MULTILAYERED MATERIAL AND METHOD OF PRODUCING THE SAME
    4.
    发明申请
    MULTILAYERED MATERIAL AND METHOD OF PRODUCING THE SAME 审中-公开
    多层材料及其制造方法

    公开(公告)号:US20120107607A1

    公开(公告)日:2012-05-03

    申请号:US13384037

    申请日:2010-07-12

    摘要: A multilayered material is provided which includes a substrate and a silicon-containing film formed on the substrate, wherein the silicon-containing film has a nitrogen-rich area including silicon atoms and nitrogen atoms, or silicon atoms, nitrogen atoms, and an oxygen atoms and the nitrogen-rich area is formed by irradiating a polysilazane film formed on the substrate with an energy beam in an atmosphere not substantially including oxygen or water vapor and denaturing at least a part of the polysilazane film. A method of producing the multilayered material is also provided.

    摘要翻译: 提供了一种多层材料,其包括在基板上形成的基板和含硅膜,其中所述含硅膜具有包含硅原子和氮原子的富氮区域,或硅原子,氮原子和氧原子 通过在基本上不含氧气或水蒸汽的气氛中用能量束照射形成在基板上的聚硅氮烷膜,使至少一部分聚硅氮烷膜变性来形成富氮区域。 还提供了制造多层材料的方法。