Method for depositing a protective carbon coating on a data recording disk
    6.
    发明授权
    Method for depositing a protective carbon coating on a data recording disk 有权
    在数据记录盘上沉积保护性碳涂层的方法

    公开(公告)号:US06455101B1

    公开(公告)日:2002-09-24

    申请号:US09618786

    申请日:2000-07-18

    IPC分类号: B05D512

    摘要: A method and apparatus for depositing a protective film on a data recording disk, including the steps of depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; heating the substrate with the magnetic film layer thereon to a protective film deposition temperature; and depositing a protective film on the magnetic film layer while the substrate is at the protective film deposition layer; wherein the protective film deposition temperature is higher than the magnetic film deposition temperature.

    摘要翻译: 一种用于在数据记录盘上沉积保护膜的方法和装置,包括以下步骤:在基板处于磁膜沉积温度的同时,在基板的表面上沉积作为数据记录层的磁性膜层; 将其上的磁性膜层加热到保护膜沉积温度; 以及在所述基板处于保护膜沉积层的同时在所述磁性膜层上沉积保护膜; 其中保护膜沉积温度高于磁膜沉积温度。

    Apparatus for depositing a thin film on a data recording disk
    7.
    发明授权
    Apparatus for depositing a thin film on a data recording disk 有权
    用于在数据记录盘上沉积薄膜的装置

    公开(公告)号:US06571729B2

    公开(公告)日:2003-06-03

    申请号:US09985090

    申请日:2001-11-01

    IPC分类号: C23C1600

    摘要: An apparatus for depositing a protective film on a data recording disk, including the steps of depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; heating the substrate with the magnetic film layer thereon to a protective film deposition temperature; and depositing a protective film on the magnetic film layer while the substrate is at the protective film deposition layer; wherein the protective film deposition temperature is higher than the magnetic film deposition temperature.

    摘要翻译: 一种用于在数据记录盘上沉积保护膜的装置,包括以下步骤:在衬底处于磁膜沉积温度的同时,在衬底的表面上沉积磁膜层作为数据记录层; 将其上的磁性膜层加热到保护膜沉积温度; 以及在所述基板处于保护膜沉积层的同时在所述磁性膜层上沉积保护膜; 其中保护膜沉积温度高于磁膜沉积温度。

    Assistance device of network system
    8.
    发明授权
    Assistance device of network system 有权
    网络系统辅助装置

    公开(公告)号:US09596124B2

    公开(公告)日:2017-03-14

    申请号:US14005324

    申请日:2011-03-23

    摘要: A design assistance device includes: a design information storage section configured to store design information containing at least information of slave devices and information of a topology in a network system in accordance with a design created by a user; an actual configuration information generation section configured to generate actual configuration information containing at least the information of the slave devices and the information of the topology in the actual network system; a comparison section configured to compare the design information and the actual configuration information; and an output section configured to generate a comparison screen indicating the respective configurations of the designed network system and the actual network system along with their commonalities and differences and outputting the comparison screen to a display device. Thus, a technology can be provided which assists the user to easily compare the designed network configuration and the actual machine's network configuration.

    摘要翻译: 设计辅助装置包括:设计信息存储部分,被配置为根据由用户创建的设计,在网络系统中存储至少包含从设备信息和拓扑信息的设计信息; 实际配置信息生成部,被配置为生成至少包含所述从设备的信息和所述实际网络系统中的拓扑的信息的实际配置信息; 配置为比较设计信息和实际配置信息的比较部分; 以及输出部,其被配置为生成指示所设计的网络系统和实际网络系统的各自配置及其共同点和差异的比较屏幕,并将比较屏幕输出到显示设备。 因此,可以提供一种技术,其帮助用户容易地比较设计的网络配置和实际机器的网络配置。

    Method of fabricating semiconductor device
    9.
    发明申请
    Method of fabricating semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US20090087957A1

    公开(公告)日:2009-04-02

    申请号:US12232885

    申请日:2008-09-25

    IPC分类号: H01L21/02

    CPC分类号: H01L21/31138 H01L28/60

    摘要: Photoresist on a metal is removed with less oxidation of the metal surface by the invented ashing. During process, the matching of oxygen gas ratio and wafer temperature under downstream plasma which means no RF bias plasma is controlled for oxidation amount not to depend on ashing time with required photo resist rate in manufacturing.

    摘要翻译: 通过本发明的灰化,金属表面的氧化较少,金属上的光刻胶被去除。 在处理过程中,控制下游等离子体的氧气比和晶片温度的匹配,这意味着没有RF偏置等离子体的氧化量不依赖于制造时所需光刻胶的灰化时间。

    Assistance system
    10.
    发明授权
    Assistance system 有权
    援助制度

    公开(公告)号:US09397897B2

    公开(公告)日:2016-07-19

    申请号:US14005356

    申请日:2011-03-23

    IPC分类号: G06F3/048 H04L12/24 G05B19/05

    摘要: Provided is a design assistance system that enables a user having no expert knowledge to easily design a network system, taking into consideration the order in which slave devices are connected and the connection-destination ports. The design assistance system has a storage section that stores slave information data in which unique information of the slave device is described; an acquisition section that acquires information of a port of the slave device from the slave information data; and a generation section that generates a port component serving as a GUI component representing the port of the slave device based on the information of the port, generate a device component serving as a GUI component representing the slave device based on the slave information data, and generate a design assisting GUI containing a topology display screen that displays the topology of the network system which includes the device component and port component.

    摘要翻译: 提供了一种设计辅助系统,其使得不具有专家知识的用户能够容易地设计网络系统,同时考虑到从设备连接的顺序和连接目的地端口。 设计辅助系统具有存储从属设备的唯一信息被描述的从属信息数据的存储部分; 获取部,从从属信息数据获取从装置的端口的信息; 以及生成部,其基于所述端口的信息生成用作表示所述从设备的端口的GUI组件的端口组件,基于从属信息数据生成用作表示所述从设备的GUI组件的设备组件,以及 生成包含显示包括设备组件和端口组件的网络系统的拓扑的拓扑显示屏幕的设计辅助GUI。