利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

8 条记录 (耗时 0.022 秒)

    Lithography system for processing at least a part of a target
    1.
    发明授权
    Lithography system for processing at least a part of a target 有权
    用于处理目标的至少一部分的光刻系统

    公开(公告)号：US09383662B2

    公开(公告)日：2016-07-05

    申请号：US13470234

    申请日：2012-05-11

    申请人： Niels Vergeer ,  Guido de Boer ,  Godefridus Cornelius Antonius Couweleers ,  Laurens Plandsoen ,  Cor Verburg

    发明人： Niels Vergeer ,  Guido de Boer ,  Godefridus Cornelius Antonius Couweleers ,  Laurens Plandsoen ,  Cor Verburg

    IPC分类号： G03B27/68 ,  G03F9/00

    CPC分类号： G03F9/7088 ,  G03F9/7096

    摘要： The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.

    摘要翻译： 本发明涉及一种用于处理目标的光刻系统，其中光刻系统包括布置成将图案投射在目标表面上的最终投影系统。 光刻系统包括布置用于检测目标表面上的位置标记的位置的标记位置检测系统。 标记位置检测系统包括布置成将光束投射在目标表面上的光学元件和布置成检测反射光束的光检测器。 光学元件可以定位成与最终投影系统相邻，并且光检测器可以位于框架内。

    LITHOGRAPHY SYSTEM FOR PROCESSING AT LEAST A PART OF A TARGET
    5.
    发明申请
    LITHOGRAPHY SYSTEM FOR PROCESSING AT LEAST A PART OF A TARGET 有权
    至少处理目标的一部分的算术系统

    公开(公告)号：US20120287411A1

    公开(公告)日：2012-11-15

    申请号：US13470234

    申请日：2012-05-11

    申请人： Niels Vergeer ,  Guido de Boer ,  Godefridus Cornelius Antonius Couweleers ,  Laurens Plandsoen ,  Cor Verburg

    发明人： Niels Vergeer ,  Guido de Boer ,  Godefridus Cornelius Antonius Couweleers ,  Laurens Plandsoen ,  Cor Verburg

    IPC分类号： G03B27/53

    CPC分类号： G03F9/7088 ,  G03F9/7096

    摘要： The invention relates to a lithography system for processing a target, wherein the lithography system comprises a final projection system arranged for projecting a pattern on the target surface. The lithography system comprises a mark position detection system arranged for detecting a position of a position mark on the target surface. The mark position detection system comprises an optical element arranged for projecting a light beam on the target surface and a light detector arranged for detecting a reflected light beam. The optical element may be positioned adjacent to the final projection system and the light detector may be positioned inside a frame.

    摘要翻译： 本发明涉及一种用于处理目标的光刻系统，其中光刻系统包括布置成将图案投射在目标表面上的最终投影系统。 光刻系统包括布置用于检测目标表面上的位置标记的位置的标记位置检测系统。 标记位置检测系统包括布置成将光束投射在目标表面上的光学元件和布置成检测反射光束的光检测器。 光学元件可以定位成与最终投影系统相邻，并且光检测器可以位于框架内。

    Current measurement system
    7.
    发明授权
    Current measurement system 有权

    公开(公告)号：US09644995B2

    公开(公告)日：2017-05-09

    申请号：US13539585

    申请日：2012-07-02

    申请人： Cor Verburg ,  Robert Mossel ,  Kaustubh Prabodh Padhye ,  Eric de Kok ,  Willem Jacob Vis

    发明人： Cor Verburg ,  Robert Mossel ,  Kaustubh Prabodh Padhye ,  Eric de Kok ,  Willem Jacob Vis

    IPC分类号： G01R31/08 ,  G01R31/02 ,  G01D5/24 ,  G03F9/00

    CPC分类号： G01D5/24 ,  G03F9/7053

    摘要： A measurement system for measuring an input electrical current (Ics) from a current source (CS) and generating a current measurement signal, comprising a current measuring circuit (70) having a first input terminal (72) connected to the current source and an output terminal (74) for providing the current measurement signal. The current measuring circuit further comprises one or more power supply terminals (75, 76) arranged to receive one or more voltages from a power supply (77a, 77b) for powering the current measuring circuit. The current measuring circuit also comprises a first voltage source (VD) coupled to the one or more power supply terminals, the first voltage source providing a disturbance voltage to the one or more power supply terminals, the disturbance voltage representing a voltage at the first input terminal.

    Active shield for capacitive measurement system
    8.
    发明授权
    Active shield for capacitive measurement system 有权
    电容测量系统的主动屏蔽

    公开(公告)号：US09400195B2

    公开(公告)日：2016-07-26

    申请号：US13539561

    申请日：2012-07-02

    申请人： Cor Verburg ,  Robert Mossel ,  Kaustubh Prabodh Padhye ,  Eric de Kok ,  Willem Jacob Vis

    发明人： Cor Verburg ,  Robert Mossel ,  Kaustubh Prabodh Padhye ,  Eric de Kok ,  Willem Jacob Vis

    IPC分类号： G01D5/24 ,  G01R27/26 ,  G03F9/00

    CPC分类号： G01D5/24 ,  G03F9/7053

    摘要： A capacitive measurement system for generating a measurement signal representative of a measured position or distance to a target. The system has a first circuit comprising a thin film capacitive sensor (1a) arranged for providing a sensor capacitance in dependence on the measured position or distance; a cable (30a) comprising a sensor wire (31a) and a co-axial shield conductor (32a), the cable having a remote end and a local end, the sensor wire electrically connected to the capacitive sensor at the local end of the cable; a voltage source (24a) having an output terminal connected to the sensor wire at the remote end of the cable and arranged to energize the capacitive sensor, and energize the shield conductor with essentially the same voltage as the sensor wire; and a current measuring circuit (21a) having first and second input terminals and an output terminal, the current measuring circuit connected in series with the first input terminal connected to the output terminal of the voltage source and the second input terminal connected to the sensor wire at the remote end of the cable, the current measuring circuit arranged to measure current flowing in the sensor wire and generate the measurement signal at the output terminal.

    摘要翻译： 一种用于产生表示到目标的测量位置或距离的测量信号的电容测量系统。 该系统具有包括薄膜电容传感器（1a）的第一电路，薄膜电容传感器（1a）被设置用于根据所测量的位置或距离提供传感器电容; 包括传感器线（31a）和同轴屏蔽导体（32a）的电缆（30a），所述电缆具有远端和本端，所述传感器线在所述电缆的本端处电连接到所述电容式传感器 ; 电压源（24a），其具有连接到电缆远端处的传感器线的输出端子，并且布置成对电容传感器通电，并且以与传感器线基本相同的电压激励屏蔽导体; 以及具有第一和第二输入端子和输出端子的电流测量电路（21a），所述电流测量电路与连接到电压源的输出端子的第一输入端子和连接到传感器线路的第二输入端子串联连接 在电缆的远端，电流测量电路被布置成测量在传感器线中流动的电流并在输出端产生测量信号。