公开(公告)号：US06289737B1

公开(公告)日：2001-09-18

申请号：US09449979

申请日：1999-11-26

申请人： Masayuki Kouketsu ,  Masayuki Watanabe ,  Hiroshi Kagohashi

发明人： Masayuki Kouketsu ,  Masayuki Watanabe ,  Hiroshi Kagohashi

IPC分类号： G01L700

CPC分类号： G05D16/2093

摘要： In a vacuum pressure control system, the vacuum pressure in a reaction chamber 10 is measured by vacuum pressure sensors 14 and 15 (S22), the measured value is changed at a set vacuum pressure changing speed commanded from the exterior or determined and stored in advance in a controller of the system (S24). The changed value is sequentially generated as an internal command. In response to the sequentially generated internal commands, a desired value of the feedback control is changed in sequence (S26), so that the feedback control is executed as follow-up control (S27). Accordingly, the vacuum pressure in the reaction chamber 10 can be uniformly changed to a desired vacuum at a set vacuum pressure changing speed.

摘要翻译： 在真空压力控制系统中，通过真空压力传感器14和15测量反应室10中的真空压力（S22），测量值以从外部命令的设定真空压力变化速度改变或预先确定和存储 在系统的控制器中（S24）。 作为内部命令顺序生成更改的值。 响应于顺序产生的内部命令，反馈控制的期望值按顺序改变（S26），从而作为后续控制执行反馈控制（S27）。 因此，能够以设定的真空压力变化速度将反应室10内的真空压力均匀地变更为期望的真空。

公开(公告)号：US06202681B1

公开(公告)日：2001-03-20

申请号：US09496624

申请日：2000-02-02

申请人： Masayuki Kouketsu ,  Masayuki Watanabe ,  Shinichi Nitta ,  Hiroshi Takehara

发明人： Masayuki Kouketsu ,  Masayuki Watanabe ,  Shinichi Nitta ,  Hiroshi Takehara

IPC分类号： F16K3142

CPC分类号： F16K31/1221 ,  F16K37/0091 ,  F16K51/02 ,  G05D16/2093 ,  Y10T137/7762 ,  Y10T137/777

摘要： In a vacuum pressure control system constituted of a vacuum vessel, a vacuum pump sucking gas in the vacuum vessel, a vacuum proportional opening and closing valve disposed on a pipe connecting the vacuum vessel and the vacuum pump, the vacuum proportional opening and closing valve changing its opening to change the vacuum pressure in the vacuum vessel, a pressure sensor to measure the vacuum pressure in the vacuum vessel and a vacuum pressure control device to control the opening of the vacuum proportional opening and closing valve based on the output of the pressure sensor, the vacuum proportional opening and closing valve is provided with a valve seat, a valve member with a tapered surface in its outer periphery and a pilot valve, the valve member being movable along a center line of the valve seat to change a clearance area between the valve seat and the tapered surface, and the vacuum pressure control device controls a servo valve to change the pressure of air to be supplied to the pilot valve based on the output of the pressure sensor.

摘要翻译： 在由真空容器，在真空容器中吸入气体的真空泵构成的真空压力控制系统中，设置在连接真空容器和真空泵的管道上的真空比例开关阀，真空比例开关阀变化 其打开以改变真空容器中的真空压力，用于测量真空容器中的真空压力的压力传感器和真空压力控制装置，以根据压力传感器的输出来控制真空比例开关阀的打开 所述真空比例开关阀具有阀座，在其外周具有锥形表面的阀构件和先导阀，所述阀构件可沿着所述阀座的中心线移动，以改变所述阀座之间的间隙面积 阀座和锥形表面，并且真空压力控制装置控制伺服阀以改变要供应到的空气的压力 基于压力传感器输出的先导阀。

公开(公告)号：US6041814A

公开(公告)日：2000-03-28

申请号：US580358

申请日：1995-12-28

申请人： Masayuki Kouketsu ,  Masayuki Watanabe ,  Shinichi Nitta ,  Hiroshi Takehara

发明人： Masayuki Kouketsu ,  Masayuki Watanabe ,  Shinichi Nitta ,  Hiroshi Takehara

IPC分类号： F15B5/00 ,  F16K31/122 ,  F16K37/00 ,  F16K51/02 ,  G05D16/16 ,  F16K31/42

CPC分类号： F16K31/1221 ,  F16K37/0091 ,  F16K51/02 ,  G05D16/2093 ,  Y10T137/7762 ,  Y10T137/777

摘要： In a vacuum pressure control system constituted of a vacuum vessel, a vacuum pump sucking gas in the vacuum vessel, a vacuum proportional opening and closing valve disposed on a pipe connecting the vacuum vessel and the vacuum pump, the vacuum proportional opening and closing valve changing its opening to change the vacuum pressure in the vacuum vessel, a pressure sensor to measure the vacuum pressure in the vacuum vessel and a vacuum pressure control device to control the opening of the vacuum proportional opening and closing valve based on the output of the pressure sensor, the vacuum proportional opening and closing valve is provided with a valve seat, a valve member with a tapered surface in its outer periphery and a pilot valve, the valve member being movable along a center line of the valve seat to change a clearance area between the valve seat and the tapered surface, and the vacuum pressure control device controls a servo valve to change the pressure of air to be supplied to the pilot valve based on the output of the pressure sensor.

摘要翻译： 在由真空容器，在真空容器中吸入气体的真空泵构成的真空压力控制系统中，设置在连接真空容器和真空泵的管道上的真空比例开关阀，真空比例开关阀变化 其打开以改变真空容器中的真空压力，用于测量真空容器中的真空压力的压力传感器和真空压力控制装置，以根据压力传感器的输出来控制真空比例开关阀的打开 所述真空比例开关阀具有阀座，在其外周具有锥形表面的阀构件和先导阀，所述阀构件可沿着所述阀座的中心线移动，以改变所述阀座之间的间隙面积 阀座和锥形表面，并且真空压力控制装置控制伺服阀以改变要供应到的空气的压力 基于压力传感器输出的先导阀。

公开(公告)号：US06913031B2

公开(公告)日：2005-07-05

申请号：US10491955

申请日：2002-10-16

申请人： Tokuhide Nawata ,  Yoshihisa Sudoh ,  Masayuki Kouketsu ,  Masayuki Watanabe ,  Hiroki Doi

发明人： Tokuhide Nawata ,  Yoshihisa Sudoh ,  Masayuki Kouketsu ,  Masayuki Watanabe ,  Hiroki Doi

IPC分类号： G05D7/06

CPC分类号： G05D7/0647 ,  G05D7/0635 ,  Y10T137/0379 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/86421

摘要： A flow controller and a flow controlling method are adapted to be released from conventional restrictions by using a novel type called a pulse shot type. A pulse shot (opening/closing operation of a first cutoff valve (12) and, after that, opening/closing operation of a second cutoff valve (17)) is repeated. Simultaneously, a volume flow Q of process gas exhausted from the second cutoff valve (17) per unit time on the basis of after-filling pressure and after-exhaust pressure of the process gas in a gas filling capacity (13) measure by a pressure sensor (14). Furthermore, a mode of the pulse shot is changed to control the volume flow Q of the process gas exhausted from the second cutoff valve (17) per unit time.

摘要翻译： 流量控制器和流量控制方法适用于通过使用称为脉冲射击型的新颖型式从常规限制中解除。 重复脉冲（第一截止阀（12）的打开/关闭操作），之后，重新开启第二截止阀（17）的打开/关闭操作。 同时，基于填充气体（13）中的处理气体的补充压力和排气后压力，单位时间内从第二截止阀（17）排出的处理气体的体积流量Q通过压力 传感器（14）。 此外，改变脉冲射击的模式，以控制每单位时间从第二截止阀（17）排出的处理气体的体积流量Q。

公开(公告)号：US08361231B2

公开(公告)日：2013-01-29

申请号：US13498902

申请日：2010-03-30

申请人： Masayuki Kouketsu ,  Hiroshi Itafuji

发明人： Masayuki Kouketsu ,  Hiroshi Itafuji

IPC分类号： C23C16/00 ,  B05C11/00

CPC分类号： B01B1/005

摘要： Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate.

摘要翻译： 提供一种能够促进液体材料的蒸发同时解决残留液体材料的问题的液体蒸发系统。 液体蒸发系统具有液体蒸发装置，其具有泵和蒸发器。 蒸发器具有壳体，设置在壳体内部的加热器，由加热器加热的蓄热板和网。 网格通过交织线形成并具有整体平板形状。 通过在存储板的上表面上重叠网格，通过网格在储热板上形成微小的凹凸。 在网格上方设有喷嘴，由此液体材料从喷嘴落到储热板上。 液体材料以薄膜的形式在储热板上展开，并在储热板的上表面被加热和汽化。

公开(公告)号：US06508268B1

公开(公告)日：2003-01-21

申请号：US09438956

申请日：1999-11-12

申请人： Masayuki Kouketsu

发明人： Masayuki Kouketsu

IPC分类号： F16K3142

CPC分类号： F16K1/46 ,  F16K41/10 ,  F16K51/02 ,  Y10S251/90 ,  Y10T137/7761 ,  Y10T137/7762

摘要： A vacuum pressure control apparatus includes a vacuum proportional opening and closing valve 18 which is disposed on a pipe connecting a vacuum chamber 11 and a vacuum pump 19 and changes its opening to control the vacuum pressure in the vacuum chamber 11, and a pressure sensor 17 which measures the current vacuum pressure in the chamber 11. The vacuum proportional opening and closing valve 18 has a valve seat 36 and a valve member 33 provided with an O-ring 35 which is made contact with or separate from the valve seat 36. The vacuum pressure control apparatus configured as above controls the pressure in the chamber 11 by changing an elastic deformation amount of the O-ring 35 which is in contact with the valve seat 36 and thereby changing the flow quantity of gas leaking between the valve seat 36 and the O-ring 35.

摘要翻译： 真空压力控制装置包括真空比例开关阀18，其设置在连接真空室11和真空泵19的管道上，并改变其开度以控制真空室11中的真空压力，以及压力传感器17 其测量室11中的当前真空压力。真空比例开关阀18具有阀座36和设置有与阀座36接触或分离的O形环35的阀构件33。 如上构造的真空压力控制装置通过改变与阀座36接触的O形环35的弹性变形量来控制室11中的压力，从而改变阀座36与阀座36之间的泄漏气体的流量 O形圈35。

公开(公告)号：US08573560B2

公开(公告)日：2013-11-05

申请号：US13413593

申请日：2012-03-06

申请人： Hiroshi Itafuji ,  Masayuki Kouketsu

发明人： Hiroshi Itafuji ,  Masayuki Kouketsu

IPC分类号： F16K31/00

CPC分类号： H01L21/6719 ,  H01L21/67253 ,  Y10T137/0318 ,  Y10T137/2562 ,  Y10T137/2572 ,  Y10T137/7758 ,  Y10T137/7761 ,  Y10T137/777

摘要： The invention provides a vacuum control valve configured to control the vacuum pressure in the vacuum chamber. The vacuum control valve includes a control valve main body, an operation unit, a cylinder, a biasing unit, and a bellofram. The operation unit and the cylinder include a valve opening manipulation chamber and a shutoff load generation chamber. The shutoff load generation chamber is configured to have a common axial center line with the valve opening manipulation chamber and to generate a load applied to the operation unit in a direction for reducing the lift in accordance with a supply of the working fluid. And the shutoff load generation chamber may be formed in an interior of the rod.

摘要翻译： 本发明提供了一种配置成控制真空室中的真空压力的真空控制阀。 真空控制阀包括控制阀主体，操作单元，气缸，偏压单元和打开阀。 操作单元和气缸包括开阀操作室和关闭负载产生室。 关闭负荷产生室被构造成与阀打开操作室具有共同的轴向中心线，并且根据工作流体的供给沿着减小升程的方向产生施加到操作单元的负载。 并且关闭负载产生室可以形成在杆的内部。

公开(公告)号：US08544500B2

公开(公告)日：2013-10-01

申请号：US13108909

申请日：2011-05-16

申请人： Hiroshi Itafuji ,  Masayuki Kouketsu

发明人： Hiroshi Itafuji ,  Masayuki Kouketsu

IPC分类号： F16K11/10 ,  B08B9/032

CPC分类号： F16K27/003 ,  F16K27/0236 ,  Y10T137/4259 ,  Y10T137/8158 ,  Y10T137/87249 ,  Y10T137/87925

摘要： This invention provides a chemical fluid flow channel coupling apparatus that couples and decouples chemical fluid flow channels. The coupling apparatus includes a first coupling unit; and a second coupling unit. The first coupling unit includes a first chemical fluid valve member chamber and a first valve member configured to open and close a first chemical fluid opening communicated with the first chemical fluid flow channel; and a purging fluid supply control valve configured to open and close the purging fluid supply flow channel. The second coupling unit includes a second chemical fluid valve member chamber, and a second valve member configured to open and close a second chemical fluid opening connected to the second chemical fluid flow channel; and a purging fluid discharge control valve.

摘要翻译： 本发明提供一种化学流体流动通道联接装置，其耦合和分离化学流体流动通道。 联接装置包括：第一联接单元; 和第二耦合单元。 第一联接单元包括第一化学流体阀构件室和构造成打开和关闭与第一化学流体流动通道连通的第一化学流体开口的第一阀构件; 以及构造成打开和关闭清洗流体供给流动通道的清洗液供应控制阀。 第二联接单元包括第二化学流体阀构件室和构造成打开和关闭连接到第二化学流体流动通道的第二化学流体开口的第二阀构件; 和清洗液排出控制阀。

公开(公告)号：US08840049B2

公开(公告)日：2014-09-23

申请号：US13264742

申请日：2010-04-16

申请人： Masayuki Kouketsu ,  Hiroshi Itafuji

发明人： Masayuki Kouketsu ,  Hiroshi Itafuji

IPC分类号： B05C1/02 ,  B05C5/02 ,  B05B1/04 ,  B05B1/30

CPC分类号： B05C5/0283 ,  B05B1/044 ,  B05B1/3013 ,  B05C5/0225 ,  B05C5/0258

摘要： A liquid ejecting apparatus having a storage portion (20) for storing a treatment liquid, a slit-shaped opening portion (41) for ejecting the treatment liquid, and a connecting passage (42) that has a slit-shaped cross-section and connects the storage portion (20) to the slit-shaped opening portion (41) includes: a valve body portion (50) that is provided in the storage portion (20) to cover the connecting passage (42), and forms a gap (22) together with a lower wall (43) of the storage portion (20) so that the treatment liquid is caused to flow into the connecting passage (42) through the gap (22); a first curved surface portion (44a) that smoothly connects a surface of the lower wall (43) of the storage portion (20) to an inner wall surface (42a) of the connecting passage (42); and a second curved surface portion (51a) that is provided on the valve body portion (50) so as to project to an identical side to the first curved surface portion (44a). With this constitution, air bubbles can be prevented from intermixing with the treatment liquid ejected from the slit-shaped opening portion (41).

摘要翻译： 一种液体喷射装置，具有用于储存处理液的储存部分（20），用于喷射处理液体的狭缝形开口部分（41）和具有狭缝形横截面的连接通道（42） 所述狭缝状开口部（41）的所述收纳部（20）具有：阀体部（50），其设置在所述收纳部（20）中，以覆盖所述连结通路（42），形成间隙 ）与存储部（20）的下壁（43）一起，使得处理液通过间隙（22）流入连接通道（42）; 第一弯曲表面部分（44a），其将所述存储部分（20）的下壁（43）的表面平滑地连接到所述连接通道（42）的内壁表面（42a）; 以及设置在阀体部分（50）上以与第一曲面部分（44a）相同的一侧突出的第二弯曲表面部分（51a）。 利用这种构造，可以防止气泡与从狭缝状开口部（41）喷出的处理液混合。

公开(公告)号：US08210196B2

公开(公告)日：2012-07-03

申请号：US12986119

申请日：2011-01-06

申请人： Hiroshi Itafuji ,  Masayuki Kouketsu

发明人： Hiroshi Itafuji ,  Masayuki Kouketsu

IPC分类号： G05D11/00

CPC分类号： H01L21/6719 ,  H01L21/67253 ,  Y10T137/0318 ,  Y10T137/2562 ,  Y10T137/2572 ,  Y10T137/7758 ,  Y10T137/7761 ,  Y10T137/777

摘要： A vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber. The vacuum control system includes: a plurality of vacuum control valves, each of the valves being connected between each of a plurality of gas discharge ports and the vacuum pump; a pressure measurement unit configured to measure the vacuum pressure of the processing gas supplied to the object; and a controller configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure.

摘要翻译： 一种使用真空泵来控制真空室中的真空压力和处理气体流的真空控制系统。 真空控制系统包括：多个真空控制阀，每个阀连接在多个排气口和真空泵中的每一个之间; 压力测量单元，被配置为测量供给到所述物体的处理气体的真空压力; 以及控制器，其被配置为根据所测量的真空压力来操纵所述阀的相应开口。