SEMICONDUCTOR STRUCTURE, METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR PACKAGE
    1.
    发明申请
    SEMICONDUCTOR STRUCTURE, METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR PACKAGE 有权
    半导体结构,制造半导体结构和半导体封装的方法

    公开(公告)号:US20110195568A1

    公开(公告)日:2011-08-11

    申请号:US13088954

    申请日:2011-04-18

    IPC分类号: H01L21/768 H01L21/60

    摘要: A semiconductor structure, a method for manufacturing a semiconductor structure and a semiconductor package are provided. The method for manufacturing a semiconductor structure includes the following steps. Firstly, a silicon substrate is provided. Next, a part of the silicon substrate is removed to form a ring hole and a silicon pillar surrounded by the silicon pillar. Then, a photosensitive material is disposed in the ring hole, wherein the photosensitive material is insulating. After that, the silicon pillar is removed, such that the ring hole forms a through hole and the photosensitive material covers a lateral wall of the through hole. Lastly, the conductive material is disposed in the through hole, wherein the outer surface of the conductive material is surrounded by the photosensitive material.

    摘要翻译: 提供半导体结构,半导体结构的制造方法以及半导体封装。 制造半导体结构的方法包括以下步骤。 首先,提供硅基板。 接下来,去除硅衬底的一部分以形成由硅柱包围的环形孔和硅柱。 然后,感光材料设置在环形孔中,其中感光材料是绝缘的。 之后,去除硅柱,使得环孔形成通孔,并且感光材料覆盖通孔的侧壁。 最后,导电材料设置在通孔中,其中导电材料的外表面被感光材料包围。