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公开(公告)号:US10125285B2
公开(公告)日:2018-11-13
申请号:US15740550
申请日:2016-06-30
Applicant: National Research Council of Canada
Inventor: Ta-Ya Chu , Christophe Py , Ye Tao , Zhiyi Zhang , Afshin Dadvand
Abstract: Disclosed is a method of printing ultranarrow-gap lines of a functional material, such as an electrically conductive silver ink. The method entails providing a substrate having an interlayer coated on the substrate and printing the ultranarrow-gap lines by depositing ink on the interlayer of the substrate, the ink comprising the functional material and a solvent that swells the interlayer to cause the interlayer to bulge at edges of the ink to thereby define embankments that confine the ink.
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公开(公告)号:US20180187036A1
公开(公告)日:2018-07-05
申请号:US15740550
申请日:2016-06-30
Applicant: National Research Council of Canada
Inventor: Ta-Ya Chu , Christophe Py , Ye Tao , Zhiyi Zhang , Afshin Dadvand
IPC: C09D11/52 , H01L29/772 , H01L51/00 , H01L51/05 , H01L51/10
CPC classification number: C09D11/52 , H01L29/772 , H01L51/0022 , H01L51/0023 , H01L51/0508 , H01L51/105 , H05K1/16
Abstract: Disclosed is a method of printing ultranarrow-gap lines of a functional material, such as an electrically conductive silver ink. The method entails providing a substrate having an interlayer coated on the substrate and printing the ultranarrow-gap lines by depositing ink on the interlayer of the substrate, the ink comprising the functional material and a solvent that swells the interlayer to cause the interlayer to bulge at edges of the ink to thereby define embankments that confine the ink.
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