Sensor for ion implanter
    2.
    发明授权
    Sensor for ion implanter 有权
    离子注入机传感器

    公开(公告)号:US07683348B2

    公开(公告)日:2010-03-23

    申请号:US11548295

    申请日:2006-10-11

    IPC分类号: G21K5/10

    摘要: A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.

    摘要翻译: 法拉第杯结构,用于加工工具。 杯结构具有连接到电路的导电冲击板,用于监测撞击撞击板的离子以获得离子束电流的指示。 导电冲击板由用于将离子束截断截面分成区域或区段的掩模前面。 掩模包括延伸到冲击板的壁,用于阻止到达传感器的离子和从传感器移出的颗粒进入加工工具的抽空区域。