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    PROCESS OF CLEANING A SUBSTRATE FOR MICROELECTRONIC APPLICATIONS INCLUDING DIRECTING MECHANICAL ENERGY THROUGH A FLUID BATH AND APPARATUS OF SAME
    1.
    发明申请
    PROCESS OF CLEANING A SUBSTRATE FOR MICROELECTRONIC APPLICATIONS INCLUDING DIRECTING MECHANICAL ENERGY THROUGH A FLUID BATH AND APPARATUS OF SAME 审中-公开
    清洗用于微电子应用的基板的方法，其中包括通过流体槽的指向机械能量及其装置

    公开(公告)号：US20080257380A1

    公开(公告)日：2008-10-23

    申请号：US12104188

    申请日：2008-04-16

    申请人： Oh-Hun Kwon ,  Raymond H. Bryden ,  Qiang Zhao

    发明人： Oh-Hun Kwon ,  Raymond H. Bryden ,  Qiang Zhao

    IPC分类号： C25F3/30

    CPC分类号： B08B3/12 ,  B08B3/048 ,  H01L21/67051 ,  H01L21/67057

    摘要： An apparatus of cleaning a workpiece for microelectronic applications can include fixture to help position the workpiece. In one aspect the apparatus can include a tank and a transducer. In another aspect the apparatus can include a nozzle. The fixture, the tank, the nozzle, or any combination thereof can include an electrostatic dissipative material having a volume resistivity Rv not less than 1E5 ohm-cm and not greater than 1E11 ohm-cm. In a particular embodiment, a process of cleaning includes directing mechanical energy through a fluid to help overcome energy binding a contaminant to the workpiece.

    摘要翻译： 用于微电子应用的清洁工件的装置可以包括用于帮助定位工件的固定装置。 在一个方面，装置可以包括罐和换能器。 在另一方面，装置可以包括喷嘴。 固定装置，罐，喷嘴或其任何组合可以包括体积电阻率R 1不小于1E5欧姆 - 厘米且不大于1E11欧姆 - 厘米的静电耗散材料。 在特定实施例中，清洁过程包括引导机械能通过流体以帮助克服将污染物结合到工件上的能量。

    ELECTROSTATIC DISSIPATIVE STAGE AND EFFECTORS FOR USE IN FORMING LCD PRODUCTS
    2.
    发明申请
    ELECTROSTATIC DISSIPATIVE STAGE AND EFFECTORS FOR USE IN FORMING LCD PRODUCTS 审中-公开
    用于形成液晶产品的静电消散阶段和效果

    公开(公告)号：US20080259236A1

    公开(公告)日：2008-10-23

    申请号：US12101686

    申请日：2008-04-11

    申请人： Oh-Hun Kwon ,  Steve D. Hartline ,  Raymond H. Bryden

    发明人： Oh-Hun Kwon ,  Steve D. Hartline ,  Raymond H. Bryden

    IPC分类号： G02F1/133 ,  B05D5/00 ,  B05D5/12

    CPC分类号： H01L27/1214 ,  H01L21/68757

    摘要： A process for producing a liquid crystal display (LCD) is provided that includes placing a glass substrate on a stage, and subjecting the glass substrate to at least one processing operation of a plurality of processing operations for forming an array of electronic devices on the glass substrate. The stage being electrostatic discharge dissipative and having a surface portion that has a volume resistivity (Rv) within a range between about 1E5 Ωcm and about 1E11 Ωcm.

    摘要翻译： 提供了一种用于制造液晶显示器（LCD）的方法，其包括将玻璃基板放置在平台上，并对玻璃基板进行至少一个处理操作，所述处理操作用于在玻璃上形成电子器件阵列 基质。 该阶段是静电放电耗散并且具有体积电阻率（R bias v）在约1E5Ωm至约1E11Ωm之间的范围内的表面部分。