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公开(公告)号:US20140060147A1
公开(公告)日:2014-03-06
申请号:US13597043
申请日:2012-08-28
申请人: Michael Christopher Sarin , Rafael Mendez , Gregory Bartlett , Eric Hill , Keith R. Lawson , Andy Rosser
发明人: Michael Christopher Sarin , Rafael Mendez , Gregory Bartlett , Eric Hill , Keith R. Lawson , Andy Rosser
CPC分类号: F17D1/00 , G01F25/00 , Y02E60/34 , Y10T137/0324 , Y10T137/7722
摘要: A method and system are disclosed for verifying the flow rate of gas through a mass flow controller, such as a mass flow controller used with a tool for semiconductor or solar cell fabrication. To verify the mass flow rate measured by the mass flow controller, gas passing through the mass flow controller is also passed through a mass flow meter. The measured flow rate through the mass flow controller is compared to the measured flow rate through the mass flow meter and any difference between the two measured flow rates is determined. Depending upon the magnitude of any difference, the flow of gas to the mass flow controller may be altered.
摘要翻译: 公开了一种用于验证气体通过质量流量控制器的流量的方法和系统,例如与用于半导体或太阳能电池制造的工具一起使用的质量流量控制器。 为了验证由质量流量控制器测量的质量流量,通过质量流量控制器的气体也通过质量流量计。 将通过质量流量控制器的测量流量与通过质量流量计的测量流量进行比较,并确定两个测量流量之间的任何差异。 根据任何差异的大小,可以改变气体流向质量流量控制器的流量。
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公开(公告)号:US09169975B2
公开(公告)日:2015-10-27
申请号:US13597043
申请日:2012-08-28
申请人: Michael Christopher Sarin , Rafael Mendez , Gregory M. Bartlett , Eric Hill , Keith R. Lawson , Andy Rosser
发明人: Michael Christopher Sarin , Rafael Mendez , Gregory M. Bartlett , Eric Hill , Keith R. Lawson , Andy Rosser
CPC分类号: F17D1/00 , G01F25/00 , Y02E60/34 , Y10T137/0324 , Y10T137/7722
摘要: A method and system are disclosed for verifying the flow rate of gas through a mass flow controller, such as a mass flow controller used with a tool for semiconductor or solar cell fabrication. To verify the mass flow rate measured by the mass flow controller, gas passing through the mass flow controller is also passed through a mass flow meter. The measured flow rate through the mass flow controller is compared to the measured flow rate through the mass flow meter and any difference between the two measured flow rates is determined. Depending upon the magnitude of any difference, the flow of gas to the mass flow controller may be altered.
摘要翻译: 公开了一种用于验证气体通过质量流量控制器的流量的方法和系统,例如与用于半导体或太阳能电池制造的工具一起使用的质量流量控制器。 为了验证由质量流量控制器测量的质量流量,通过质量流量控制器的气体也通过质量流量计。 将通过质量流量控制器的测量流量与通过质量流量计的测量流量进行比较,并确定两个测量流量之间的任何差异。 根据任何差异的大小,可以改变气体流向质量流量控制器的流量。
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公开(公告)号:US09659799B2
公开(公告)日:2017-05-23
申请号:US13597108
申请日:2012-08-28
申请人: Keith R. Lawson , Michael E. Givens
发明人: Keith R. Lawson , Michael E. Givens
IPC分类号: G06F19/00 , H01L21/67 , G05B19/418
CPC分类号: H01L21/67276 , G05B19/41885 , G05B2219/45031 , Y02P90/20 , Y02P90/26
摘要: Embodiments of the present disclosure can help increase throughput and reduce resource conflicts and delays in semiconductor processing tools. An exemplary method according to various aspects of the present disclosure includes analyzing, by a computer program operating on a computer system, a plurality of expected times to complete each of a respective plurality of actions to be performed by a semiconductor processing tool, the semiconductor processing tool including a first process module and a second process module.
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公开(公告)号:US20140067110A1
公开(公告)日:2014-03-06
申请号:US13597108
申请日:2012-08-28
申请人: Keith R. Lawson , Michael E. Givens
发明人: Keith R. Lawson , Michael E. Givens
IPC分类号: G06F19/00
CPC分类号: H01L21/67276 , G05B19/41885 , G05B2219/45031 , Y02P90/20 , Y02P90/26
摘要: Embodiments of the present disclosure can help increase throughput and reduce resource conflicts and delays in semiconductor processing tools. An exemplary method according to various aspects of the present disclosure includes analyzing, by a computer program operating on a computer system, a plurality of expected times to complete each of a respective plurality of actions to be performed by a semiconductor processing tool, the semiconductor processing tool including a first process module and a second process module.
摘要翻译: 本公开的实施例可以有助于提高吞吐量并减少半导体处理工具中的资源冲突和延迟。 根据本公开的各个方面的示例性方法包括通过在计算机系统上操作的计算机程序来分析多个预期时间以完成由半导体处理工具执行的相应多个动作中的每一个,半导体处理 工具,其包括第一处理模块和第二处理模块。
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