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34 条记录 (耗时 0.023 秒)

    Quartz glass member and projection aligner
    3.
    发明授权
    Quartz glass member and projection aligner 有权
    石英玻璃构件和投影对准器

    公开(公告)号：US06835683B2

    公开(公告)日：2004-12-28

    申请号：US10311233

    申请日：2002-12-17

    申请人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

    发明人： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

    IPC分类号： C03C306

    CPC分类号： C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

    摘要： A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

    摘要翻译： 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

    Synthetic silica glass and its manufacturing method
    6.
    发明授权
    Synthetic silica glass and its manufacturing method 有权
    合成石英玻璃及其制造方法

    公开(公告)号：US06442973B1

    公开(公告)日：2002-09-03

    申请号：US09235409

    申请日：1999-01-22

    申请人： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo

    发明人： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo

    IPC分类号： C03B1906

    CPC分类号： C03C4/0085 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52

    摘要： A method is provided for manufacturing a synthetic silica glass. The method includes the steps of maintaining a silica glass member, which is formed using a flame hydrolysis method and having an OH group concentration of about 500 ppm to about 1300 ppm, at a predetermined holding temperature for a predetermined period of time so as to substantially relax the structure of the silica glass member. The method further includes the step of subsequently cooling the silica glass member to a first predetermined temperature at a cooling rate of about 10 K/hour or less, and thereafter, cooling the silica glass member to a second predetermined temperature at a cooling rate of about 1 K/hour or less. The method further includes the step of further cooling the silica glass member to a third predetermined temperature at a cooling rate of about 10 K/hour or less.

    摘要翻译： 提供了一种制造合成石英玻璃的方法。 该方法包括以下步骤：在预定的保持温度下，使用火焰水解法形成并具有约500ppm至约1300ppm的OH基浓度的二氧化硅玻璃构件， 放松石英玻璃构件的结构。 该方法还包括以约10K /小时以下的冷却速度随后将石英玻璃构件冷却至第一预定温度的步骤，然后以大约的冷却速度将石英玻璃构件冷却至第二预定温度 1 K /小时以下。 该方法还包括以约10K /小时或更低的冷却速度将石英玻璃构件进一步冷却至第三预定温度的步骤。

    Method for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical member
    7.
    发明授权
    Method for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical member 有权
    用于估计光学构件对准分子激光照射的耐久性的方法和选择石英玻璃光学构件的方法

    公开(公告)号：US6075607A

    公开(公告)日：2000-06-13

    申请号：US166528

    申请日：1998-10-06

    申请人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara

    发明人： Hiroki Jinbo ,  Norio Komine ,  Seishi Fujiwara

    IPC分类号： G01N21/88 ,  G01N17/00 ,  G01N21/59 ,  G01N21/958 ,  G01B11/00

    CPC分类号： G01N17/004

    摘要： A method is provided for estimating durability of an optical member against pulsed excimer laser beam irradiation. The method includes the steps of (a) irradiating a test sample for the optical member with a pulsed excimer laser beam to induce changes in transparency of the test sample with respect to the pulsed excimer laser beam, the irradiation being performed for such a time period as to cover not only a linear region and a saturation region and (b) measuring changes in the transparency of the test sample with respect to the pulsed excimer laser beam as a function of the cumulative number of the excimer laser pulses that have irradiated the test sample in step (a). The method further includes the step of (c) repeating steps (a) and (b) with a plurality of different first predetermined energy densities of the pulsed excimer laser beam to derive a correlation equation representing the changes in the transparency of the test sample in the linear region and the saturated region in terms of the energy density of the pulsed excimer laser beam and the cumulative number of the excimer laser pulses and (d) estimating the durability of the optical member under actual usage conditions using the derived correlation equation.

    摘要翻译： 提供了一种用于估计光学构件对脉冲准分子激光束照射的耐久性的方法。 该方法包括以下步骤：（a）用脉冲准分子激光束照射光学部件的测试样品，以引起测试样品相对于脉冲准分子激光束的透明度变化，照射进行这样一段时间 不仅覆盖线性区域和饱和区域，并且（b）测量相对于脉冲准分子激光束的测试样品的透明度的变化，作为照射测试的准分子激光脉冲的累积数量的函数 步骤（a）中的样品。 该方法还包括以下步骤：（c）用脉冲准分子激光束的多个不同的第一预定能量密度重复步骤（a）和（b），以得出表示测试样品透明度变化的相关方程式 根据脉冲准分子激光束的能量密度和准分子激光脉冲的累积数量的线性区域和饱和区域，以及（d）使用导出的相关方程估计实际使用条件下的光学构件的耐久性。