公开(公告)号：US20160085160A1

公开(公告)日：2016-03-24

申请号：US14955968

申请日：2015-12-01

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An immersion lithography apparatus includes an optical assembly that projects a beam onto a substrate through an immersion liquid, a containment member surrounding a path of the beam, a stage holding the substrate, an isolator having a first actuator which limits vibrations of the optical assembly, and a support system having a second actuator to support the containment member and move it by the second actuator. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.

摘要翻译： 浸没式光刻设备包括：光学组件，其通过浸没液体将光束投射到衬底上;围绕光束的路径的容纳构件;保持衬底的台;隔离器，具有限制光学组件的振动的第一致动器; 以及支撑系统，其具有第二致动器以支撑所述容纳构件并且由所述第二致动器移动。 容纳构件包括第一供应开口，通过该第一供应开口，作为浸没液体的水被释放;回收口，其中浸没液体从容纳构件与基底和/或载物台之间的间隙中回收;以及第二供应开口， 水被释放到容纳构件和基底和/或台之间的间隙，第二供应开口设置在恢复开口的径向内侧。

公开(公告)号：US20140253888A1

公开(公告)日：2014-09-11

申请号：US14283827

申请日：2014-05-21

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

摘要翻译： 液浸光刻装置包括投影系统，液体被供应到投影系统下面的空间的开口，该开口经由流路连接到液体源，以将液体供应到空间，并且该开口可连接到 通过流路的真空源，以及保持基板的保持部件，保持部件能够在投影系统和开口下方移动。 由保持构件保持的基板通过从开口供给的液体露出，仅覆盖基板的上表面的一部分。

公开(公告)号：US20190129311A1

公开(公告)日：2019-05-02

申请号：US16234264

申请日：2018-12-27

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

摘要： A liquid immersion lithography apparatus includes a projection system having an optical member of which an incidence side has a convex lens shape, and a flow passage connected to a hole from which liquid is supplied. A substrate is exposed through the liquid covering only a portion of an upper surface of the substrate. The optical member has an end surface via which the exposure light is projected to the substrate via the liquid. A material having the end surface is fused silica.

公开(公告)号：US20140354967A1

公开(公告)日：2014-12-04

申请号：US14463066

申请日：2014-08-19

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Michael SOGARD

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

摘要翻译： 浸没光刻设备包括（i）包括光学元件的光学组件，并且被配置为通过浸没液体将光束投射到基板上; （ii）围绕梁的路径的容纳构件; 和（iii）保持基板的阶段，台架上的基板移动到容纳构件的底表面下方并与其隔开。 容纳构件包括：（1）喷嘴出口，通过该喷嘴出口释放作为浸没液体的水，（2）回收通道，通过该回收通道从容纳构件与基底和/或载物台之间的间隙中回收浸液， 和（3）流体通道，水被释放到容纳构件与基底和/或载物台之间的间隙，流体通道设置在回收通道的径向内侧。

公开(公告)号：US20160209762A1

公开(公告)日：2016-07-21

申请号：US15086675

申请日：2016-03-31

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A liquid immersion lithography apparatus includes a projection system including an optical member of which an incidence side has a convex lens shape, the projection system being configured to project an image through a liquid on a workpiece, and a liquid immersion member arranged below the optical member, the liquid immersion member having a plurality of openings through which the liquid is allowed to flow. A material of which the optical member is made is more resistant to the liquid than a material of which the liquid immersion member is made.

摘要翻译： 一种液浸式光刻设备，包括一个投影系统，该投影系统包括入射侧具有凸透镜形状的光学构件，该投影系统被配置为通过工件上的液体投影图像;以及液浸构件， 液浸部件具有允许液体流过的多个开口。 与制造液浸构件的材料相比，制造光学构件的材料比液体更耐受液体。

公开(公告)号：US20150177628A1

公开(公告)日：2015-06-25

申请号：US14642030

申请日：2015-03-09

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/7095

摘要： An exposure apparatus exposes a substrate with light from an object through an optical assembly and liquid. The exposure apparatus includes a stage and a liquid supply system. The stage is movable relative to the optical assembly and holds the substrate so that the substrate faces the optical assembly across the liquid. The liquid supply system includes an outlet arranged so as to face a top surface of the substrate held by the stage and supplies the liquid from the outlet onto the top surface. The stage includes a support which supports an undersurface of the substrate, and a channel having a port. The port is arranged outside the support so as to recover the liquid supplied from the outlet and flowing outwardly from the top surface of the substrate supported by the support.

摘要翻译： 曝光装置通过光学组件和液体将来自物体的光暴露于衬底。 曝光装置包括平台和液体供应系统。 平台相对于光学组件是可移动的，并且保持基板，使得基板跨过液体面对光学组件。 液体供给系统包括出口，其布置成面对由台架保持的基板的顶表面，并将液体从出口供应到顶表面上。 舞台包括支撑衬底的下表面的支撑件和具有端口的通道。 端口布置在支撑件外部，以便回收从出口供应的液体并从由支撑件支撑的基板的顶表面向外流动。

公开(公告)号：US20180164703A1

公开(公告)日：2018-06-14

申请号：US15879755

申请日：2018-01-25

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

摘要： An immersion lithography apparatus includes: an optical assembly including a plano-convex lens as a last optical element, the optical assembly configured to project an image onto a substrate through an immersion liquid; a containment member that surrounds a last portion of the optical assembly, the containment member having a channel via which the immersion liquid recovered from a gap between the containment member and the substrate and/or a stage holding the substrate is removed; an outlet above a bottom surface of the last optical element, via which the immersion liquid is released to a space between the optical assembly and the containment member; and an immersion liquid source apparatus from which the immersion liquid is delivered to the outlet, the immersion liquid source apparatus having a flow controller, and a flow sensor that measures a rate of a flow of the immersion liquid to be delivered to the outlet.

公开(公告)号：US20140055762A1

公开(公告)日：2014-02-27

申请号：US14066315

申请日：2013-10-29

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK

IPC分类号： G03F7/20

CPC分类号： G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

摘要： A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer.

摘要翻译： 光刻投影设备包括具有最后元件的投影系统，曝光光从该元件的最后元件下方的空间中通过液体投射到晶片上。 最后一个元件的光入射表面具有凸形。 液体保持构件被布置成与曝光光不通过的最后一个元件的表面相邻。 液体保持构件具有下表面，液体保持在该下表面下方。 在液体保持构件和最后一个元件的表面之间形成间隙，间隙与空间流体连通。 液体保持在液体保持构件的最后一个元件和下表面之间，另一侧保持在晶片的一侧和上表面上。 液体局部覆盖晶片上表面的一部分。

公开(公告)号：US20130335749A1

公开(公告)日：2013-12-19

申请号：US13797420

申请日：2013-03-12

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK

IPC分类号： G01B11/25

CPC分类号： G01B11/25 ,  G01S17/06 ,  G01S17/42 ,  G01S17/66

摘要： A measurement assembly (12) for measuring a feature (14A) on a surface (16) includes a metrology system (18), a mover assembly (19), a pointer (22), and a control system (24). The metrology system (18) generates a measurement beam (26), and the mover assembly (19) selectively adjusts the direction of the measurement beam (26). The pointer (22) is handheld and generates a pointer beam (34) that can be selectively directed at the surface (16) to form a pointer spot (36) on the surface (16). Further, the control system (24) controls the mover assembly (19) to move the direction of the measurement beam (26) until the measurement beam (26) is approximately directed at the pointer spot (36).

摘要翻译： 用于测量表面（16）上的特征（14A）的测量组件（12）包括测量系统（18），移动器组件（19），指针（22）和控制系统（24）。 测量系统（18）产生测量光束（26），并且动子组件（19）选择性地调节测量光束（26）的方向。 指针（22）是手持式的并且产生可以选择性地指向表面（16）以在表面（16）上形成指针点（36）的指针光束（34）。 此外，控制系统（24）控制移动器组件（19）移动测量光束（26）的方向，直到测量光束（26）近似指向指示器光点（36）。

公开(公告)号：US20180024442A1

公开(公告)日：2018-01-25

申请号：US15723628

申请日：2017-10-03

申请人： NIKON CORPORATION

发明人： W. Thomas NOVAK ,  Andrew J. HAZELTON ,  Douglas C. WATSON

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithography apparatus includes a projection system having a last optical element, a plurality of liquid supply openings that surround a path of exposure light that exits an end surface of the last optical element and face downwardly, and a plurality of liquid recovery openings that surround the path of the exposure light, are arranged radially outward of the liquid supply openings, and face downwardly. An upper surface of a substrate is opposite to the liquid supply openings and the liquid recovery openings. A portion of the upper surface of the substrate is covered with immersion liquid, which flows across the end surface of the last optical element. The substrate is exposed with the exposure light through the immersion liquid between the end surface of the last optical element and the upper surface the substrate.