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公开(公告)号：US08197906B2
公开(公告)日：2012-06-12
申请号：US12777666
申请日：2010-05-11
IPC分类号： B05D5/00
CPC分类号： C09D5/00 , B05D1/185 , C03C17/30 , Y10T428/261 , Y10T428/31504
摘要： A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.
摘要翻译： 一种制造有机薄膜的方法，其中在基材表面上形成有机薄膜，该方法包括使基材与含有至少一种金属基表面活性剂的有机溶剂溶液接触的步骤（A） 可水解基团和能够与金属基表面活性剂相互作用的催化剂，其中有机溶剂溶液中的水接触被设定或保持在预定范围内。
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公开(公告)号：US08426019B2
公开(公告)日：2013-04-23
申请号：US12833791
申请日：2010-07-09
IPC分类号： B32B33/00
CPC分类号： C09D5/00 , B05D1/185 , C03C17/30 , Y10T428/261 , Y10T428/31504
摘要： A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.
摘要翻译： 一种制造有机薄膜的方法，其能够快速成膜，并且能够稳定地形成具有最小杂质的致密有机薄膜，并且能够连续重复多次。 另外，制造有机薄膜的方法，其中有机薄膜形成在基片的表面上，包括使基片与含有至少一个可水解基团的金属基表面活性剂的有机溶剂溶液接触，以及 能够与金属基表面活性剂相互作用的催化剂，其中有机溶剂溶液内的水接触被设定或保持在预定范围内。
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3.发明申请Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film 审中-公开具有金属氧键的分散体，金属氧化物膜和单分子膜公开(公告)号：US20110135878A1
公开(公告)日：2011-06-09
申请号：US12929592
申请日：2011-02-02
申请人： Nobuo Kimura , Yoshitaka Fujita , Norifumi Nakamoto , Motoyuki Toki , Akiji Higuchi , Kazuo Ono , Tomoya Hidaka , Hiroyuki Takeda
发明人： Nobuo Kimura , Yoshitaka Fujita , Norifumi Nakamoto , Motoyuki Toki , Akiji Higuchi , Kazuo Ono , Tomoya Hidaka , Hiroyuki Takeda
CPC分类号： C01B13/32 , C01G23/053 , C23C18/1216 , C23C18/122 , Y10T428/24355
摘要： Dispersoids having metal-oxygen groups that are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The dispersoid having metal-oxygen bonds may be obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base, and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
摘要翻译： 具有适合于在200℃或更低的低温下生产金属氧化物薄膜并用于生产均相有机 - 无机杂化材料的金属 - 氧基的分散体。 具有金属 - 氧键的分散质可以通过在不存在酸的情况下，在有机溶剂中将具有至少三个可水解基团的金属化合物与每摩尔金属化合物相混合至少0.5摩尔但小于2摩尔的水 ，碱和/或分散稳定剂，并且在等于或低于金属化合物开始水解的温度的温度下，然后将温度升至至少水解开始的温度。
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公开(公告)号：US07776403B2
公开(公告)日：2010-08-17
申请号：US10553109
申请日：2004-04-14
CPC分类号： C09D5/00 , B05D1/185 , C03C17/30 , Y10T428/261 , Y10T428/31504
摘要： An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions.The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
摘要翻译： 本发明的目的在于提供一种能够快速成膜的有机薄膜的制造方法，能够稳定地形成具有最小杂质的致密有机薄膜，并且能够连续重复多次。 本发明提供一种有机薄膜的制造方法，其中在基材表面上形成有机薄膜，其包括使基板与含有金属类表面活性剂的有机溶剂溶液接触的工序（A） 具有至少一个可水解基团和能够与金属基表面活性剂相互作用的催化剂，其中有机溶剂溶液中的水含量被设定或保持在预定范围内。
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5.发明授权Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film 有权具有金属氧键的分散体，金属氧化物膜和单分子膜公开(公告)号：US07909929B2
公开(公告)日：2011-03-22
申请号：US10533580
申请日：2003-11-12
申请人： Nobuo Kimura , Yoshitaka Fujita , Norifumi Nakamoto , Motoyuki Toki , Akiji Higuchi , Kazuo Ono , Tomoya Hidaka , Hiroyuki Takeda
发明人： Nobuo Kimura , Yoshitaka Fujita , Norifumi Nakamoto , Motoyuki Toki , Akiji Higuchi , Kazuo Ono , Tomoya Hidaka , Hiroyuki Takeda
IPC分类号： C01G23/047
CPC分类号： C01B13/32 , C01G23/053 , C23C18/1216 , C23C18/122 , Y10T428/24355
摘要： The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
摘要翻译： 本发明提供了适用于在200℃或更低的低温下生产金属氧化物薄膜的金属 - 氧基分散体和用于生产均相有机 - 无机混合材料的分散体。 本发明还提供具有各种能力的金属氧化物薄膜和有机 - 无机混合材料，特别是具有高折射率和高透明度的有机 - 无机混合材料。 使用具有金属 - 氧键的分散体，其通过在有机溶剂中将具有至少三个可水解基团的金属化合物与每摩尔金属化合物混合至少0.5摩尔但小于2摩尔水而获得， 不存在酸，碱和/或分散体稳定剂，并且在金属化合物开始水解或在低于金属化合物开始水解的温度的温度下，将温度升至至少水解开始的温度。
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6.发明授权公开(公告)号：US07422642B2
公开(公告)日：2008-09-09
申请号：US10507658
申请日：2003-03-12
IPC分类号： C23C22/00
CPC分类号： C09D183/08 , B05D1/185 , B82Y30/00 , B82Y40/00 , C03C17/28 , C03C17/30 , C03C2218/113 , C09D183/04 , C09D185/00
摘要： To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.
摘要翻译： 提供一种方法，其允许快速形成化学吸附膜与薄膜的制备相结合，这降低了杂质含量并具有致密结构。 一种在含有活性氢的基材的表面上制备化学吸附膜的方法，其特征在于它包括用金属氧化物或部分水解产物从金属醇盐和水中处理具有至少一个可水解基团的金属基表面活性剂 在有机溶剂中形成溶液，并使溶液与基材的表面接触。
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7.发明申请公开(公告)号：US20050167004A1
公开(公告)日：2005-08-04
申请号：US10507658
申请日：2003-03-12
IPC分类号： C03C17/28 , C03C17/30 , C09D183/04 , C09D183/08 , C09D185/00 , C09K3/18 , C23C22/02
CPC分类号： C09D183/08 , B05D1/185 , B82Y30/00 , B82Y40/00 , C03C17/28 , C03C17/30 , C03C2218/113 , C09D183/04 , C09D185/00
摘要： To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.
摘要翻译： 提供一种方法，其允许快速形成化学吸附膜与薄膜的制备相结合，这降低了杂质含量并具有致密结构。 一种在含有活性氢的基材表面上制备化学吸附膜的方法，其特征在于它包括用金属氧化物或部分水解产物从金属醇盐和水中处理具有至少一个可水解基团的金属基表面活性剂 在有机溶剂中形成溶液，并使溶液与基材的表面接触。
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8.发明申请Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film 有权具有金属氧键的分散体，金属氧化物膜和单分子膜公开(公告)号：US20060239902A1
公开(公告)日：2006-10-26
申请号：US10533580
申请日：2003-11-12
申请人： Nobuo Kimura , Yoshitaka Fujita , Norifumi Nakamoto , Motoyuki Toki , Akiji Higuchi , Kazuo Ono , Tomoya Hidaka , Hiroyuki Takeda
发明人： Nobuo Kimura , Yoshitaka Fujita , Norifumi Nakamoto , Motoyuki Toki , Akiji Higuchi , Kazuo Ono , Tomoya Hidaka , Hiroyuki Takeda
IPC分类号： C01G23/047
CPC分类号： C01B13/32 , C01G23/053 , C23C18/1216 , C23C18/122 , Y10T428/24355
摘要： The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.
摘要翻译： 本发明提供了适用于在200℃或更低的低温下生产金属氧化物薄膜的金属 - 氧基分散体和用于生产均相有机 - 无机混合材料的分散体。 本发明还提供具有各种能力的金属氧化物薄膜和有机 - 无机混合材料，特别是具有高折射率和高透明度的有机 - 无机混合材料。 使用具有金属 - 氧键的分散体，其通过在有机溶剂中将具有至少三个可水解基团的金属化合物与每摩尔金属化合物混合至少0.5摩尔但小于2摩尔水而获得， 不存在酸，碱和/或分散体稳定剂，并且在金属化合物开始水解或在低于金属化合物开始水解的温度的温度下，将温度升至至少水解开始的温度。
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公开(公告)号：US20060188657A1
公开(公告)日：2006-08-24
申请号：US10553109
申请日：2004-04-14
IPC分类号： B05D7/00
CPC分类号： C09D5/00 , B05D1/185 , C03C17/30 , Y10T428/261 , Y10T428/31504
摘要： An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.
摘要翻译： 本发明的目的在于提供一种能够快速成膜的有机薄膜的制造方法，能够稳定地形成具有最小杂质的致密有机薄膜，并且能够连续重复多次。 一种制造有机薄膜的方法，其中在基材表面上形成有机薄膜，该方法包括使基材与含有至少一种金属基表面活性剂的有机溶剂溶液接触的步骤（A） 可水解基团和能够与金属基表面活性剂相互作用的催化剂，其中有机溶剂溶液中的水含量被设定或保持在预定范围内。
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10.发明授权Organic thin film forming method, auxiliary agent for forming an organic thin film, and solution for forming an organic thin film 有权有机薄膜形成方法，用于形成有机薄膜的辅助剂和用于形成有机薄膜的溶液公开(公告)号：US08568836B2
公开(公告)日：2013-10-29
申请号：US11658108
申请日：2005-07-21
申请人： Nobuo Kimura , Yoshitaka Fujita , Tomoya Hidaka
发明人： Nobuo Kimura , Yoshitaka Fujita , Tomoya Hidaka
IPC分类号： B05D1/18
摘要： An organic thin film forming method for forming an organic thin film on a substrate surface comprising: contacting the substrate with a solution for forming an organic thin film obtained from an auxiliary agent for forming an organic thin film obtained by mixing a metal surfactant (1) having at least one hydrolytic group and a compound capable of interacting with the metal surfactant (1), and a metal surfactant (2) having at least one hydrolytic group, in an organic solvent, wherein a solution for forming an organic thin film is used in which the moisture content has been adjusted or maintained to be within a predetermined range; and, an auxiliary agent for forming an organic thin film and a solution for forming an organic thin film used in this method.
摘要翻译： 一种用于在基材表面上形成有机薄膜的有机薄膜形成方法，包括：使基材与用于形成有机薄膜的溶液接触，所述溶液由用于形成有机薄膜的辅助剂获得，所述有机薄膜通过将金属表面活性剂（1） 具有至少一种水解基团和能够与金属表面活性剂（1）相互作用的化合物和在有机溶剂中具有至少一个水解基团的金属表面活性剂（2），其中使用用于形成有机薄膜的溶液 其中水分含量已被调节或维持在预定范围内; 以及用于形成有机薄膜的辅助剂和用于形成用于该方法的有机薄膜的溶液。
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