A1

公开(公告)日：2018-01-18

申请号：US15543070

申请日：2016-02-24

申请人： JX Nippon Mining & Metals Corporation

发明人： Atsutoshi Arakawa

IPC分类号： H01L43/12 ,  H01F41/18 ,  C23C14/34 ,  H01F1/22 ,  H01L43/10 ,  H01L43/08

CPC分类号： H01L43/12 ,  C22C19/07 ,  C22C38/00 ,  C23C14/067 ,  C23C14/3414 ,  H01F1/147 ,  H01F1/22 ,  H01F10/14 ,  H01F41/183 ,  H01L27/105 ,  H01L43/08 ,  H01L43/10

摘要： A magnetic material sputtering target formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein an oxygen content is 100 wtppm or less. Since the magnetic material sputtering target of the present invention can suppress the generation of particles caused by oxides, the present invention yields superior effects of being able to improve the yield upon producing magnetoresistive films and the like.

公开(公告)号：US09752226B2

公开(公告)日：2017-09-05

申请号：US15389259

申请日：2016-12-22

申请人： CANON ANELVA CORPORATION

发明人： Koji Tsunekawa

IPC分类号： C23C14/35 ,  C23C14/14 ,  C23C14/56 ,  C23C14/50 ,  C23C14/34 ,  C23C14/08 ,  C23C14/06 ,  H01F41/18 ,  H01J37/34 ,  H01J37/32

CPC分类号： C23C14/14 ,  C23C14/067 ,  C23C14/081 ,  C23C14/34 ,  C23C14/3407 ,  C23C14/345 ,  C23C14/3464 ,  C23C14/505 ,  C23C14/568 ,  C23C14/5806 ,  C23C14/5853 ,  C23C28/321 ,  C23C28/322 ,  C23C28/34 ,  C23C28/345 ,  H01F41/18 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3417 ,  H01L21/67207 ,  H01L43/08 ,  H01L43/12

摘要： The present invention provides a manufacturing apparatus which can realize so-called sequential substrate transfer and can improve throughput, even when one multi-layered thin film includes plural layers of the same film type. A manufacturing apparatus according to an embodiment of the present invention includes a transfer chamber, three sputtering deposition chambers each including one sputtering cathode, two sputtering deposition chambers each including two or more sputtering cathodes, and a process chamber for performing a process other than sputtering, and the three sputtering deposition chambers, the two sputtering deposition chambers, and the process chamber are arranged around the transfer chamber so that each is able to perform delivery and receipt of the substrate with the transfer chamber.

公开(公告)号：US09528180B2

公开(公告)日：2016-12-27

申请号：US14002412

申请日：2012-03-01

申请人： Jürgen Becker ,  Martin Grischke ,  Astrid Gies

发明人： Jürgen Becker ,  Martin Grischke ,  Astrid Gies

IPC分类号： C23C14/06 ,  C23C14/14 ,  C23C14/02 ,  C23C14/35 ,  C23C14/50 ,  F04B1/14 ,  F04B1/20 ,  F04B27/08 ,  F04B27/10

CPC分类号： C23C14/14 ,  C23C14/021 ,  C23C14/025 ,  C23C14/027 ,  C23C14/0605 ,  C23C14/0664 ,  C23C14/067 ,  C23C14/0682 ,  C23C14/0688 ,  C23C14/352 ,  C23C14/505 ,  F04B1/146 ,  F04B1/2078 ,  F04B27/086 ,  F04B27/109 ,  F05C2201/0496 ,  F05C2203/0808 ,  F05C2203/086 ,  F05C2251/14

摘要： The present invention relates to a coating for sliding parts that allows using diamond like carbon (DLC) or DLC-comprising coatings in combination with Molybdenum- and/or Zinc-comprising lubricants in such a manner that enhanced reduction of wear and friction in comparison to the state of the art is attained. The coating system according to the present invention comprises at least a metal-comprising carbon layer of the type Me-C/a)-C:X, whose element composition can be expressed as (MeaC1-a)1-bXb with 0.3≦a≦0.6 and 0

摘要翻译： 本发明涉及一种用于滑动部件的涂层，其允许使用类金刚石碳（DLC）或含DLC的涂层与含钼和/或含锌的润滑剂结合使用，以增加磨损和摩擦的降低，相比之下 达到了现有技术水平。 根据本发明的涂覆体系至少包含Me-C / a）-C：X型金属的碳层，其元素组成可以表示为（MeaC1-a）1-bXb，0.3≤a ≤0.6和0

公开(公告)号：US09150951B2

公开(公告)日：2015-10-06

申请号：US13103871

申请日：2011-05-09

申请人： Vladimir Gorokhovsky ,  Brad B. Heckerman ,  Yuhang Cheng

发明人： Vladimir Gorokhovsky ,  Brad B. Heckerman ,  Yuhang Cheng

IPC分类号： C23C14/02 ,  C23C14/06 ,  C23C16/02 ,  A61B17/16 ,  A61C3/02 ,  A61C5/02

CPC分类号： C23C14/0641 ,  A61B17/1615 ,  A61B2017/1602 ,  A61C3/02 ,  A61C5/42 ,  C21D6/004 ,  C21D6/005 ,  C21D6/008 ,  C22C14/00 ,  C22C19/03 ,  C22C38/001 ,  C22C38/002 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/20 ,  C22C38/22 ,  C22C38/42 ,  C22C38/44 ,  C22C38/50 ,  C22F1/10 ,  C22F1/183 ,  C23C8/02 ,  C23C8/20 ,  C23C8/24 ,  C23C8/36 ,  C23C14/021 ,  C23C14/022 ,  C23C14/024 ,  C23C14/025 ,  C23C14/0605 ,  C23C14/0611 ,  C23C14/0635 ,  C23C14/067 ,  C23C14/0676 ,  C23C14/0682 ,  C23C14/14 ,  C23C14/5806 ,  C23C14/5826 ,  C23C14/586 ,  C23C14/588 ,  C23C16/0227 ,  C23C16/0236 ,  C23C16/0272 ,  C23C16/0281 ,  C23C16/06 ,  C23C16/24 ,  C23C16/26 ,  C23C16/28 ,  C23C16/32 ,  C23C16/34 ,  C23C16/38 ,  C23C16/42 ,  C23C16/56 ,  Y10T428/24975 ,  Y10T428/252 ,  Y10T428/265 ,  Y10T428/30

摘要： A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys.

摘要翻译： 在多层金属/陶瓷粘合剂涂层上的低摩擦面涂层提供具有耐磨性和耐腐蚀性的导电基底，例如旋转工具。 顶涂层进一步提供低摩擦和抗粘性以及高压缩应力。 由顶部涂层提供的高压缩应力防止由于磨损和扭转和循环疲劳导致的刀具劣化。 在涂覆过程中严格控制基材温度以保持基材和涂层的本体特性。 当应用于形状记忆合金时，所述的涂覆方法特别有用。

公开(公告)号：US09039873B2

公开(公告)日：2015-05-26

申请号：US13919067

申请日：2013-06-17

申请人： CANON ANELVA CORPORATION

发明人： Koji Tsunekawa

IPC分类号： C23C14/56 ,  C23C14/34 ,  C23C14/58 ,  C23C14/14 ,  H01L43/08 ,  H01L43/12 ,  H01L21/67 ,  C23C28/00

CPC分类号： C23C14/14 ,  C23C14/067 ,  C23C14/081 ,  C23C14/34 ,  C23C14/3407 ,  C23C14/345 ,  C23C14/3464 ,  C23C14/505 ,  C23C14/568 ,  C23C14/5806 ,  C23C14/5853 ,  C23C28/321 ,  C23C28/322 ,  C23C28/34 ,  C23C28/345 ,  H01F41/18 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3417 ,  H01L21/67207 ,  H01L43/08 ,  H01L43/12

摘要： The present invention provides a manufacturing apparatus which can realize so-called sequential substrate transfer and can improve throughput, even when one multi-layered thin film includes plural layers of the same film type. A manufacturing apparatus according to an embodiment of the present invention includes a transfer chamber, three sputtering deposition chambers each including one sputtering cathode, two sputtering deposition chambers each including two or more sputtering cathodes, and a process chamber for performing a process other than sputtering, and the three sputtering deposition chambers, the two sputtering deposition chambers, and the process chamber are arranged around the transfer chamber so that each is able to perform delivery and receipt of the substrate with the transfer chamber.

摘要翻译： 本发明提供一种制造装置，即使在一层多层薄膜包含多层相同膜型的情况下，也能够实现所谓的顺序基板转印，并能提高生产量。 根据本发明的实施例的制造装置包括转移室，每个包括一个溅射阴极的三个溅射沉积室，每个包括两个或更多个溅射阴极的两个溅射沉积室，以及用于进行溅射以外的处理的处理室， 并且三个溅射沉积室，两个溅射沉积室和处理室布置在传送室周围，使得每个溅射沉积室能够使用传送室执行传送和接收基板。

公开(公告)号：US20130017137A1

公开(公告)日：2013-01-17

申请号：US13637812

申请日：2011-02-02

申请人： Kentaro Takahashi ,  Kazuto Andou

发明人： Kentaro Takahashi ,  Kazuto Andou

IPC分类号： C01B35/04

CPC分类号： C04B35/5805 ,  C04B35/645 ,  C04B2235/3804 ,  C04B2235/3895 ,  C04B2235/5436 ,  C04B2235/656 ,  C04B2235/6567 ,  C04B2235/721 ,  C04B2235/722 ,  C04B2235/723 ,  C04B2235/761 ,  C04B2235/77 ,  C23C14/067 ,  C23C14/3414 ,  C23C14/35

摘要： Disclosed are: a lanthanum hexaboride sintered body which contains lanthanum hexaboride as the main component, has an element nitrogen content of 0.1 to 3 mass % inclusive, contains an impurity composed of element carbon and/or at least two elements selected from La, C, O and B at a content of 0.3 vol % or less, and has a relative density of 88% or more; and a target comprising the lanthanum hexaboride sintered body. An LaB6 sintered body can be provided, which enables the production of a highly pure and dense LaB6 thin film having excellent crystallinity and a good work function and which is suitable for a sputtering target or the like.

摘要翻译： 公开了以六硼化镧为主成分的六硼化镧烧结体，其元素氮含量为0.1〜3质量％，含有由元素碳和/或至少两种选自La，C， O和B的含量为0.3体积％以下，相对密度为88％以上。 和包含六硼化镧烧结体的靶。 可以提供LaB6烧结体，其能够生产具有优异的结晶度和良好的功函数并且适用于溅射靶等的高纯度和致密的LaB6薄膜。