公开(公告)号：US20130309858A1

公开(公告)日：2013-11-21

申请号：US13948050

申请日：2013-07-22

Applicant: Micron Technology, Inc.

Inventor： Farrell Good ,  Baosuo Zhou ,  Xiaolong Fang ,  Fatma Arzum Simsek-Ege

IPC: H01L21/28 ,  H01L21/768 ,  H01L21/302

CPC classification number: H01L21/768 ,  H01L21/0332 ,  H01L21/28273 ,  H01L21/28282 ,  H01L21/302 ,  H01L21/32139 ,  H01L27/11521 ,  H01L27/11568

Abstract: A method of forming a plurality of spaced features includes forming sacrificial hardmask material over underlying material. The sacrificial hardmask material has at least two layers of different composition. Portions of the sacrificial hardmask material are removed to form a mask over the underlying material. Individual features of the mask have at least two layers of different composition, with one of the layers of each of the individual features having a tensile intrinsic stress of at least 400.0 MPa. The individual features have a total tensile intrinsic stress greater than 0.0 MPa. The mask is used while etching into the underlying material to form a plurality of spaced features comprising the underlying material. Other implementations are disclosed.

Abstract translation: 形成多个间隔特征的方法包括在下面的材料上形成牺牲性硬掩模材料。 牺牲硬掩模材料具有至少两层不同的组成。 去除部分牺牲硬掩模材料以在下面的材料上形成掩模。 掩模的各个特征具有至少两层不同的组成，其中每个单独特征的层之一具有至少400.0MPa的拉伸内应力。 单个特征具有大于0.0MPa的总拉伸内在应力。 当蚀刻到下面的材料中时，使用掩模以形成包括下面的材料的多个间隔的特征。 公开了其他实现。

公开(公告)号：US08980752B2

公开(公告)日：2015-03-17

申请号：US13948050

申请日：2013-07-22

Applicant: Micron Technology, Inc.

Inventor： Farrell Good ,  Baosuo Zhou ,  Xiaolong Fang ,  Fatma Arzum Simsek-Ege

IPC: H01L21/311 ,  H01L21/768 ,  H01L21/033 ,  H01L21/28 ,  H01L21/3213 ,  H01L27/115 ,  H01L21/302

CPC classification number: H01L21/768 ,  H01L21/0332 ,  H01L21/28273 ,  H01L21/28282 ,  H01L21/302 ,  H01L21/32139 ,  H01L27/11521 ,  H01L27/11568

Abstract: A method of forming a plurality of spaced features includes forming sacrificial hardmask material over underlying material. The sacrificial hardmask material has at least two layers of different composition. Portions of the sacrificial hardmask material are removed to form a mask over the underlying material. Individual features of the mask have at least two layers of different composition, with one of the layers of each of the individual features having a tensile intrinsic stress of at least 400.0 MPa. The individual features have a total tensile intrinsic stress greater than 0.0 MPa. The mask is used while etching into the underlying material to form a plurality of spaced features comprising the underlying material. Other implementations are disclosed.

Abstract translation: 形成多个间隔特征的方法包括在下面的材料上形成牺牲性硬掩模材料。 牺牲硬掩模材料具有至少两层不同的组成。 去除部分牺牲硬掩模材料以在下面的材料上形成掩模。 掩模的各个特征具有至少两层不同的组成，其中每个单独特征的层之一具有至少400.0MPa的拉伸内应力。 单个特征具有大于0.0MPa的总拉伸内在应力。 当蚀刻到下面的材料中时，使用掩模以形成包括下面的材料的多个间隔的特征。 公开了其他实现。