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1.发明申请公开(公告)号：US20100080890A1
公开(公告)日：2010-04-01
申请号：US12631194
申请日：2009-12-04
CPC分类号： G02B26/001
摘要： A support structure within an interferometric modulator device may contact various other structures within the device. Increased bond strengths between the support structure and the other structures may be achieved in various ways, such as by providing roughened surfaces and/or adhesive materials at the interfaces between the support structures and the other structures. In an embodiment, increased adhesion is achieved between a support structure and a substrate layer. In another embodiment, increased adhesion is achieved between a support structure and a moveable layer. Increased adhesion may reduce undesirable slippage between the support structures and the other structures to which they are attached within the interferometric modulator.
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2.发明申请APPARATUS AND METHOD FOR REDUCING SLIPPAGE BETWEEN STRUCTURES IN AN INTERFEROMETRIC MODULATOR 有权用于降低干涉仪调制器结构之间的滑移的装置和方法公开(公告)号：US20100085626A1
公开(公告)日：2010-04-08
申请号：US12631576
申请日：2009-12-04
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A support structure within an interferometric modulator device may contact various other structures within the device. Increased bond strengths between the support structure and the other structures may be achieved in various ways, such as by providing roughened surfaces and/or adhesive materials at the interfaces between the support structures and the other structures. In an embodiment, increased adhesion is achieved between a support structure and a substrate layer. In another embodiment, increased adhesion is achieved between a support structure and a moveable layer. Increased adhesion may reduce undesirable slippage between the support structures and the other structures to which they are attached within the interferometric modulator.
摘要翻译： 干涉式调制器装置内的支撑结构可接触装置内的各种其它结构。 支撑结构和其他结构之间的增加的结合强度可以以各种方式实现，例如通过在支撑结构和其它结构之间的界面处提供粗糙化的表面和/或粘合材料。 在一个实施方案中，在支撑结构和基底层之间实现增加的粘附。 在另一个实施例中，在支撑结构和可移动层之间实现增加的粘附。 增加的粘合力可以减少支撑结构和它们在干涉式调制器内附着的其它结构之间的不希望的滑动。
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公开(公告)号：US07420728B2
公开(公告)日：2008-09-02
申请号：US11090552
申请日：2005-03-25
CPC分类号： B81C1/00174 , B81B2201/047 , B81B2203/0181 , B81C1/00182 , B81C2201/0109 , G02B26/001
摘要： Methods for making MEMS devices such as interferometric modulators involve selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively altered to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recessed away from openings in a covering layer. These methods may be used to make unreleased and released interferometric modulators.
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4.发明授权Apparatus and method for reducing slippage between structures in an interferometric modulator 失效用于减少干涉式调制器中结构之间滑动的装置和方法公开(公告)号：US07630119B2
公开(公告)日：2009-12-08
申请号：US11203613
申请日：2005-08-12
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A support structure within an interferometric modulator device may contact various other structures within the device. Increased bond strengths between the support structure and the other structures may be achieved in various ways, such as by providing roughened surfaces and/or adhesive materials at the interfaces between the support structures and the other structures. In an embodiment, increased adhesion is achieved between a support structure and a substrate layer. In another embodiment, increased adhesion is achieved between a support structure and a moveable layer. Increased adhesion may reduce undesirable slippage between the support structures and the other structures to which they are attached within the interferometric modulator.
摘要翻译： 干涉式调制器装置内的支撑结构可接触装置内的各种其它结构。 支撑结构和其他结构之间的增加的结合强度可以以各种方式实现，例如通过在支撑结构和其它结构之间的界面处提供粗糙化的表面和/或粘合材料。 在一个实施方案中，在支撑结构和基底层之间实现增加的粘附。 在另一个实施例中，在支撑结构和可移动层之间实现增加的粘附。 增加的粘合力可以减少支撑结构和它们在干涉式调制器内附着的其它结构之间的不希望的滑动。
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5.发明授权Apparatus and method for reducing slippage between structures in an interferometric modulator 有权用于减少干涉式调制器中结构之间滑动的装置和方法公开(公告)号：US07924494B2
公开(公告)日：2011-04-12
申请号：US12631576
申请日：2009-12-04
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A support structure within an interferometric modulator device may contact various other structures within the device. Increased bond strengths between the support structure and the other structures may be achieved in various ways, such as by providing roughened surfaces and/or adhesive materials at the interfaces between the support structures and the other structures. In an embodiment, increased adhesion is achieved between a support structure and a substrate layer. In another embodiment, increased adhesion is achieved between a support structure and a moveable layer. Increased adhesion may reduce undesirable slippage between the support structures and the other structures to which they are attached within the interferometric modulator.
摘要翻译： 干涉式调制器装置内的支撑结构可接触装置内的各种其它结构。 支撑结构和其他结构之间的增加的结合强度可以以各种方式实现，例如通过在支撑结构和其它结构之间的界面处提供粗糙化的表面和/或粘合材料。 在一个实施方案中，在支撑结构和基底层之间实现增加的粘附。 在另一个实施例中，在支撑结构和可移动层之间实现增加的粘附。 增加的粘合力可以减少支撑结构和它们在干涉式调制器内附着的其它结构之间的不希望的滑动。
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6.发明授权公开(公告)号：US07948671B2
公开(公告)日：2011-05-24
申请号：US12631194
申请日：2009-12-04
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A support structure within an interferometric modulator device may contact various other structures within the device. Increased bond strengths between the support structure and the other structures may be achieved in various ways, such as by providing roughened surfaces and/or adhesive materials at the interfaces between the support structures and the other structures. In an embodiment, increased adhesion is achieved between a support structure and a substrate layer. In another embodiment, increased adhesion is achieved between a support structure and a moveable layer. Increased adhesion may reduce undesirable slippage between the support structures and the other structures to which they are attached within the interferometric modulator.
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公开(公告)号：US09110281B2
公开(公告)日：2015-08-18
申请号：US13624530
申请日：2012-09-21
CPC分类号： G02B26/001 , G02B5/08 , G02F1/19 , G06F3/044 , G06F15/00
摘要： This disclosure provides systems, methods and apparatus for masked reflective structures which can be integrated into display devices. In one aspect, masks and etch leading layers can be used to control the etching of a stack of layers to form masked reflective structures having a desired profile. In particular, tapered edges at a particular angle can be formed, and the resulting structures used in a roll-to-roll process to fabricate a device component.
摘要翻译： 本公开提供了可以集成到显示装置中的用于掩模反射结构的系统，方法和装置。 在一个方面，掩模和蚀刻引导层可用于控制层叠层的蚀刻以形成具有所需轮廓的掩模反射结构。 特别地，可以形成特定角度的锥形边缘，并且所得到的结构用于卷对卷过程以制造器件部件。
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公开(公告)号：US09019590B2
公开(公告)日：2015-04-28
申请号：US13337494
申请日：2011-12-27
IPC分类号： G02B26/00 , G02F1/1335
CPC分类号： G02F1/21 , G02B26/001 , G02F1/1335 , G02F2001/13356
摘要： A spatial light modulator comprises an integrated optical compensation structure, e.g., an optical compensation structure arranged between a substrate and a plurality of individually addressable light-modulating elements, or an optical compensation structure located on the opposite side of the light-modulating elements from the substrate. The individually addressable light-modulating elements are configured to modulate light transmitted through or reflected from the transparent substrate. Methods for making such spatial light modulators involve fabricating an optical compensation structure over a substrate and fabricating a plurality of individually addressable light-modulating elements over the optical compensation structure. The optical compensation structure may be a passive optical compensation structure. The optical compensation structure may include one or more of a supplemental frontlighting source, a diffuser, a black mask, a diffractive optical element, a color filter, an anti-reflective layer, a structure that scatters light, a microlens array, and a holographic film.
摘要翻译： 空间光调制器包括集成的光学补偿结构，例如，布置在基板和多个可单独寻址的光调制元件之间的光学补偿结构，或位于光调制元件的相对侧上的光学补偿结构 基质。 可单独寻址的光调制元件被配置为调制透射通过或从透明基板反射的光。 制造这种空间光调制器的方法包括在衬底上制造光学补偿结构，并在光学补偿结构上制造多个单独可寻址的光调制元件。 光学补偿结构可以是无源光学补偿结构。 光学补偿结构可以包括补充前照明光源，漫射器，黑色掩模，衍射光学元件，滤色器，抗反射层，散射光的结构，微透镜阵列和全息图中的一个或多个 电影。
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公开(公告)号：US08300299B2
公开(公告)日：2012-10-30
申请号：US13098292
申请日：2011-04-29
申请人： Ming-Hau Tung , Lior Kogut
发明人： Ming-Hau Tung , Lior Kogut
IPC分类号： G02B26/00 , H01L21/311
CPC分类号： B81C1/00801 , B81B3/001 , B81B3/0072 , B81B2201/042 , B81C2201/0109 , B81C2201/017 , B81C2201/112 , B81C2201/115 , G02B26/001 , Y10T428/30 , Y10T428/31678 , Y10T428/31935
摘要： Methods of forming a protective coating on one or more surfaces of a microelectromechanical device are disclosed comprising the steps of forming a composite layer of a sacrificial material and a protective material, and selectively etching the sacrificial material to form a protective coating. The protective coatings of the invention preferably improve one or more aspects of the performance of the microelectromechanical devices in which they are incorporated. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.
摘要翻译： 公开了在微机电装置的一个或多个表面上形成保护涂层的方法，其包括以下步骤：形成牺牲材料和保护材料的复合层，并选择性地蚀刻牺牲材料以形成保护涂层。 本发明的保护性涂层优选地改进了其中并入其中的微机电装置的性能的一个或多个方面。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。
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10.发明授权公开(公告)号：US08045252B2
公开(公告)日：2011-10-25
申请号：US12034499
申请日：2008-02-20
CPC分类号： G02F1/21 , G02B26/001 , G02F1/1335 , G02F2001/13356
摘要： A spatial light modulator comprises an integrated optical compensation structure, e.g., an optical compensation structure arranged between a substrate and a plurality of individually addressable light-modulating elements, or an optical compensation structure located on the opposite side of the light-modulating elements from the substrate. The individually addressable light-modulating elements are configured to modulate light transmitted through or reflected from the transparent substrate. Methods for making such spatial light modulators involve fabricating an optical compensation structure over a substrate and fabricating a plurality of individually addressable light-modulating elements over the optical compensation structure. The optical compensation structure may be a passive optical compensation structure. The optical compensation structure may include one or more of a supplemental frontlighting source, a diffuser, a black mask, a diffractive optical element, a color filter, an anti-reflective layer, a structure that scatters light, a microlens array, and a holographic film.
摘要翻译： 空间光调制器包括集成的光学补偿结构，例如，布置在基板和多个可单独寻址的光调制元件之间的光学补偿结构，或位于光调制元件的相对侧上的光学补偿结构 基质。 可单独寻址的光调制元件被配置为调制透射通过或从透明基板反射的光。 制造这种空间光调制器的方法包括在衬底上制造光学补偿结构，并在光学补偿结构上制造多个单独可寻址的光调制元件。 光学补偿结构可以是无源光学补偿结构。 光学补偿结构可以包括补充前照明光源，漫射器，黑色掩模，衍射光学元件，滤色器，抗反射层，散射光的结构，微透镜阵列和全息图中的一个或多个 电影。
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