Configurable prober for TFT LCD array test
    1.
    发明授权
    Configurable prober for TFT LCD array test 有权
    可配置探针用于TFT LCD阵列测试

    公开(公告)号:US07355418B2

    公开(公告)日:2008-04-08

    申请号:US10903216

    申请日:2004-07-30

    IPC分类号: G01R31/305

    摘要: An improved prober for an electronic devices test system is provided. The prober is “configurable,” meaning that it can be adapted for different device layouts and substrate sizes. The prober generally includes a frame, at least one prober bar having a first end and a second end, a frame connection mechanism that allows for ready relocation of the prober bar to the frame at selected points along the frame, and a plurality of electrical contact pins along the prober bar for placing selected electronic devices in electrical communication with a system controller during testing. In one embodiment, the prober is be used to test devices such as thin film transistors on a glass substrate. Typically, the glass substrate is square, and the frame is also square. In this way, “x” and “y” axes are defined by the frame. The electrical pins may be movable along the axial length of the prober bars, or may be selectively pushed down to contact selected contact pads on the substrate.

    摘要翻译: 提供了一种用于电子设备测试系统的改进的探测器。 探测器是“可配置的”,这意味着它可以适用于不同的设备布局和基板尺寸。 探测器通常包括框架,至少一个具有第一端和第二端的探测杆,框架连接机构,其允许在沿着框架的选定点准备将探测杆重新定位到框架,以及多个电触点 沿着探测杆的引脚,用于在测试期间将选定的电子设备与系统控制器电连通。 在一个实施例中,探测器用于测试诸如玻璃基板上的薄膜晶体管的器件。 通常,玻璃基板是正方形的,框架也是正方形的。 以这种方式,“x”和“y”轴由框架定义。 电引脚可以沿着探针杆的轴向长度移动,或者可以选择性地向下推动以接触衬底上的所选择的接触垫。

    Integrated substrate transfer module
    2.
    发明授权
    Integrated substrate transfer module 有权
    集成基板传输模块

    公开(公告)号:US07330021B2

    公开(公告)日:2008-02-12

    申请号:US11018236

    申请日:2004-12-21

    IPC分类号: G01R13/04

    摘要: A substrate table and method for supporting and transferring a substrate are provided. The substrate table includes a segmented stage having an upper surface for supporting a substrate, and an end effector. The end effector includes two or more spaced apart fingers and an upper surface for supporting a substrate. The end effector is at least partially disposed and moveable within the segmented stage such that the fingers of the end effector and the segmented stage interdigitate to occupy the same horizontal plane. The segmented stage is adapted to raise and lower about the end effector.

    摘要翻译: 提供了用于支撑和转移衬底的衬底台和方法。 衬底台包括具有用于支撑衬底的上表面的分段段和端部执行器。 末端执行器包括两个或更多间隔开的指状物和用于支撑基底的上表面。 末端执行器至少部分地设置并在分段台内移动,使得末端执行器和分段台阶的指状物相互指向以占据相同的水平面。 分段段适于围绕末端执行器升高和降低。

    Integrated substrate transfer module
    3.
    发明授权
    Integrated substrate transfer module 有权
    集成基板传输模块

    公开(公告)号:US07919972B2

    公开(公告)日:2011-04-05

    申请号:US12016834

    申请日:2008-01-18

    IPC分类号: G01R13/00 G01R31/02

    摘要: A system and method for supporting and transferring a substrate relative to a plurality of testing columns are provided. The system includes a testing table adapted to support and move the substrate relative to the plurality of testing columns. The testing table may include an end effector disposed therein to transfer the substrate relative to an upper surface of the testing table. The method includes transferring the substrate to the testing table and moving the substrate relative to the plurality of testing columns. Signals indicative of electronic device performance are sensed to determine operability of the devices on the substrate.

    摘要翻译: 提供了一种用于相对于多个测试柱支撑和传送衬底的系统和方法。 该系统包括适于相对于多个测试柱支撑和移动衬底的测试台。 测试台可以包括设置在其中的端部执行器,以相对于测试台的上表面传送衬底。 该方法包括将衬底转移到测试台并相对于多个测试柱移动衬底。 感测指示电子设备性能的信号以确定衬底上的器件的可操作性。

    Lithography using multiple pass raster-shaped beam
    8.
    发明授权
    Lithography using multiple pass raster-shaped beam 失效
    使用多通道光栅形光束进行平版印刷

    公开(公告)号:US06433348B1

    公开(公告)日:2002-08-13

    申请号:US09625132

    申请日:2000-07-25

    IPC分类号: H01J37302

    摘要: A scanning lithography tool exposes a medium in a raster scan. The raster scan is a multi-pass scan in which the shape of the beam, while fixed for any one pass, is altered between passes. Thus, certain pixels are exposed in one or more scans using a Gaussian (round) beam while other pixels are exposed in separate scans using, for instance, a shaped (e.g., square or rectangular) shaped beam. Beam shape here refers to the cross-sectional shape of the beam as incident on the medium. This process, especially when the shaped beam is applied at the corners and slanted edges of a feature being exposed, has been found to substantially reduce the problem of edge blur otherwise typical of raster scan lithography. This process is applicable to both electron beam and laser beam raster scanning lithography.

    摘要翻译: 扫描光刻工具在光栅扫描中曝光介质。 光栅扫描是一种多遍扫描,其中在通过之间改变光束的形状,同时固定任何一个通过。 因此,某些像素使用高斯(圆形)光束在一次或多次扫描中曝光,而其他像素使用例如成形(例如,正方形或矩形)形状的光束在单独的扫描中曝光。 梁的形状是指入射在介质上的梁的横截面形状。 这个过程,特别是当成形光束被施加在被曝光的特征的拐角和倾斜边缘时,已经发现基本上减少了光栅扫描光刻的其它典型的边缘模糊的问题。 该过程适用于电子束和激光束光栅扫描光刻。