公开(公告)号：US09793479B2

公开(公告)日：2017-10-17

申请号：US13714934

申请日：2012-12-14

Applicant: Massachusetts Institute of Technology

Inventor： Karen K. Gleason ,  Vladimir Bulovic ,  Miles C. Barr ,  David C. Borrelli

IPC: H01L51/00 ,  H01L51/42 ,  H01L51/56 ,  B82Y10/00

CPC classification number: H01L51/0008 ,  B82Y10/00 ,  H01L51/0036 ,  H01L51/0046 ,  H01L51/0047 ,  H01L51/42 ,  H01L51/56 ,  Y02E10/549

Abstract: Embodiments described herein provide methods for processing various polymer materials for use in devices, such as photovoltaic devices. In some cases, oxidative chemical vapor deposition (oCVD) may be used to process conjugated polymers, including relatively insoluble conjugated polymers. The methods described herein provide processing techniques that may be used to synthesize and/or process polymers, such as unsubstituted thiophene.

公开(公告)号：US20180009001A1

公开(公告)日：2018-01-11

申请号：US15547135

申请日：2016-01-29

Applicant: Massachusetts Institute of Technology

Inventor： Adam T. Paxson ,  David C. Borrelli ,  Kripa K. Varanasi ,  Karen K. Gleason

IPC: B05D1/00

CPC classification number: B05D1/60 ,  B05D5/083 ,  B05D7/22 ,  B05D2502/00 ,  B05D2506/10

Abstract: Disclosed are methods for forming thin polymeric films on a surface of an article by deposition from the vapor phase. In certain embodiments, the method comprises depositing the polymeric film in situ inside a space or enclosure contained within the article. In other embodiments, the method comprises depositing a film from vapor phase by thermal degradation of an initiator precursor without the need for an external filament.