公开(公告)号：US20060033892A1

公开(公告)日：2006-02-16

申请号：US10917535

申请日：2004-08-13

申请人： Theodorus Cadee ,  Joost Ottens ,  Jeroen Johannes Mertens ,  Frederick De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Marco Stavenga ,  Martin Smeets ,  Aschwin Lodewijk Van Meer ,  Bart Schoondermark ,  Patricius Tinnemans ,  Stoyan Nihtianov

发明人： Theodorus Cadee ,  Joost Ottens ,  Jeroen Johannes Mertens ,  Frederick De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Marco Stavenga ,  Martin Smeets ,  Aschwin Lodewijk Van Meer ,  Bart Schoondermark ,  Patricius Tinnemans ,  Stoyan Nihtianov

IPC分类号： G03B27/52

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

摘要翻译： 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。

公开(公告)号：US20060033898A1

公开(公告)日：2006-02-16

申请号：US11205325

申请日：2005-08-17

申请人： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

发明人： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

摘要翻译： 公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。

公开(公告)号：US20070242245A1

公开(公告)日：2007-10-18

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

发明人： Maurice Wijckmans ,  Martinus Agnes Cuijpers ,  Martinus Hendrikus Leenders ,  Frits Van Der Meulen ,  Joost Ottens ,  Theodorus Cadee ,  Frederik De Jong ,  Wilhelmus Franciscus Simons ,  Edwin Augustinus Van Gompel ,  Martin Smeets ,  Rob Jansen ,  Gerardus Adrianus Kusters ,  Martijn Van Baren

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。