-
公开(公告)号:US10279540B2
公开(公告)日:2019-05-07
申请号:US15120399
申请日:2015-02-20
Inventor: Jeong-Hwan Kim , Murtaza Bohra , Vidya Dhar Singh , Antony Douglas Galea , Panagiotis Grammatikopoulos , Mukhles Ibrahim Sowwan
Abstract: A two-dimensional nano-sheet that is foldable in response to a surrounding pH value includes a polyethyleneimine (PEI) chain taking a two-dimensional form; and a plurality of domains made of gold, attached to the PEI chain, the plurality of domains of gold forming a percolating gold film on the PEI chain.
-
公开(公告)号:US10828622B2
公开(公告)日:2020-11-10
申请号:US15736721
申请日:2016-06-28
Inventor: Mukhles Ibrahim Sowwan , Cathal Cassidy , Vidya Dhar Singh
IPC: B01J37/34 , B01J23/44 , B01J35/00 , B01J23/58 , H01M4/92 , B01J23/02 , B01J33/00 , B01J37/00 , B01J37/02 , B01J37/14 , H01M8/1011
Abstract: A novel catalyst includes a plurality of nanoparticles, each nanoparticle including a core made of a catalytic metal and a porous shell surrounding the core, made of metal oxide, the porous shell preserving a catalytic function of the core and reducing reduction of the core and coalescence of the nanoparticles.
-
公开(公告)号:US09633842B2
公开(公告)日:2017-04-25
申请号:US14774226
申请日:2014-03-07
Inventor: Vidya Dhar Singh , Cathal Cassidy , Mukhles Ibrahim Sowwan
CPC classification number: H01L21/02658 , C01B33/021 , C30B1/023 , C30B28/02 , C30B29/06 , C30B29/60 , H01L21/02532 , H01L21/02601 , H01L21/02631 , H01L29/04 , H01L29/16
Abstract: A method of forming crystallized semiconductor particles includes: forming amorphous semiconductor particles in a vacuumed aggregation chamber; transporting the amorphous semiconductor particles formed in the vacuumed aggregation chamber to a vacuumed deposition chamber within which a substrate is held; and applying a vapor of a metal catalyst to the amorphous semi-conductor particles while still in transit to the substrate in the vacuumed deposition chamber to induce crystallization of at least portion of the amorphous semiconductor particles via the metal catalyst in the transit, thereby depositing the crystallized semiconductor particles with the metal catalyst attached thereto onto the substrate.
-
-