公开(公告)号：US20070242245A1

公开(公告)日：2007-10-18

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

发明人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

公开(公告)号：US20060087630A1

公开(公告)日：2006-04-27

申请号：US11212921

申请日：2005-08-29

申请人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

发明人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

IPC分类号： G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.