公开(公告)号：US07555973B2

公开(公告)日：2009-07-07

申请号：US10583691

申请日：2003-12-26

申请人： Noriyuki Asahara ,  Toru Takahashi ,  Yoshiaki Hirakawa ,  Yosuke Ando ,  Toshiyuki Suzuki ,  Umeo Tsuyusaki

发明人： Noriyuki Asahara ,  Toru Takahashi ,  Yoshiaki Hirakawa ,  Yosuke Ando ,  Toshiyuki Suzuki ,  Umeo Tsuyusaki

IPC分类号： B23B3/00 ,  B23B19/02

CPC分类号： B23B7/06 ,  B23B3/161 ,  B23B13/02 ,  B23B25/00 ,  B23Q1/763 ,  Y10T82/25 ,  Y10T82/2504 ,  Y10T82/2552 ,  Y10T82/2572 ,  Y10T82/26

摘要： An automatic lathe is capable of rapidly and easily switching between machining of a material with a guide bush and machining of the material without the guide bush. The automatic lathe has a guide bush support table, a support table fixing device for fixing the guide bush support table, a guide member rotatably installed on the guide bush support table so as not to move forward and backward, a guide bush detachably fitted to the tip of the guide member, a driving device for rotating the guide bush, a rotation transmission device for transmitting the rotation of the guide member to the spindle, and a spindle moving device for moving the spindle forward and backward within the guide member. A spindle fixing device positions and fixes the spindle at a specified position on the guide bush support table when the guide bush is removed from the guide member.

摘要翻译： 自动车床能够快速方便地在导向衬套加工材料之间进行切换，并且在没有引导衬套的情况下加工材料。 自动车床具有引导衬套支撑台，用于固定导向衬套支撑台的支撑台固定装置，可转动地安装在导套支撑台上以便不向前后移动的导向构件，可拆卸地装配到 引导构件的顶端，用于使引导衬套旋转的驱动装置，用于将引导构件的旋转传递到主轴的旋转传递装置，以及用于在引导构件内向前和向后移动主轴的主轴移动装置。 当导向衬套从导向件移除时，主轴固定装置将主轴定位并固定在导套支撑台上的指定位置。

公开(公告)号：US20070227317A1

公开(公告)日：2007-10-04

申请号：US10583691

申请日：2003-12-26

申请人： Noriyuki Asahara ,  Toru Takahashi ,  Yoshiaki Hirakawa ,  Yosuke Ando ,  Toshiyuki Suzuki ,  Umeo Tsuyusaki

发明人： Noriyuki Asahara ,  Toru Takahashi ,  Yoshiaki Hirakawa ,  Yosuke Ando ,  Toshiyuki Suzuki ,  Umeo Tsuyusaki

IPC分类号： B23B13/02

CPC分类号： B23B7/06 ,  B23B3/161 ,  B23B13/02 ,  B23B25/00 ,  B23Q1/763 ,  Y10T82/25 ,  Y10T82/2504 ,  Y10T82/2552 ,  Y10T82/2572 ,  Y10T82/26

摘要： An automatic lathe is provided which is capable of rapidly and easily switching between machining of a material with a guide bush and machining of the material without the guide bush. The automatic lathe has a guide bush support table (1) disposed closer to a tip side of a spindle (3) than a head stock (6); support table fixing means (15) for fixing the guide bush support table (1); a guide member (12) rotatably installed on the guide bush support table (1) so as not to move forward and backward; a guide bush (4) detachably fitted to the tip of the guide member (12); driving means (11) for rotating the guide bush (4); rotation transmission means (14a) and (31) for transmitting the rotation of the guide member (12) to the spindle (3); spindle moving means (7) for moving the spindle (3) forward and backward within the guide member (12); and spindle fixing means (17), (36) and (38) for positioning and fixing the spindle (3) at a specified position on the guide bush support table (1) when the guide bush (4) is removed from the guide member (12).

摘要翻译： 提供了一种自动车床，其能够快速且容易地在具有导向衬套的材料的加工之间切换并且在没有引导衬套的情况下加工材料。 自动车床具有比头架（6）更靠近主轴（3）的前端侧的导套支撑台（1）。 支撑台固定装置（15），用于固定导套支撑台（1）; 引导构件（12），其可旋转地安装在所述引导衬套支撑台（1）上，以便不向前和向后移动; 可拆卸地装配到引导构件（12）的尖端的引导衬套（4）; 驱动装置（11），用于旋转导套（4）; 旋转传递装置（14a）和（31），用于将引导构件（12）的旋转传递到主轴（3）; 主轴移动装置（7），用于在引导构件（12）内向前和向后移动主轴（3）; 以及用于在将引导衬套（4）从引导构件（4）移除时将主轴（3）定位并固定在导套支撑台（1）上的指定位置的主轴固定装置（17），（36）和（38） （12）。

公开(公告)号：US08802334B2

公开(公告)日：2014-08-12

申请号：US13440539

申请日：2012-04-05

申请人： Takeyuki Yamada ,  Toshiyuki Suzuki ,  Masahiro Hashimoto ,  Yasunori Yokoya

发明人： Takeyuki Yamada ,  Toshiyuki Suzuki ,  Masahiro Hashimoto ,  Yasunori Yokoya

IPC分类号： G03F1/00

CPC分类号： G03F1/68 ,  G03F1/80

摘要： Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less.

摘要翻译： 提供了一种掩模坯料表面处理方法，用于将具有薄膜的掩模坯料在基板上进行表面处理，使用处理液，形成转印图案的薄膜表面。 该薄膜由可以通过基于离子的干蚀刻蚀刻的材料制成。 包含在处理液中的蚀刻抑制剂的浓度为0.3ppb以下。

公开(公告)号：US08777347B2

公开(公告)日：2014-07-15

申请号：US13445992

申请日：2012-04-13

申请人： Osamu Shinkawa ,  Toshiyuki Suzuki

发明人： Osamu Shinkawa ,  Toshiyuki Suzuki

IPC分类号： B41J29/38

CPC分类号： B41J2/0451 ,  B41J2/04581

摘要： A printer has a plurality of dischargers for discharging ink, a detector for detecting an electric signal SW, and an inspector unit for inspecting the dischargers on the basis of the electric signal SW; and a grounding terminal connecting a drive element of a discharger being inspected is electrically disconnected from another grounding terminal and a grounding line GL when the electric signal SW is detected by the detector.

摘要翻译： 打印机具有用于排出墨的多个放电器，用于检测电信号SW的检测器和用于基于电信号SW检查放电器的检查单元; 并且当检测器检测到电信号SW时，连接被检查的放电器的驱动元件的接地端子与另一接地端子和接地线GL电连接。

公开(公告)号：US08663876B2

公开(公告)日：2014-03-04

申请号：US13201368

申请日：2010-02-04

申请人： Masahiro Hashimoto ,  Toshiyuki Suzuki ,  Hiroyuki Iwashita

发明人： Masahiro Hashimoto ,  Toshiyuki Suzuki ,  Hiroyuki Iwashita

IPC分类号： C23C16/34 ,  G03F1/22

CPC分类号： G03F1/50 ,  G03F1/32 ,  G03F1/54

摘要： A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon and comprising silicon carbide and/or a transition metal carbide.

摘要翻译： 用于制造适用于具有200nm以下的波长的曝光光的光掩模的光掩模坯料在透明基板上具有薄膜。 薄膜由含有过渡金属，硅和碳的材料制成，并且包含碳化硅和/或过渡金属碳化物。

公开(公告)号：US08663875B2

公开(公告)日：2014-03-04

申请号：US13201148

申请日：2010-01-29

申请人： Yasushi Okubo ,  Toshiyuki Suzuki ,  Masahiro Hashimoto

发明人： Yasushi Okubo ,  Toshiyuki Suzuki ,  Masahiro Hashimoto

IPC分类号： G03F1/48

CPC分类号： G03F1/48 ,  G03F1/32 ,  G03F1/54

摘要： A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to prevent the transfer characteristics of the thin film pattern from changing more than predetermined even in the case where exposure light with a wavelength of 200 nm or less is cumulatively applied onto the thin film pattern which has been formed. The main surface and the side walls are modified by, for instance, performing heat treatment to the main surface and the side walls at 450-900° C. in the atmosphere containing oxygen.

摘要翻译： 在透明基板上形成由含有金属和硅的材料构成的薄膜，通过图案化薄膜形成薄膜图案。 然后，预先修改薄膜图案的主表面和侧壁，以便即使在波长为200nm以下的曝光光为200nm以下的情况下，也能够防止薄膜图案的转印特性变化超过规定 累积地施加到已经形成的薄膜图案上。 主表面和侧壁通过例如在含有氧的气氛中在450-900℃下对主表面和侧壁进行热处理而进行改性。

公开(公告)号：US08659305B2

公开(公告)日：2014-02-25

申请号：US13108091

申请日：2011-05-16

申请人： Toshiyuki Suzuki

发明人： Toshiyuki Suzuki

IPC分类号： G01R27/04 ,  G01R27/00 ,  G01R27/08

CPC分类号： G01N27/4065

摘要： In a sensor control circuit, an impedance signal output unit has a HPF, a P/H circuit, a LPF, etc., and detects an element impedance of a sensor element on the basis of an impedance response signal which is alternately changed in response to an alternating current signal supplied to the sensor element. The P/H circuit has an input comparator which inputs an impedance detection voltage Vz after the HPF, a rectifying element connected to the P/H circuit, and a hold capacitor which is charged by the output of the input comparator. The input comparator has a constant current circuit and a transistor. The constant current circuit limits an updating value of a hold voltage value Vph of the hold capacitor every alternating current period. The sensor control device detects the element impedance of the sensor element with high accuracy while preventing influence of noise.

摘要翻译： 在传感器控制电路中，阻抗信号输出单元具有HPF，P / H电路，LPF等，并且基于响应中交替改变的阻抗响应信号来检测传感器元件的元件阻抗 提供给传感器元件的交流信号。 P / H电路具有输入比较器，其在HPF之后输入阻抗检测电压Vz，连接到P / H电路的整流元件和由输入比较器的输出充电的保持电容器。 输入比较器具有恒流电路和晶体管。 恒流电路每交流电流限制保持电容器的保持电压值Vph的更新值。 传感器控制装置以高精度检测传感器元件的元件阻抗，同时防止噪声的影响。

公开(公告)号：US08216742B2

公开(公告)日：2012-07-10

申请号：US12531366

申请日：2008-11-17

申请人： Yoshinori Yamamoto ,  Toshiyuki Suzuki ,  Haruyuki Aono ,  Junichi Shirahama

发明人： Yoshinori Yamamoto ,  Toshiyuki Suzuki ,  Haruyuki Aono ,  Junichi Shirahama

IPC分类号： H01M8/04 ,  H01M2/38

CPC分类号： H01M8/0254 ,  H01M8/0258 ,  H01M8/0265

摘要： In at least one of flow distribution areas 35 provided on a separator 15, plurality of first projections 46 formed in a region corresponding to a first section (parted regions 32a and 32c) of a center area (including parted regions 32a through 32c) having a relatively high flow rate of a first fluid (refrigerant) are designed to have a larger diameter of a cross section than plurality of first projections 46 formed in a region corresponding to a second section (parted region 32b) of the center area having a relatively low flow rate of the first fluid. This arrangement effectively attains a substantially uniform flow rate distribution of a fluid in a fluid flow path formed on a separator, which is configured to have concavo-convex structures formed in a mutually reversed relation on two opposed sides thereof.

公开(公告)号：US08100491B2

公开(公告)日：2012-01-24

申请号：US11780357

申请日：2007-07-19

申请人： Atsushi Oshima ,  Kunio Tabata ,  Toshiyuki Suzuki ,  Osamu Shinkawa ,  Tomoki Hatano

发明人： Atsushi Oshima ,  Kunio Tabata ,  Toshiyuki Suzuki ,  Osamu Shinkawa ,  Tomoki Hatano

IPC分类号： B41J29/38

摘要： A liquid jet apparatus includes a plurality of nozzles provided to the liquid jet head, an actuator provided corresponding to each of the nozzles, drive unit that applies a drive signal to the actuator, drive waveform signal generation unit that generates a drive waveform signal providing a reference of a signal for controlling the actuator, modulator unit that pulse-modulates the drive waveform signal generated by the drive waveform signal generation unit, a digital power amplifier for power-amplifying the modulated signal, which is pulse-modulated by the modulator unit, and a low-pass filter provided individually corresponding to the actuator and for supplying the actuator with the power amplified modulated signal power-amplified by the digital power amplifier as a drive signal after smoothing.

公开(公告)号：US20110217635A1

公开(公告)日：2011-09-08

申请号：US13122680

申请日：2010-10-08

申请人： Masahiro Hashimoto ,  Kazuya Sakai ,  Toshiyuki Suzuki ,  Kazunori Ono

发明人： Masahiro Hashimoto ,  Kazuya Sakai ,  Toshiyuki Suzuki ,  Kazunori Ono

IPC分类号： G03F1/00

CPC分类号： G03F1/46 ,  G03F1/54 ,  G03F1/80 ,  G03F1/82

摘要： The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask. In the manufacturing method, the transfer mask is produced by performing, in the following order, a process of forming a resist film having a transfer pattern on the chromium-based thin film, a process of forming a transfer pattern in the chromium-based thin film with use of a mask of the resist film having the transfer pattern, a process of forming a transfer pattern in the thin film for pattern formation with use of a mask of the chromium-based thin film having the transfer pattern, and a process of removing the chromium-based thin film by etching. The manufacturing method further includes a cleaning process of at least one of alkali solution cleaning, hot water cleaning, and ozone-containing water cleaning on the produced transfer mask until a width of the transfer pattern of the thin film for pattern formation is reduced by 4 nm or a space width of the thin film for pattern formation is increased by 4 nm.

摘要翻译： 本发明是一种使用掩模坯料制造转印掩模的方法，其中用于图案形成的薄膜和由含铬材料制成的铬基薄膜依次层叠在透明基板上。 用于图案形成的薄膜由含有硅和除铬以外的过渡金属的材料制成。 铬基薄膜由含铬的材料制成。 将具有200nm以下波长的曝光光施加到转印掩模。 在制造方法中，通过以下顺序，通过在铬系薄膜上形成具有转印图案的抗蚀剂膜的工序来制造转印掩模，在铬系薄膜中形成转印图案的工序 使用具有转印图案的抗蚀剂膜的掩模的膜，使用具有转印图案的铬基薄膜的掩模在图案形成用薄膜中形成转印图案的工序，以及 通过蚀刻去除铬基薄膜。 该制造方法还包括在制造的转印掩模上进行碱溶液清洗，热水清洗和含臭氧水清洗中的至少一种的清洗处理，直到图案形成用薄膜的转印图案的宽度减少4 nm或用于图案形成的薄膜的空间宽度增加4nm。