公开(公告)号：US09579174B2

公开(公告)日：2017-02-28

申请号：US14233209

申请日：2012-07-11

申请人： Matsuo Yamamoto ,  Takashi Takiguchi ,  Masanori Sato ,  Kengo Uemura ,  Tomomi Hikida ,  Katsuyuki Inagaki ,  Hideo Kozaka ,  Toshiaki Miyamoto

发明人： Matsuo Yamamoto ,  Takashi Takiguchi ,  Masanori Sato ,  Kengo Uemura ,  Tomomi Hikida ,  Katsuyuki Inagaki ,  Hideo Kozaka ,  Toshiaki Miyamoto

IPC分类号： A61C17/02 ,  A61C17/20 ,  A61C1/00 ,  A61C1/08 ,  A61C1/07

CPC分类号： A61C17/20 ,  A61C1/0061 ,  A61C1/07 ,  A61C1/088 ,  A61C17/0202 ,  A61C17/0208

摘要： This invention is achieved to provide a water-flow ultrasonic oral-cavity cleaning device. In the water-flow ultrasonic oral-cavity cleaning device (1), cleaning liquid (W1) from a cleaning-liquid supplying device (2) is supplied into a transducer case (21) through a supply port (26). Ultrasonic waves (S1) are propagated into the cleaning liquid W1 from an ultrasonic transducer (22) mounted in a transducer mounting part (23) inside the transducer case (21). The water-flow of the cleaning liquid (W1) is collected at the apical-part inside the transducer case (21), and then emitted from the issue (27) into the oral cavity, wherein power supply of 100W or less is supplied to the ultrasonic transducer (22) of 50 mm or less in diameter to propagate the ultrasonic waves (S1) of 100 kHz or more to 3 MHz or less in frequency into the cleaning liquid (W1).

摘要翻译： 实现本发明以提供一种水流超声口腔清洁装置。 在水流超声波口腔清洗装置（1）中，来自清洗液供给装置（2）的清洗液（W1）通过供给口（26）供给到换能器壳体（21）。 超声波（S1）从安装在换能器壳体（21）内的换能器安装部（23）的超声波换能器（22）传播到清洗液W1中。 清洗液（W1）的水流被收集在换能器壳体（21）内的顶部，然后从问题（27）发射到口腔中，其中供给100W以下的电力供给 所述超声波换能器（22）的直径为50mm以下，以将频率为100kHz以上的超声波（S1）频率传播至3MHz以下的频率进入清洗液（W1）。

公开(公告)号：US20140147804A1

公开(公告)日：2014-05-29

申请号：US14233209

申请日：2012-07-11

申请人： Matsuo Yamamoto ,  Takashi Takiguchi ,  Masanori Sato ,  Kengo Uemura ,  Tomomi Hikida ,  Katsuyuki Inagaki ,  Hideo Kozaka ,  Toshiaki Miyamoto

发明人： Matsuo Yamamoto ,  Takashi Takiguchi ,  Masanori Sato ,  Kengo Uemura ,  Tomomi Hikida ,  Katsuyuki Inagaki ,  Hideo Kozaka ,  Toshiaki Miyamoto

IPC分类号： A61C17/20 ,  A61C1/00 ,  A61C1/08 ,  A61C17/02

CPC分类号： A61C17/20 ,  A61C1/0061 ,  A61C1/07 ,  A61C1/088 ,  A61C17/0202 ,  A61C17/0208

摘要： This invention is achieved to provide a water-flow ultrasonic oral-cavity cleaning device and a method for water-flow ultrasonic oral-cavity cleaning for surely and efficiently cleaning an oral cavity. In the water-flow ultrasonic oral-cavity cleaning device 1, cleaning liquid W1 from a cleaning-liquid supplying device 2 is supplied into a transducer case 21 through a supply port 26. Ultrasonic waves S1 are propagated into the cleaning liquid W1 from an ultrasonic transducer 22 mounted in a transducer mounting part 23 inside the transducer case 21. The water-flow of the cleaning liquid W1 is collected at the apical-part inside the transducer case 21, and then emitted from the issue 27 into the oral cavity, wherein power supply of 100W or less is supplied to the ultrasonic transducer 22 of 50 mm or less in diameter to propagate the ultrasonic waves S1 of 100 kHz or more to 3 MHz or less in frequency into the cleaning liquid W1.

摘要翻译： 本发明的目的是提供一种水流超声口腔清洁装置和用于确保和有效地清洁口腔的水流超声口腔清洁方法。 在水流超声波口腔清洁装置1中，来自清洗液供给装置2的清洗液W1通过供给口26供给到换能器壳体21中。超声波S1从超声波传播到清洗液W1中 换能器22安装在换能器壳体21内的换能器安装部23中。清洁液W1的水流被收集在换能器壳体21内的顶部，然后从问题27发射到口腔中，其中 将100W以下的电源供给到直径为50mm以下的超声波振子22，将超过100kHz以上的超声波S1频率传播至3MHz以下的频率进入清洗液W1。

公开(公告)号：US06619301B2

公开(公告)日：2003-09-16

申请号：US09738851

申请日：2000-12-15

申请人： Kazuki Kobayashi ,  Hitoshi Ono ,  Yasunobu Tagusa ,  Tomomi Hikida ,  Yuichi Maida

发明人： Kazuki Kobayashi ,  Hitoshi Ono ,  Yasunobu Tagusa ,  Tomomi Hikida ,  Yuichi Maida

IPC分类号： B08B310

CPC分类号： H01L21/67051 ,  B08B3/123 ,  G03F7/428 ,  H05K3/0085 ,  H05K3/26 ,  Y10S134/902

摘要： To provide an ultrasonic processing device that is capable of effectively carrying out a cleaning operation, a resist-stripping operation, etc. by projecting ultrasonic uniformly over an entirety of the ultrasonic processing target region by means of ultrasonic oscillation elements each having a width smaller than an ultrasonic processing target region of a processing object, as well as to provide an electronic parts fabrication method using the foregoing device, a plurality of ultrasonic oscillation elements are arranged so as to planarly extend in a glass substrate transport direction and in a glass substrate width direction, and projected figures obtained by projecting said ultrasonic oscillation elements to a plane perpendicular to the glass substrate transport direction form a single belt-like region of a width exceeding a width of the ultrasonic processing target region. The foregoing arrangement causes ultrasonic-projected regions of the ultrasonic oscillation elements to partly overlap each other on a surface of the glass substrate when the glass substrate is transported by transport rollers in the transport direction, thereby enabling ultrasonic projection over the complete entirety of the ultrasonic processing target region.

摘要翻译： 为了提供能够通过超声波振荡元件均匀地超声波超声波处理对象区域的超声波均匀化而进行清洗动作，抗蚀剂剥离动作等的超声波处理装置。 处理对象的超声波处理对象区域，以及提供使用上述装置的电子部件制造方法，多个超声波振荡元件被布置成在玻璃基板输送方向和玻璃基板宽度上平面地延伸 通过将所述超声波振动元件投射到与玻璃基板输送方向垂直的平面而获得的方向和投影图形形成宽度超过超声波处理对象区域的宽度的单个带状区域。 当玻璃基板由输送辊沿输送方向输送时，上述布置使得超声波振荡元件的超声波投影区域在玻璃基板的表面上部分地彼此重叠，从而能够超过整个超声波的超声波投影 加工目标区域。