DEVICE AND METHOD FOR GAS TREATMENT USING NON-THERMAL PLASMA AND CATALYST MEDIUM
    1.
    发明申请
    DEVICE AND METHOD FOR GAS TREATMENT USING NON-THERMAL PLASMA AND CATALYST MEDIUM 有权
    使用非热等离子体和催化剂介质进行气体处理的装置和方法

    公开(公告)号:US20140219894A1

    公开(公告)日:2014-08-07

    申请号:US14345762

    申请日:2012-09-04

    Abstract: To provide a device and a method for oxidation decomposition treatment of a hazardous gas of a volatile organic compound (VOC) or the like at normal temperature.A gas treatment device characterized in being provided with a plasma-generating unit and a catalyst medium. The plasma-generating unit is provided with at least a flow channel through which a gas to be treated flows; and a power-supply unit for supplying electrical power, a first electrode, a second electrode and a dielectric material arranged inside the flow channel. A voltage is impressed between the first electrode and the second electrode by the power-supply unit and electrical discharging is caused to occur, whereby plasma is generated. The catalyst medium is adapted for accelerating a reaction with the gas to be treated and is provided in a position where the plasma generated by the plasma-generating unit inside the flow channel is present, wherein the catalyst medium has metallic catalytic particles present on an inorganic substance.

    Abstract translation: 提供在常温下对挥发性有机化合物(VOC)等的有害气体进行氧化分解处理的装置和方法。 一种气体处理装置,其特征在于具有等离子体产生单元和催化剂介质。 等离子体发生单元至少设置有流动通道,待处理的气体通过该流动通道流动; 以及用于提供电力的电源单元,布置在流动通道内的第一电极,第二电极和电介质材料。 通过电源单元在第一电极和第二电极之间施加电压,并且发生放电,由此产生等离子体。 催化剂介质适于加速与待处理气体的反应,并且设置在存在于流动通道内由等离子体发生单元产生的等离子体的位置,其中催化剂介质具有存在于无机物上的金属催化颗粒 物质。

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