公开(公告)号：US20170372870A1

公开(公告)日：2017-12-28

申请号：US15650164

申请日：2017-07-14

Applicant: Mattson Technology, Inc.

Inventor： Valery A. Godyak ,  Charles Crapuchettes ,  Vladimir Nagorny

IPC: H01J37/32 ,  H05H1/46

CPC classification number: H01J37/3211 ,  H01J37/321 ,  H01J37/32119 ,  H01J37/32137 ,  H01J37/32174 ,  H01J37/32183 ,  H01J37/32449 ,  H01J37/32651 ,  H05H1/46 ,  H05H2001/4652

Abstract: Methods and apparatus to provide efficient and scalable RF inductive plasma processing are disclosed. In some aspects, the coupling between an inductive RF energy applicator and plasma and/or the spatial definition of power transfer from the applicator are greatly enhanced. The disclosed methods and apparatus thereby achieve high electrical efficiency, reduce parasitic capacitive coupling, and/or enhance processing uniformity. Various embodiments comprise a plasma processing apparatus having a processing chamber bounded by walls, a substrate holder disposed in the processing chamber, and an inductive RF energy applicator external to a wall of the chamber. The inductive RF energy applicator comprises one or more radiofrequency inductive coupling elements (ICEs). Each inductive coupling element has a magnetic concentrator in close proximity to a thin dielectric window on the applicator wall.