Acid scavengers for use in chemically amplified photoresists
    1.
    发明授权
    Acid scavengers for use in chemically amplified photoresists 失效
    用于化学放大光致抗蚀剂的酸清除剂

    公开(公告)号:US5667938A

    公开(公告)日:1997-09-16

    申请号:US731224

    申请日:1996-10-11

    IPC分类号: G03F7/004 G03F7/039

    CPC分类号: G03F7/039 G03F7/0045

    摘要: Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

    摘要翻译: 质子海绵,小檗碱和十六烷基三甲基氢氧化铵碱化合物用作基于改性聚羟基苯乙烯(PHS)的化学放大光致抗蚀剂的添加剂。 基础添加剂清除光致抗蚀剂中的游离酸,以保持改性PHS聚合物上的酸不稳定部分。 碱添加剂非常适合于工业加工条件,不与光致抗蚀剂组合物中的光酸化合物反应以形成将阻碍光致抗蚀剂性能的副产物,并延长光致抗蚀剂组合物的保质期。 此外,质子海绵和小檗碱碱添加剂具有与改性PHS聚合物不同的吸收光谱,因此可以容易地测定和控制光致抗蚀剂内基础添加剂的量。

    Acid Scavengers for use in chemically amplified photoresists
    2.
    发明授权
    Acid Scavengers for use in chemically amplified photoresists 失效
    用于化学放大光致抗蚀剂的酸清除剂

    公开(公告)号:US5733705A

    公开(公告)日:1998-03-31

    申请号:US730687

    申请日:1996-10-11

    IPC分类号: G03F7/004 G03F7/039

    CPC分类号: G03F7/039 G03F7/0045

    摘要: Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

    摘要翻译: 质子海绵,小檗碱和十六烷基三甲基氢氧化铵碱化合物用作基于改性聚羟基苯乙烯(PHS)的化学放大光致抗蚀剂的添加剂。 基础添加剂清除光致抗蚀剂中的游离酸,以保持改性PHS聚合物上的酸不稳定部分。 碱添加剂非常适合于工业加工条件,不与光致抗蚀剂组合物中的光酸化合物反应以形成将阻碍光致抗蚀剂性能的副产物,并延长光致抗蚀剂组合物的保质期。 此外,质子海绵和小檗碱碱添加剂具有与改性PHS聚合物不同的吸收光谱,因此可以容易地测定和控制光致抗蚀剂内基础添加剂的量。

    Preparation of partially cross-linked polymers and their use in pattern formation
    3.
    发明授权
    Preparation of partially cross-linked polymers and their use in pattern formation 有权
    部分交联聚合物的制备及其在图案形成中的应用

    公开(公告)号:US06262181B1

    公开(公告)日:2001-07-17

    申请号:US09469379

    申请日:1999-12-22

    IPC分类号: C08F26102

    摘要: This invention relates to a process for generating a organically soluble partially cross-linked acid labile polymer according to the present invention comprises the steps of providing a polymer with one or more monomer units, wherein at least one of the monomer units contain one or more pendant COOH or hydroxyl groups; and reacting said polymer with a polyvinyl ether in the presence of a acid catalyst to form links between at least two polymer chains. The resulting polymer can be used as a component in a photoresist formulation.

    摘要翻译: 本发明涉及一种产生根据本发明的有机溶解的部分交联的酸不稳定聚合物的方法,包括以下步骤:向聚合物提供一种或多种单体单元,其中至少一种单体单元包含一个或多个垂饰 COOH或羟基; 并在酸催化剂的存在下使所述聚合物与聚乙烯基醚反应以在至少两个聚合物链之间形成连接。 所得聚合物可用作光致抗蚀剂制剂中的组分。