公开(公告)号：US20200219739A1

公开(公告)日：2020-07-09

申请号：US16723235

申请日：2019-12-20

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Ryosuke GOTO ,  Masatoshi ONODA

IPC: H01L21/67 ,  H01J37/317 ,  G01K1/14 ,  H05B1/02

Abstract: A device is provided. The device includes a body, a heat absorber, a test piece and a contact thermometer. The heat absorber is attached to the body. The test piece is attached to the body and spaced apart from the heat absorber. The test piece has an overlap region that is overlapped by the heat absorber such that the heat absorber absorbs heat radiated toward the device and a non-overlap region which does not overlap with the heat absorber and which is exposed to the heat radiated toward the device. The contact thermometer is coupled to the overlap region. The test piece has a thermal transmissivity approximately equal to that of a substrate, and the device positions the overlap region of the test piece adjacent to the substrate being radiated by the heat.

公开(公告)号：US20150262790A1

公开(公告)日：2015-09-17

申请号：US14596311

申请日：2015-01-14

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Takeshi MATSUMOTO ,  Koichi ORIHIRA ,  Masatoshi ONODA

IPC: H01J37/317 ,  H01J37/30 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3007 ,  H01J2237/31703

Abstract: An ion irradiation apparatus is provided. The ion irradiation apparatus includes a support member, a measuring device, and a control device. The support member is larger than the substrate. The measuring device is disposed forwardly in a traveling direction of an ion beam. The ion irradiation apparatus operates in a first mode during which the measuring device is irradiated with a remaining part of the ion beam after being partially shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam; and a second mode during which the measuring device is irradiated with the ion beam without being shielded by the support member, when the substrate is not irradiated with the ion beam after crossing the ion beam. The control device controls the substrate so that the ion treatment process is performed in the first mode at least one time during the treatment.

Abstract translation: 提供了一种离子照射装置。 离子照射装置包括支撑构件，测量装置和控制装置。 支撑构件大于衬底。 测量装置沿离子束的行进方向向前设置。 离子照射装置在第一模式下工作，在第一模式中，当基板在与离子束交叉之后未被离子束照射时，在被部分被支撑构件屏蔽之后照射剩余部分的离子束; 以及第二模式，在该过程中当离子束穿过离子束之后，用离子束照射测量装置而不被支撑构件屏蔽。 控制装置控制基板，使得在处理期间至少一次在第一模式中执行离子处理过程。

公开(公告)号：US20150308505A1

公开(公告)日：2015-10-29

申请号：US14607661

申请日：2015-01-28

Applicant: NISSIN ION EQUIPMENT CO., LTD

Inventor： Masatoshi ONODA

IPC: F16C33/66 ,  F16N35/00 ,  F16N29/02 ,  F16N21/00 ,  F16C29/00

CPC classification number: F16C33/6625 ,  F16C29/005 ,  F16C29/0645 ,  F16N7/385 ,  F16N9/00 ,  F16N21/00 ,  F16N29/02 ,  F16N35/00

Abstract: A transport system is a vacuum processing system that includes a transport device that is provided in a vacuum, and a lubricating agent supply device that supplies lubricating agent to the transport device and provided in the ambient atmosphere. The transport device has a lubricating agent flow channel that is a channel for grease injected to a site subject to lubrication. The lubricating agent supply device has a grease server that stores a lubricating agent in the ambient atmosphere, a lubricating agent supply pipe which is a channel that guides the grease stored in the grease server to the lubricating agent flow channel and that connects the grease server and the lubricating agent flow channel, and an exhaust pump that exhausts the inside of the lubricating agent supply pipe.

Abstract translation: 输送系统是真空处理系统，其包括设置在真空中的输送装置，以及润滑剂供给装置，其向输送装置供给润滑剂并设置在环境气氛中。 运输装置具有润滑剂流动通道，该润滑剂流动通道是用于润滑的场所的润滑剂的通道。 润滑剂供给装置具有在周围环境中储存润滑剂的润滑脂服务器，润滑剂供给管，该润滑剂供给管是将储存在润滑脂服务器中的润滑脂引导到润滑剂流路并将润滑脂服务器和 润滑剂流路和排出润滑剂供给管内部的排气泵。

公开(公告)号：US20240383127A1

公开(公告)日：2024-11-21

申请号：US18689560

申请日：2022-08-03

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Masatoshi ONODA ,  Daiki TAKASHIMA

IPC: B25J5/02 ,  B25J9/10 ,  B25J11/00 ,  H01L21/67 ,  H01L21/677

Abstract: A substrate transfer device includes a shaft member rotationally movable about a rotation axis, a first swing member coupled to a holder for holding a substrate, a first support member supporting the first swing member to be linearly displaced, a second swing member having a linearly moving part linearly displaceable, and a second support member supporting the second swing member to be linearly displaced The first support member is rotationally moved about the rotation axis integrally with the second support member together with the second swing member being linearly displaced with respect to the second support member in a manner interlocked with a linear movement of the linearly moving part, and the first swing member is linearly displaced with respect to the first support member via the shaft member, such that the holder is linearly displaced.

公开(公告)号：US20210305072A1

公开(公告)日：2021-09-30

申请号：US17193302

申请日：2021-03-05

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Masatoshi ONODA ,  Ryosuke GOTO ,  Yoshiyuki NAKAZAWA

IPC: H01L21/67 ,  C23C16/458 ,  F28F3/08

Abstract: A substrate cooling device is provided and includes a device body and a conduit block. The device body has a housing space, and a discharge portion for receiving and discharging a substrate into and out of the housing space. The conduit block includes an outlet port arranged in the device body across the housing space from the discharge portion, and a gas flow passage which is connected to the outlet port and receives a cooling gas. The conduit block outputs the cooling gas from the outlet port across the housing space in one direction such that the cooling gas flows across an upper surface of the substrate in the one direction and across a lower surface of the substrate in the one direction.