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21 条记录 (耗时 0.024 秒)

    Quartz glass member and projection aligner
    4.
    发明授权
    Quartz glass member and projection aligner 有权
    石英玻璃构件和投影对准器

    公开(公告)号：US06835683B2

    公开(公告)日：2004-12-28

    申请号：US10311233

    申请日：2002-12-17

    申请人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

    发明人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

    IPC分类号： C03C306

    CPC分类号： C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

    摘要： A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

    摘要翻译： 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

    Synthetic silica glass and its manufacturing method
    6.
    发明授权
    Synthetic silica glass and its manufacturing method 有权
    合成石英玻璃及其制造方法

    公开(公告)号：US06442973B1

    公开(公告)日：2002-09-03

    申请号：US09235409

    申请日：1999-01-22

    申请人： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo

    发明人： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo

    IPC分类号： C03B1906

    CPC分类号： C03C4/0085 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52

    摘要： A method is provided for manufacturing a synthetic silica glass. The method includes the steps of maintaining a silica glass member, which is formed using a flame hydrolysis method and having an OH group concentration of about 500 ppm to about 1300 ppm, at a predetermined holding temperature for a predetermined period of time so as to substantially relax the structure of the silica glass member. The method further includes the step of subsequently cooling the silica glass member to a first predetermined temperature at a cooling rate of about 10 K/hour or less, and thereafter, cooling the silica glass member to a second predetermined temperature at a cooling rate of about 1 K/hour or less. The method further includes the step of further cooling the silica glass member to a third predetermined temperature at a cooling rate of about 10 K/hour or less.

    摘要翻译： 提供了一种制造合成石英玻璃的方法。 该方法包括以下步骤：在预定的保持温度下，使用火焰水解法形成并具有约500ppm至约1300ppm的OH基浓度的二氧化硅玻璃构件， 放松石英玻璃构件的结构。 该方法还包括以约10K /小时以下的冷却速度随后将石英玻璃构件冷却至第一预定温度的步骤，然后以大约的冷却速度将石英玻璃构件冷却至第二预定温度 1 K /小时以下。 该方法还包括以约10K /小时或更低的冷却速度将石英玻璃构件进一步冷却至第三预定温度的步骤。

    Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus
    7.
    发明授权
    Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus 有权
    合成石英玻璃构件，光刻设备和用于制造光刻设备的方法

    公开(公告)号：US06656860B2

    公开(公告)日：2003-12-02

    申请号：US09993564

    申请日：2001-11-27

    申请人： Akiko Yoshida ,  Norio Komine ,  Hiroki Jinbo

    发明人： Akiko Yoshida ,  Norio Komine ,  Hiroki Jinbo

    IPC分类号： C03C306

    CPC分类号： G03F7/70058 ,  C03C3/06 ,  C03C2201/21 ,  G03F7/70216 ,  G03F7/70958

    摘要： A photolithography apparatus has an exposure light source for emitting exposure light with a wavelength of 400 nm or less, a reticle with a pattern original image formed therein, an illumination optical system for illuminating the reticle with exposure light, a projection optical system for projecting the pattern image from the reticle onto a photosensitive plate and an alignment system for aligning the reticle and the photosensitive plate. At least some of the synthetic silica glass members composing the illumination optical system, the projection optical system and the reticle consist of synthetic silica glass members which, upon 1×104 pulse irradiation with an ArF excimer laser at an energy density from 0.1 &mgr;J/cm2·p to 200 mJ/cm2·p, have a loss factor no greater than 0.0050 cm−1 at 193.4 nm measured after irradiation, a hydrogen molecule concentration from 1×1016 molecules/cm3 to 2×1018 molecules/cm3 and a loss factor no greater than 0.0020 cm−1 before ultraviolet irradiation.

    摘要翻译： 一种光刻设备具有用于发射波长为400nm以下的曝光光的曝光光源，形成有图案原始图像的标线片，用曝光灯照亮该掩模版的照明光学系统，投影光学系统 从掩模版到感光板的图案图像和用于对准掩模版和感光板的对准系统。 构成照明光学系统的合成二氧化硅玻璃构件中的至少一部分，投影光学系统和掩模版由合成石英玻璃构件组成，在用能量密度为0.1μJ/ cm 2的ArF准分子激光器进行1×10 4脉冲照射时， cm 2 p至200mJ / cm 2，在照射后测量的193.4nm处的损耗因子不大于0.0050cm -1，氢分子浓度为1×10 16分子/ cm 2， 3> 2×10 18分子/ cm 3，并且在紫外线照射之前的损失因子不大于0.0020cm -1。

    Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the same
    8.
    发明授权
    Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the same 有权
    用于测量用于超低温使用的光学构件的透射率的方法，合成石英玻璃和使用其的光刻设备

    公开(公告)号：US06320661B1

    公开(公告)日：2001-11-20

    申请号：US09538965

    申请日：2000-03-31

    申请人： Akiko Yoshida ,  Norio Komine ,  Hiroki Jinbo

    发明人： Akiko Yoshida ,  Norio Komine ,  Hiroki Jinbo

    IPC分类号： G01N2100

    CPC分类号： G03F7/70958 ,  G01N21/59 ,  Y10S501/905

    摘要： A method is provided for evaluating a transmittance of an optical member for ultraviolet use, which is an object of measurement. The method includes the steps of cleaning the object of measurement, measuring a transmittance of the object of measurement within a predetermined time period from completion of the cleaning during which a rate of decrease in the transmittance of the object of measurement remains substantially constant, and correcting the transmittance measured in the step of measuring to a transmittance at an evaluation time arbitrarily selected within the predetermined time period in accordance with the constant rate of decrease in the transmittance and a time at which the transmittance is measured.

    摘要翻译： 提供了用于评价作为测量对象的紫外线用光学部件的透射率的方法。 该方法包括以下步骤：清洁测量对象，在测量对象的透射率的降低速率基本保持不变的清洁完成之后的预定时间段内测量测量对象的透射率，以及校正 根据透射率的恒定降低率和测定透射率的时间，在规定时间内任意选择的评价时刻的测定步骤中测定的透射率。

    Method for preparing sulfonated organic porous material
    9.
    发明授权
    Method for preparing sulfonated organic porous material 失效
    磺化有机多孔材料的制备方法

    公开(公告)号：US07119164B2

    公开(公告)日：2006-10-10

    申请号：US10651951

    申请日：2003-09-02

    申请人： Hiroshi Inoue ,  Koji Yamanaka ,  Akiko Yoshida ,  Yusaku Suenaga

    发明人： Hiroshi Inoue ,  Koji Yamanaka ,  Akiko Yoshida ,  Yusaku Suenaga

    IPC分类号： C08F12/08 ,  C08F8/36

    CPC分类号： B01J20/265 ,  B01J20/26 ,  B01J20/321 ,  B01J20/3251 ,  B01J39/20 ,  C08F8/36 ,  C08F2800/10 ,  C08F2800/20 ,  C08F212/08

    摘要： A sulfonated organic porous material in which at least 0.5 mg-equivalent/g (on a dry basis) of sulfonic acid groups has been introduced can be obtained by causing a gaseous substance containing sulfuric anhydride to come in contact with an organic porous material having mesopores existing on the walls of interconnected macropores and having a median radius of 0.01–100 μm and a total pore volume of 1–50 ml/g. This preparation method can ensure the introduction of a large amount of sulfonic acid groups into an organic porous material in a short period of time.

    摘要翻译： 可以通过使含有硫酸酐的气态物质与具有中孔的有机多孔材料接触而获得至少0.5mg当量/ g（基于干基）的磺酸基团）的磺化有机多孔材料 存在于相互连接的大孔的壁上，中间半径为0.01-100μm，总孔体积为1-50ml / g。 该制备方法可以确保在短时间内将大量的磺酸基团引入有机多孔材料中。

    Local area network system and router unit
    10.
    发明授权
    Local area network system and router unit 失效
    局域网系统和路由器单元

    公开(公告)号：US5987524A

    公开(公告)日：1999-11-16

    申请号：US940149

    申请日：1997-09-30

    申请人： Akiko Yoshida ,  Takaya Yamamoto

    发明人： Akiko Yoshida ,  Takaya Yamamoto

    IPC分类号： H04L12/28 ,  H04L29/12 ,  H04N7/16 ,  H04N21/258 ,  H04N21/64 ,  G06F13/38 ,  G06F15/17

    CPC分类号： H04L61/00 ,  H04L29/12009

    摘要： A local area network system which allows a plurality of subscriber terminals to communicate with each other via a central station, and a router unit therefor. Logical addresses assigned to the individual subscriber terminals and physical addresses associated therewith are previously registered to an address table. The central station receives transmission data from a first subscriber terminal, to which data a logical address of a second subscriber terminal is affixed. A physical address reading unit, as part of the central station, reads out a physical address corresponding to the received logical address by consulting the address table. When the received logical address was incorrect, the physical address reading unit cannot find the corresponding entry in the address table, and if that is the case, the received transmission data will be discarded. When the received logical address was found in the address table, the data transfer unit forwards the transmission data to the second subscriber terminal by using the logical address affixed to the received transmission data and the physical address that is read out by the physical address reading unit.

    摘要翻译： 允许多个用户终端经由中心站彼此通信的局域网系统及其路由器单元。 分配给各个用户终端的逻辑地址和与之相关的物理地址预先注册到地址表。 中央站接收来自第一用户终端的传输数据，附加第二用户终端的逻辑地址的数据。 物理地址读取单元作为中心站的一部分，通过查询地址表读出与接收的逻辑地址对应的物理地址。 当接收到的逻辑地址不正确时，物理地址读取单元在地址表中找不到相应的条目，如果是这样的话，接收的传输数据将被丢弃。 当在地址表中找到接收到的逻辑地址时，数据传送单元通过使用附加到接收到的传输数据的逻辑地址和由物理地址读取单元读出的物理地址将传输数据转发到第二用户终端 。