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公开(公告)号：US20230392249A1
公开(公告)日：2023-12-07
申请号：US18235219
申请日：2023-08-17
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi
CPC分类号： C23C8/18 , C22C38/50 , C25D3/12 , C25D5/48 , H01M8/1226 , C23C28/345 , C23C28/04
摘要： Provided is an alloy material including a metal oxide thin layer that can be formed using a simple method at low cost and can further suppress volatilization of Cr, which causes deterioration of a fuel cell, compared with a case where conventional expensive materials are used. Disclosed is a manufacturing method for an alloy material including a coating treatment step for coating a substrate made of a Fe—Cr based alloy with Co, and an oxidation treatment step for performing oxidation treatment on the substrate in a moisture-containing atmosphere after the coating treatment step.
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公开(公告)号：US20230110742A1
公开(公告)日：2023-04-13
申请号：US17914236
申请日：2021-03-31
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Yuji Tsuda , Hisao Ohnishi
IPC分类号： H01M8/0254 , H01M8/1246 , H01M4/88 , H01M8/0232 , C25B1/04 , C25B15/08 , C25B9/63
摘要： In a metal support mostly used for a metal-supported solid oxide fuel cell (SOFC), a SOFC system that improves the power generation efficiency by allowing a gas to smoothly flow into or flow out from the through-holes is achieved. A metal support is formed in a plate shape as a whole and has a plurality of through-holes penetrating from a front surface on which an electrode layer is provided to a back surface, and the metal support has inclined through-holes, as the through-holes each of which has a central axis inclined with respect to a thickness direction.
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公开(公告)号：US11228041B2
公开(公告)日：2022-01-18
申请号：US16498427
申请日：2018-03-30
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi , Kazuyuki Minami , Yuji Tsuda
IPC分类号： H01M8/021 , H01M8/04082 , H01M8/0612 , H01M8/124
摘要： Provided are a low-cost electrochemical device and the like that have both durability and high performance as well as excellent reliability. The electrochemical device includes at least one metal material, and the metal material is made of a Fe—Cr alloy that contains Ti in an amount of more than 0.10 mass % and 1.0 mass % or less.
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公开(公告)号：US10892493B2
公开(公告)日：2021-01-12
申请号：US15760786
申请日：2016-09-14
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi , Kyohei Manabe , Osamu Yamazaki , Kazuyuki Minami , Yuji Tsuda
IPC分类号： H01M4/86 , H01M8/0232 , H01M8/1213 , H01M8/1253 , H01M8/126 , H01M4/88 , H01M8/12 , H01M8/02 , H01M8/124 , H01M4/90
摘要： Realized is an element having an electrolyte layer that is dense and has high gas barrier characteristics. A metal-supported electrochemical element includes at least a metal substrate as a support, an electrode layer formed on/over the metal substrate, a buffer layer formed on the electrode layer, and an electrolyte layer formed on the buffer layer. The electrode layer is porous and the electrolyte layer is dense. The buffer layer has density higher than density of the electrode layer and lower than density of the electrolyte layer.
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公开(公告)号：US20200321620A1
公开(公告)日：2020-10-08
申请号：US16910246
申请日：2020-06-24
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi , Kyohei Manabe , Osamu Yamazaki , Kazuyuki Minami , Yuji Tsuda
IPC分类号： H01M4/86 , H01M8/0232 , H01M8/1213 , H01M8/1253 , H01M8/126 , H01M4/88 , H01M8/12 , H01M8/02
摘要： Realized is an element having an electrolyte layer that is dense and has high gas barrier characteristics. A metal-supported electrochemical element includes at least a metal substrate as a support, an electrode layer formed on/over the metal substrate, a buffer layer formed on the electrode layer, and an electrolyte layer formed on the buffer layer. The electrode layer is porous and the electrolyte layer is dense. The buffer layer has density higher than density of the electrode layer and lower than density of the electrolyte layer.
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公开(公告)号：US20200028193A1
公开(公告)日：2020-01-23
申请号：US16497470
申请日：2018-03-30
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi
IPC分类号： H01M8/1226 , H01M8/243 , H01M8/04007
摘要： Provided are an electrochemical element and the like that have both durability and high performance as well as excellent reliability. The electrochemical element includes a metal support, and an electrode layer formed on/over the metal support. The metal support is made of any one of a Fe—Cr based alloy that contains Ti in an amount of 0.15 mass % or more and 1.0 mass % or less, a Fe—Cr based alloy that contains Zr in an amount of 0.15 mass % or more and 1.0 mass % or less, and a Fe—Cr based alloy that contains Ti and Zr, a total content of Ti and Zr being 0.15 mass % or more and 1.0 mass % or less.
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公开(公告)号：US11749824B2
公开(公告)日：2023-09-05
申请号：US17043841
申请日：2019-03-29
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi
IPC分类号： H01M8/1226 , C22C38/18 , H01M8/0232 , H01M8/026 , H01M8/04014 , H01M8/0612 , H01M8/12
CPC分类号： H01M8/1226 , C22C38/18 , H01M8/026 , H01M8/0232 , H01M8/04022 , H01M8/0618 , H01M2008/1293
摘要： Provided are a metal plate configured such that sufficient strength and performance are ensured and the workability and cost of mass production are improved, and an electrochemical element and the like including the metal plate. A metal plate 1 includes a thick portion 110, and a thin portion 120 that is thinner than the thick portion 110. The thin portion 120 is provided with a penetration space 1c passing through the thin portion 120 in the thickness direction.
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公开(公告)号：US20230234084A1
公开(公告)日：2023-07-27
申请号：US17916077
申请日：2021-03-31
发明人： Kyohei Manabe , Katsuki Higaki , Hisao Ohnishi , Mitsuaki Echigo , Tadayuki Sogi , Jun Akedo , Rintaro Aoyagi , Hiroaki Matsui , Kentaro Shinoda , Hiroki Tsuda
CPC分类号： B05B7/0012 , B05B16/60 , B05B7/1404 , B05B7/1486 , C23C24/04
摘要： Provided is a film forming apparatus capable of stably supplying a large amount of ceramic raw material powder for a long time and forming a homogeneous and dense film. A film forming apparatus 1 for forming a film on a base material K includes an aerosol transport path 10 for ejecting an aerosol obtained by dispersing a ceramic raw material powder in a gas, from an ejection end 10a toward the base material K, in which a flow path cross-section at an ejection end 10a of the aerosol transport path 10 has a substantially circular shape with an area of 10 mm2 or more.
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9.发明授权公开(公告)号：US11677080B2
公开(公告)日：2023-06-13
申请号：US16497478
申请日：2018-03-30
申请人： Osaka Gas Co., Ltd.
发明人： Kazuyuki Minami , Mitsuaki Echigo , Hisao Ohnishi , Yuji Tsuda , Kyohei Manabe , Osamu Yamazaki
IPC分类号： H01M4/90 , H01M4/86 , H01M4/88 , H01M8/1213
CPC分类号： H01M4/9033 , H01M4/8652 , H01M4/8657 , H01M4/8807 , H01M4/8882 , H01M8/1213
摘要： Provided is a low-cost electrochemical element that includes a high-performance electrode layer. The electrochemical element includes an electrode layer, and the electrode layer contains small particles and large particles. The small particles have a particle diameter of 200 nm or less in the electrode layer, and the large particles have a particle diameter of 500 nm or more in the electrode layer.
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公开(公告)号：US11189839B2
公开(公告)日：2021-11-30
申请号：US16910246
申请日：2020-06-24
申请人： Osaka Gas Co., Ltd.
发明人： Mitsuaki Echigo , Hisao Ohnishi , Kyohei Manabe , Osamu Yamazaki , Kazuyuki Minami , Yuji Tsuda
IPC分类号： H01M4/86 , H01M8/0232 , H01M8/1213 , H01M8/1253 , H01M8/126 , H01M4/88 , H01M8/12 , H01M8/02 , H01M8/124 , H01M4/90
摘要： Realized is an element having an electrolyte layer that is dense and has high gas barrier characteristics. A metal-supported electrochemical element includes at least a metal substrate as a support, an electrode layer formed on/over the metal substrate, a buffer layer formed on the electrode layer, and an electrolyte layer formed on the buffer layer. The electrode layer is porous and the electrolyte layer is dense. The buffer layer has density higher than density of the electrode layer and lower than density of the electrolyte layer.
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