公开(公告)号：US4600397A

公开(公告)日：1986-07-15

申请号：US721956

申请日：1985-04-11

申请人： Osamu Kawakubo ,  Eiji Munemoto ,  Akihiko Okubora

发明人： Osamu Kawakubo ,  Eiji Munemoto ,  Akihiko Okubora

IPC分类号： H01J9/02 ,  H01J17/06 ,  H01J17/49 ,  H01J9/12

CPC分类号： H01J9/02 ,  H01J17/06

摘要： The present invention discloses a method of producing a discharge display device which enables formation of a satisfactory LaB.sub.6 cathode without using a LaB.sub.6 paste containing a glass binder. The method of the present invention comprises the steps of applying a conductive paste containing a glass binder, temporarily drying said conductive paste to form a conductive paste layer, forming a LaB.sub.6 layer containing no glass binder on said conductive paste layer, burning said conductive paste layer and said LaB.sub.6 layer, at the same time, and activating said LaB.sub.6 layer after being burnt, and after an exhausting step by gas discharge with large current to form a LaB.sub.6 cathode.

摘要翻译： 本发明公开了一种不使用含有玻璃粘合剂的LaB6糊料，能够形成令人满意的LaB6阴极的放电显示装置的制造方法。 本发明的方法包括以下步骤：施加含有玻璃粘结剂的导电膏，暂时干燥所述导电膏以形成导电糊层，在所述导电浆料层上形成不含玻璃粘合剂的LaB6层，将所述导电膏层 和LaB6层，同时在烧焦后激活所述LaB6层，并且在排气步骤之后通过大电流的气体放电形成LaB6阴极。

公开(公告)号：US5672460A

公开(公告)日：1997-09-30

申请号：US480608

申请日：1995-06-08

申请人： Toshihiro Katoh ,  Takao Kuriyama ,  Tatsuya Takei ,  Takashi Kawai ,  Hiroshi Murakami ,  Eiji Munemoto ,  Norio Ohta ,  Koji Shimada

发明人： Toshihiro Katoh ,  Takao Kuriyama ,  Tatsuya Takei ,  Takashi Kawai ,  Hiroshi Murakami ,  Eiji Munemoto ,  Norio Ohta ,  Koji Shimada

IPC分类号： G03F7/004 ,  G03F7/021 ,  G03F7/04 ,  H01J9/02 ,  G03C11/00

CPC分类号： G03F7/0212 ,  G03F7/0047 ,  G03F7/04 ,  H01J9/02 ,  H01J2217/04

摘要： The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.

摘要翻译： 本发明的目的在于解决通过光刻技术形成图形形式的导电或绝缘层所涉及的问题，即在用碱性水溶液进行显影时与处理溶剂有关的环境问题和与废水处理有关的问题。 通过光刻法在玻璃基板上形成导电层（阳极母线3）或绝缘层（阻挡层1）的方法，使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘 粉末成为PVA系的水溶性感光性溶液，其中，全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量％以下。 这使得涂层不会凝胶化PVA。 与使用溶剂型感光浆料的常规光刻不同，本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。

公开(公告)号：US4798992A

公开(公告)日：1989-01-17

申请号：US31889

申请日：1987-03-30

申请人： Hiroshi Ichigaya ,  Susumu Tagawa ,  Yasuoshi Sugii ,  Masanori Ando ,  Jun Yamazaki ,  Yasuo Kawada ,  Tokuho Kinoshita ,  Toshio Shirahama ,  Yoshinori Ito ,  Eiji Munemoto

发明人： Hiroshi Ichigaya ,  Susumu Tagawa ,  Yasuoshi Sugii ,  Masanori Ando ,  Jun Yamazaki ,  Yasuo Kawada ,  Tokuho Kinoshita ,  Toshio Shirahama ,  Yoshinori Ito ,  Eiji Munemoto

IPC分类号： H01J29/07

CPC分类号： H01J29/073 ,  H01J2229/0761

摘要： A color cathode-ray tube where an electron beam selection mask with an aperture grille type beam selection electrode of a thin metal plate attached to a frame is supported by engagement of stud pins with support springs and is thereby positioned stably opposite to a color luminescent screen formed on the inner surface of a panel. A projection is formed on either the top of each stud pin or the bottom of each cap opposed thereto, while a recess is formed in the other for engagement with the projection in the direction orthogonal to the action of the support spring. The mutual contact portions of such projection and recess are coated with solid lubricant films so that the beam selection mask can be reset at its proper position despite any external impact applied thereto. The elasticity constant of the frame is selectively set at a desired value with additional disposition of reinforcing plates having the same thermal expansion coefficient as that of the frame, thereby averting vibration of the beam selection mask. And rotary mechanisms are formed relative to the support springs and are rotated in accordance with thermal expansion of the frame, so that the frame is shifted toward the panel surface having a color luminescent screen thereon, whereby mislanding of the electron beam due to temperature rise in the beam selection mask can be prevented.

摘要翻译： 一种彩色阴极射线管，其中具有安装在框架上的薄金属板的孔格栅型选择电极的电子束选择掩模由支柱弹簧与螺柱销接合而支撑，从而与彩色荧光屏 形成在面板的内表面上。 在每个螺柱销的顶部或与其相对的每个盖的底部上形成突起，而另一个突起形成在与支撑弹簧的作用正交的方向上与突起接合的凹部。 这种突起和凹槽的相互接触部分涂覆有固体润滑剂膜，使得束选择掩模可以在其适当位置被复位，尽管施加了任何外部冲击。 通过附加布置具有与框架相同的热膨胀系数的增强板，框架的弹性常数被选择性地设定在期望值，从而避免了束选择掩模的振动。 并且旋转机构相对于支撑弹簧形成，并且根据框架的热膨胀而旋转，使得框架朝向具有彩色荧光屏的面板表面移动，由此由于温度升高引起的电子束的误着地 可以防止光束选择掩模。

公开(公告)号：US4150995A

公开(公告)日：1979-04-24

申请号：US854397

申请日：1977-11-23

申请人： Yukikazu Moritsu ,  Kooji Yamada ,  Masatoshi Wada ,  Eiji Munemoto

发明人： Yukikazu Moritsu ,  Kooji Yamada ,  Masatoshi Wada ,  Eiji Munemoto

IPC分类号： C03C8/18 ,  C03C12/00 ,  C04B41/51 ,  C04B41/88 ,  C09D5/38 ,  H05K1/03 ,  H05K3/18 ,  C23C3/02 ,  C03C5/00 ,  C03C17/04

CPC分类号： C04B41/009 ,  C03C12/00 ,  C03C8/18 ,  C04B41/5122 ,  C04B41/88 ,  C09D5/38 ,  C03C2205/00 ,  C03C2205/02 ,  H05K1/0306 ,  H05K3/181

摘要： A vitreous enamel composition comprising 1 part by weight of a vitreous enamel solid component composed of (1) 90- 99.9 wt. % of glass powder consisting of 30 to 70 wt. % of SiO.sub.2, 1- 65 wt. % of PbO, and 1-- 15 wt. % of R.sub.2 O in which R is K, Na or Li, and (2) 0.1-- 10 wt. % of palladium powder, and 1- 20 parts by weight of an organic vehicle.

摘要翻译： 一种玻璃质搪瓷组合物，其包含1重量份的由（1）90-99.9重量％ ％的玻璃粉末由30〜70wt。 ％的SiO 2，1-65wt。 ％的PbO和1--15wt。 其中R为K，Na或Li的R2O％，（2）0.1-10wt。 ％的钯粉末和1-20重量份的有机载体。

公开(公告)号：US4172733A

公开(公告)日：1979-10-30

申请号：US851638

申请日：1977-11-15

申请人： Yukikazu Moritsu ,  Kooji Yamada ,  Masatoshi Wada ,  Eiji Munemoto

发明人： Yukikazu Moritsu ,  Kooji Yamada ,  Masatoshi Wada ,  Eiji Munemoto

IPC分类号： C03C12/00 ,  C03C17/02 ,  C09D5/38 ,  C23C18/18

CPC分类号： C03C12/00 ,  C03C17/02 ,  C09D5/38 ,  C23C18/1865 ,  C23C18/1882 ,  C23C18/1893

摘要： A vitreous enamel composition comprising 1 part by weight of a vitreous enamel solid component composed of (1) 90-99.9 wt. % of glass powder consisting predominantly of 40 to 80 wt. % of SiO.sub.2, 1-25 wt. % of at least one of B.sub.2 O.sub.3 and CaO, and 1-20 wt. % of R.sub.2 O in which R is K, Na or Li, and (2) 0.1-10 wt. % of palladium powder, and 1-20 parts by weight of an organic vehicle.

摘要翻译： 一种玻璃质搪瓷组合物，其包含1重量份的由（1）90-99.9重量％ 主要由40至80重量％组成的玻璃粉末％ ％的SiO 2，1-25wt。 B2O3和CaO中的至少一种的％，和1-20重量％ 其中R为K，Na或Li的R2O％，（2）0.1-10重量％ ％的钯粉末和1-20重量份的有机载体。

公开(公告)号：US6030707A

公开(公告)日：2000-02-29

申请号：US212283

申请日：1998-12-16

申请人： Toshihiro Katoh ,  Takao Kuriyama ,  Tatsuya Takei ,  Takashi Kawai ,  Hiroshi Murakami ,  Eiji Munemoto ,  Norio Ohta ,  Koji Shimada

发明人： Toshihiro Katoh ,  Takao Kuriyama ,  Tatsuya Takei ,  Takashi Kawai ,  Hiroshi Murakami ,  Eiji Munemoto ,  Norio Ohta ,  Koji Shimada

IPC分类号： G03F7/004 ,  G03F7/021 ,  G03F7/04 ,  H01J9/02 ,  B32B9/04

CPC分类号： G03F7/0212 ,  G03F7/0047 ,  G03F7/04 ,  H01J9/02 ,  H01J2217/04

摘要： The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling of a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.

摘要翻译： 本发明的目的是解决通过光刻法形成图案形式的导电或绝缘层所涉及的问题，即与处理溶剂有关的环境问题以及与碱性水溶液的显影中的废水处理有关的问题 。 通过光刻法在玻璃基板上形成导电层（阳极母线3）或绝缘层（阻挡层1）的方法，使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘 粉末成为PVA系的水溶性感光性溶液，其中，全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量％以下。 这使得涂层不会凝胶化PVA。 与使用溶剂型感光浆料的常规光刻不同，本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。

公开(公告)号：US5891604A

公开(公告)日：1999-04-06

申请号：US857251

申请日：1997-05-16

申请人： Toshihiro Katoh ,  Takao Kuriyama ,  Tatsuya Takei ,  Takashi Kawai ,  Hiroshi Murakami ,  Eiji Munemoto ,  Norio Ohta ,  Koji Shimada

发明人： Toshihiro Katoh ,  Takao Kuriyama ,  Tatsuya Takei ,  Takashi Kawai ,  Hiroshi Murakami ,  Eiji Munemoto ,  Norio Ohta ,  Koji Shimada

IPC分类号： G03F7/004 ,  G03F7/021 ,  G03F7/04 ,  H01J9/02 ,  G03C1/492

CPC分类号： G03F7/0212 ,  G03F7/0047 ,  G03F7/04 ,  H01J9/02 ,  H01J2217/04

摘要： The present invention aims to solve problems involved in the formation of a conductive or insulating layer in a pattern form by photolithography, i.e., an environmental problem associated with handling a solvent and a problem associated with wastewater treatment in the development with an aqueous alkaline solution. A method for forming a conductive layer (an anode bus 3) or an insulating layer (a barrier 1) on a glass substrate by photolithography using a photosensitive slurry solution prepared by mixing a low-melting glass powder as a binder and a conductive or insulating powder into a PVA-based, water-soluble photosensitive solution, wherein the content of B.sub.2 O.sub.3 component in the whole low-melting glass powder is closely regulated to not more than 6% by weight. This enables coating without gelation of PVA. Unlike the conventional photolithography using a solvent type photosensitive slurry, the method of the present invention can solve the environmental problem associated with handling a solvent and the problem associated with wastewater treatment in the development with an aqueous alkaline solution.

摘要翻译： 本发明的目的在于解决通过光刻技术形成图形形式的导电或绝缘层所涉及的问题，即在用碱性水溶液进行显影时与处理溶剂有关的环境问题和与废水处理有关的问题。 通过光刻法在玻璃基板上形成导电层（阳极母线3）或绝缘层（阻挡层1）的方法，使用通过混合低熔点玻璃粉末作为粘合剂而制备的感光浆料溶液和导电或绝缘 粉末成为PVA系的水溶性感光性溶液，其中，全部低熔点玻璃粉末中的B 2 O 3成分的含量被严格控制在6重量％以下。 这使得涂层不会凝胶化PVA。 与使用溶剂型感光浆料的常规光刻不同，本发明的方法可以解决与碱性溶液的显影相关的处理溶剂和与废水处理有关的问题的环境问题。