公开(公告)号：US20140005481A1

公开(公告)日：2014-01-02

申请号：US13963364

申请日：2013-08-09

申请人： Michael Rontal ,  David Ruzic ,  Brian Jurczyk ,  Robert Stubbers

发明人： Michael Rontal ,  David Ruzic ,  Brian Jurczyk ,  Robert Stubbers

IPC分类号： A61B18/04

CPC分类号： A61B18/042 ,  A61B1/0051 ,  A61B1/015 ,  A61B1/267 ,  A61B2017/00323 ,  A61B2018/00327 ,  A61B2090/306 ,  A61B2090/3614

摘要： Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.

摘要翻译： 通过使用具有可转向端的内窥镜，通过将冷血浆或血浆活化物质施用于感染的粘膜表面来治疗慢性鼻窦炎，所述内窥镜具有通过鼻腔投射到窦腔中的可转向端。 冷等离子体通过施加电力而在内窥镜的远端处产生电源，或者通过延伸穿过内窥镜的气体和电连接在远端产生。 冷血浆或血浆活化物质可以破坏细菌细胞而不是真核细胞。

公开(公告)号：US20150038790A1

公开(公告)日：2015-02-05

申请号：US14518539

申请日：2014-10-20

申请人： Michael Rontal ,  Robert Stubbers ,  David Ruzic ,  Brian Jurczyk

发明人： Michael Rontal ,  Robert Stubbers ,  David Ruzic ,  Brian Jurczyk

IPC分类号： A61B18/04 ,  A61B1/06 ,  A61B1/267 ,  A61B1/07 ,  A61B1/015 ,  A61B1/005

CPC分类号： A61B18/042 ,  A61B1/0051 ,  A61B1/0057 ,  A61B1/015 ,  A61B1/0669 ,  A61B1/07 ,  A61B1/233 ,  A61B1/267 ,  A61B2017/00323 ,  A61B2018/00327 ,  A61B2018/00583 ,  A61B2090/306 ,  A61B2090/3614

摘要： Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.

摘要翻译： 通过使用具有可转向端的内窥镜，通过将冷血浆或血浆活化物质施用于感染的粘膜表面来治疗慢性鼻窦炎，所述内窥镜具有通过鼻腔投射到窦腔中的可转向端。 冷等离子体通过施加电力而在内窥镜的远端处产生电源，或者通过延伸穿过内窥镜的气体和电连接在远端产生。 冷血浆或血浆活化物质可以破坏细菌细胞而不是真核细胞。

公开(公告)号：US20130053762A1

公开(公告)日：2013-02-28

申请号：US13595378

申请日：2012-08-27

申请人： Michael Rontal ,  David Ruzic ,  Brian Jurczyk ,  Robert Stubbers

发明人： Michael Rontal ,  David Ruzic ,  Brian Jurczyk ,  Robert Stubbers

IPC分类号： A61M37/00 ,  A61B1/005

CPC分类号： A61B18/042 ,  A61B1/0051 ,  A61B1/015 ,  A61B1/267 ,  A61B2017/00323 ,  A61B2018/00327 ,  A61B2090/306 ,  A61B2090/3614

摘要： Chronic sinusitis is treated by the application of cold plasma or plasma-activated species to the infected mucosal surfaces through use of an endoscope having a steerable end which may be projected into the sinus cavities through the nasal cavity. The cold plasma is generated at either the distal end of the endoscope with a power source by application of a power, or at the distal end by gas and electrical connections extending through the endoscope. The cold plasma or plasma-activated species act to destroy bacterial cells but not eukaryotic cells.

公开(公告)号：US20060237667A1

公开(公告)日：2006-10-26

申请号：US11293903

申请日：2005-12-05

申请人： David Ruzic ,  Brian Jurczyk ,  Darren Alman ,  Martin Neumann ,  Huatan Qiu

发明人： David Ruzic ,  Brian Jurczyk ,  Darren Alman ,  Martin Neumann ,  Huatan Qiu

IPC分类号： G21G5/00 ,  A61N5/00

CPC分类号： H01L21/67069 ,  B08B6/00 ,  B08B7/00 ,  B82Y10/00 ,  B82Y40/00 ,  C11D11/0047 ,  G03F1/82 ,  G03F7/0002 ,  G03F7/70925 ,  H01J2237/022 ,  H01L21/02046

摘要： A system for non-contact cleaning of particulate contamination of surfaces includes one or more sources that create a charge imbalance between a surface and particles that contaminate the surface, and a power supply that creates a pulsed electrical bias on the surface. This imbalance produces an electrostatic force that propels the particles off the surface. The cleaning process can be associated, for example, with microelectronic lithography and manufacturing.