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    Polymeric optical mixtures, polymeric optical materials and polymeric optical waveguide
    1.
    发明授权
    Polymeric optical mixtures, polymeric optical materials and polymeric optical waveguide 失效
    聚合物光学混合物，聚合物光学材料和聚合物光波导

    公开(公告)号：US5672672A

    公开(公告)日：1997-09-30

    申请号：US548451

    申请日：1995-10-26

    申请人： Michiyuki Amano ,  Toshio Watanabe ,  Mitsuo Usui ,  Shungo Sugawara ,  Shoichi Hayashida ,  Saburo Imamura

    发明人： Michiyuki Amano ,  Toshio Watanabe ,  Mitsuo Usui ,  Shungo Sugawara ,  Shoichi Hayashida ,  Saburo Imamura

    IPC分类号： G02B6/00 ,  C08K3/22 ,  C08K5/00 ,  C08L83/04 ,  C08L83/06 ,  G02B1/04 ,  G02B6/12 ,  C08G77/06

    CPC分类号： G02B1/04 ,  C08K5/0025 ,  G02B1/045

    摘要： A polymeric optical material which is a mixture of a polysiloxane and at least one compound selected from the group consisting of polyisocyanate, silane, alkoxide and chelate, and an optical waveguide fabricated from the polymeric optical material having high thermal stability and low propagation loss over wide range. The polysiloxane may have, for example, a repeating unit of following formula (I): ##STR1## wherein each of R.sub.1 and R.sub.2 is independently an alkyl, deuterated alkyl or halogenated alkyl group, or a phenyl, deuterated phenyl or halogenated phenyl group. The optical waveguide includes a substrate, a clad layer provided on the substrate and a core layer surrounded by the clad layer. The clad layer is composed of a lower clad layer which is overlaid onto the substrate and an upper clad layer which surrounds the core layer.

    摘要翻译： 聚硅氧烷和至少一种选自多异氰酸酯，硅烷，醇盐和螯合物的化合物和由聚合物光学材料制成的光波导的混合物的聚合物光学材料具有高的热稳定性和较低的传播损耗 范围。 聚硅氧烷可以具有例如下式（I）的重复单元：其中R 1和R 2各自独立地为烷基，氘代烷基或卤代烷基，或苯基，氘代苯基或卤代 苯基。 光波导包括衬底，设置在衬底上的覆层和被覆层包围的芯层。 包覆层由覆盖在基板上的下包覆层和围绕芯层的上覆层构成。

    Magnetic recording member and process for manufacturing the same
    3.
    发明授权
    Magnetic recording member and process for manufacturing the same 失效
    磁记录元件及其制造方法

    公开(公告)号：US4529659A

    公开(公告)日：1985-07-16

    申请号：US664702

    申请日：1984-10-25

    申请人： Mitsutoshi Hoshino ,  Akira Terada ,  Shungo Sugawara

    发明人： Mitsutoshi Hoshino ,  Akira Terada ,  Shungo Sugawara

    IPC分类号： G11B5/725 ,  G11B5/73 ,  G11B5/72

    CPC分类号： G11B5/7325 ,  G11B5/725 ,  Y10S428/90 ,  Y10T428/31544 ,  Y10T428/31663

    摘要： Magnetic recording member having a magnetic storage layer covered by composite overlaying layers including an intermediate layer and a lubricant layer. The thin intermediate layer is formed by coating an aminosilane or epoxysilane compound directly or indirectly over the magnetic layer. The lubricant layer is formed over the intermediate layer by coating a lubricant made of a fluorinated hydrocarbon polymer having a terminal carboxyl or sulfonic acid group. The lubricant layer is chemically coupled with the intermediate layer by reacting the terminal carboxy or sulfonic acid group with the aminosilane or epoxysilane compound of the lubricant layer at room temperature or by heating, whereby the lubricant layer is stabilized to suppress deterioration of the lubricant layer and to suppress the reduction in lubricating property due to dispersion. With the stable lubricant layer according to the invention, abrasion of magnetic head slider slider and magnetic disc can be reduced and stiction of the head slider slider to the disc can be eliminated to preclude impairment of damage of the disc otherwise caused by head slider slider crash.

    摘要翻译： 具有由包括中间层和润滑剂层的复合覆盖层覆盖的磁存储层的磁记录元件。 通过在磁性层上直接或间接地涂覆氨基硅烷或环氧硅烷化合物来形成薄的中间层。 通过涂覆由具有末端羧基或磺酸基的氟化烃聚合物制成的润滑剂，在中间层上形成润滑剂层。 通过在室温或通过加热使末端羧基或磺酸基团与润滑剂层的氨基硅烷或环氧硅烷化合物反应，使润滑剂层与中间层化学偶联，由此润滑剂层被稳定化以抑制润滑剂层的劣化， 以抑制由于分散而引起的润滑性的降低。 利用根据本发明的稳定的润滑剂层，可以减少磁头滑块滑动器和磁盘的磨损，并且可以消除磁头滑块滑块到磁盘的粘性，以防止由于磁头滑块滑块碰撞导致的盘的损坏 。

    Polymeric resist mask composition
    5.
    发明授权
    Polymeric resist mask composition 失效
    聚合物抗蚀剂掩模组合物

    公开(公告)号：US4125672A

    公开(公告)日：1978-11-14

    申请号：US760374

    申请日：1977-01-19

    申请人： Masami Kakuchi ,  Shungo Sugawara ,  Kei Murase ,  Kentaro Matsuyama

    发明人： Masami Kakuchi ,  Shungo Sugawara ,  Kei Murase ,  Kentaro Matsuyama

    IPC分类号： G03F7/004 ,  C08F20/00 ,  C08F20/22 ,  G03F7/039 ,  H01F41/34 ,  H01L21/027 ,  B05D3/06

    CPC分类号： G03F7/039 ,  H01F41/34 ,  Y10T428/3154 ,  Y10T428/31667

    摘要： A polymeric resist mask composition thinly coated on a semiconductor substrate, wherein the prescribed portions of said resist mask are exposed to high energy rays such as electron beams, X-rays or ultraviolet rays for degradation, and the degraded portions of the resist mask are removed by an organic solvent to present a prescribed resist mask pattern on the semiconductor substrate, which comprises a halogenated polymethacrylic ester whose composition is expressed by the general formula ##STR1## (WHERE R denotes a halogenated alkyl radical including a halogen element selected from the group consisting of fluorine, chlorine and bromine, and at least one fluorine atom in case said radical contains chlorine or bromine and n indicates an average polymerization degree of 100 to 20,000) and an organic solvent for said halogenated polymethacrylate.

    摘要翻译： 薄膜涂覆在半导体衬底上的聚合物抗蚀剂掩模组合物，其中所述抗蚀剂掩模的规定部分暴露于诸如电子束，X射线或紫外线的高能射线以降解，并且去除抗蚀剂掩模的劣化部分 通过有机溶剂在半导体衬底上呈现规定的抗蚀剂掩模图案，其包含卤化聚甲基丙烯酸酯，其组成由通式“IMAGE”表示（其中R表示包含选自以下的卤素元素的卤代烷基： 氟，氯和溴，以及在所述基团含有氯或溴的情况下至少一个氟原子，n表示平均聚合度为100至20,000）和所述卤代聚甲基丙烯酸酯的有机溶剂。