公开(公告)号：US20210382390A1

公开(公告)日：2021-12-09

申请号：US17056773

申请日：2019-05-22

Applicant: Merck Patent GmbH

Inventor： Medhat A. Toukhy ,  Weihong Liu ,  Takanori Kudo ,  Hung-Yang Chen ,  Jian Yin

IPC: G03F7/023 ,  G03F7/022 ,  C08G59/14 ,  C09D163/04

Abstract: The present invention relates to resist compositions comprising a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, a solvent component, and optionally, a heterocyclic thiol component. The polymer component is a Novolak derivative, comprising Novolak repeat units with free phenolic hydroxy moieties, and Novolak repeat units comprising phenolic hydroxy moieties protected with an acid cleavable acetal moiety. The acetal moiety is elected from a mono functional alkyl acetal moiety protecting a repeat unit comprising a Novolak phenolic hydroxy moiety, an acetal, comprising a moiety functionalized with a PAC moiety, protecting a repeat unit comprising a Novolak phenolic hydroxy moiety; a di-functional acetal comprising moiety, linking and protecting two repeat units comprising Novolak phenolic hydroxy moieties, forming a linking point in said polymer component between two different polymer chains in said polymer component, and a mixture of any of these three types of acid cleavable acetal moieties. The PAC component is selected from said acetal, comprising a moiety functionalized with a PAC moiety, protecting a repeat unit comprising a Novolak phenolic hydroxy moiety, a free PAC component, and a mixture of these two types of PAC components. The present invention also relates to the methods of using the present compositions in either in thick or thin film photoresist device manufacturing methodologies.

公开(公告)号：US12124166B2

公开(公告)日：2024-10-22

申请号：US16496986

申请日：2018-04-23

Applicant: Merck Patent GmbH

Inventor： Anupama Mukherjee ,  Medhat A. Toukhy

IPC: G03F7/11 ,  C23C14/04 ,  C23C14/30 ,  C23C14/34 ,  G03F7/004 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

CPC classification number: G03F7/0382 ,  C23C14/04 ,  C23C14/30 ,  C23C14/34 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/322 ,  G03F7/38

Abstract: A negative-acting, photoresist composition, imageable by 365 nm radiation that is developable in aqueous base. Apart from solvent, this composition comprises: a) an aqueous base soluble phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid generator c) a crosslinking agent which comprises an etherified melamine; d) a dye as described herein; e) a quencher system consisting essentially of an amine quencher, or a mixture of such amine quenchers, as described. This invention also pertains to processes of using this composition as a photoresist.

公开(公告)号：US11822242B2

公开(公告)日：2023-11-21

申请号：US17762589

申请日：2020-11-12

Applicant: Merck Patent GmbH

Inventor： Weihong Liu ,  Ping-Hung Lu ,  Chunwei Chen ,  Medhat A. Toukhy

IPC: G03F7/022 ,  G03F7/023 ,  G03F7/30 ,  C08F220/18 ,  C08F220/28

CPC classification number: G03F7/0233 ,  C08F220/1804 ,  C08F220/1807 ,  C08F220/281 ,  G03F7/0226 ,  G03F7/30

Abstract: Describe herein is a composition comprising: an acrylic polymer comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7) wherein these repeat units are present in said acrylic polymer in the mole % ranges as described herein; a Novolak resin having a dissolution rate in 0.26 N aqueous TMAH of at least 50 Å/sec; a diazonaphthoquinone (DNQ) photoactive compound (PAC); and an organic spin casting solvent, and a process of using said composition as a positive photoresist developable in aqueous base.