公开(公告)号：US20180259464A1

公开(公告)日：2018-09-13

申请号：US15913623

申请日：2018-03-06

Applicant: Malvern Panalytical B.V.

Inventor： Detlef Beckers ,  Alexander Kharchenko ,  Milen Gateshki ,  Eugene Reuvekamp

IPC: G01N23/20091

Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.

公开(公告)号：US09110003B2

公开(公告)日：2015-08-18

申请号：US13780216

申请日：2013-02-28

Applicant: PANalytical B.V.

Inventor： Detlef Beckers ,  Milen Gateshki

IPC: G01N23/207

CPC classification number: G01N23/207 ,  G01N2223/313

Abstract: A method of X-ray diffraction illuminates a beam (4) of X-rays along an illuminated strip (16) on a surface (14) of a sample (10). The X-rays are diffracted by the sample (10) and pass through a mask (20) having a slit extending essentially perpendicularly to the strip (16). The X-rays are detected by a two-dimensional X-ray detector to measure the diffracted X-rays at different positions along the strip (16).

Abstract translation: X射线衍射的方法沿着样品（10）的表面（14）上的照明条（16）照射X射线束（4）。 X射线被样品（10）衍射并通过具有基本上垂直于条带（16）延伸的狭缝的掩模（20）。 通过二维X射线检测器检测X射线，以测量沿着条带（16）的不同位置的衍射X射线。

公开(公告)号：US20130243159A1

公开(公告)日：2013-09-19

申请号：US13780216

申请日：2013-02-28

Applicant: PANALYTICAL B.V.

Inventor： Detlef Beckers ,  Milen Gateshki

IPC: G01N23/207

CPC classification number: G01N23/207 ,  G01N2223/313

Abstract: A method of X-ray diffraction illuminates a beam (4) of X-rays along an illuminated strip (16) on a surface (14) of a sample (10). The X-rays are diffracted by the sample (10) and pass through a mask (20) having a slit extending essentially perpendicularly to the strip (16). The X-rays are detected by a two-dimensional X-ray detector to measure the diffracted X-rays at different positions along the strip (16).

Abstract translation: X射线衍射的方法沿着样品（10）的表面（14）上的照明条（16）照射X射线束（4）。 X射线被样品（10）衍射并通过具有基本上垂直于条带（16）延伸的狭缝的掩模（20）。 通过二维X射线检测器检测X射线，以测量沿着条带（16）的不同位置的衍射X射线。

公开(公告)号：US11035805B2

公开(公告)日：2021-06-15

申请号：US16382562

申请日：2019-04-12

Applicant: Malvern Panalytical B.V.

Inventor： Detlef Beckers ,  Milen Gateshki ,  Jaap Boksem

IPC: G01N23/20008 ,  G01N23/201 ,  G01N23/207 ,  G01N23/2055 ,  G01N23/20

Abstract: An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

公开(公告)号：US10753890B2

公开(公告)日：2020-08-25

申请号：US15913623

申请日：2018-03-06

Applicant: Malvern Panalytical B.V.

Inventor： Detlef Beckers ,  Alexander Kharchenko ,  Milen Gateshki ,  Eugene Reuvekamp

IPC: G01N23/20091 ,  G01N23/20008

Abstract: An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.

公开(公告)号：US12031925B2

公开(公告)日：2024-07-09

申请号：US17899096

申请日：2022-08-30

Applicant: Malvern Panalytical B.V.

Inventor： Detlef Beckers ,  Alexander Kharchenko ,  Milen Gateshki

IPC: G01N23/20008 ,  G01N23/223 ,  H05G1/52 ,  A61B6/00 ,  A61B6/40 ,  A61B6/42

CPC classification number: G01N23/20008 ,  G01N23/223 ,  A61B6/40 ,  A61B6/4208 ,  A61B6/44 ,  H05G1/52

Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 μm. In the second X-ray analysis mode the X-ray source operates at a second operating power that is higher than the first operating power, and the area of the effective focal spot is larger than the area of the effective focal spot in the first X-ray analysis mode.

公开(公告)号：US20230258584A1

公开(公告)日：2023-08-17

申请号：US18014401

申请日：2021-08-26

Applicant: Malvern Panalytical B.V.

Inventor： Milen Gateshki ,  Detlef BECKERS ,  Jan Vugteveen

IPC: G01N23/20025

CPC classification number: G01N23/20025 ,  G01N2223/056 ,  G01N2223/1016 ,  G01N2223/309

Abstract: The present invention relates to sample holder for holding a sample. The sample holder comprises a body having an incident surface and an opening in the body for receiving a sample. When the sample is irradiated with X-rays the incident surface of the sample holder may also be irradiated, especially at low incident angles. To reduce background scattering from the incident surface, the incident surface comprises a protrusion for blocking X-rays.

公开(公告)号：US10782252B2

公开(公告)日：2020-09-22

申请号：US16382606

申请日：2019-04-12

Applicant: Malvern Panalytical B.V.

Inventor： Milen Gateshki ,  Detlef Beckers

IPC: G01N23/20 ,  G01N23/20008 ,  G01N23/20016 ,  G01N23/223

Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.

公开(公告)号：US20160258890A1

公开(公告)日：2016-09-08

申请号：US14636950

申请日：2015-03-03

Applicant: PANalytical B.V.

Inventor： Charalampos Zarkadas ,  Milen Gateshki ,  Alexander Kharchenko ,  Waltherus Van Den Hoogenhof ,  Petronella Emerentiana Hegeman ,  Dick Kuiper

IPC: G01N23/22 ,  G01N23/223

CPC classification number: G01N23/2206 ,  G01N23/20083 ,  G01N23/223 ,  G01N2223/401

Abstract: Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ψ1 to the surface of the sample and measuring a measured intensity Id(θfl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ψ2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.

Abstract translation: 通过进行X射线荧光测量来确定样品的元素组成和通过直接通过样品直接透射而不偏离地测量X射线的透射强度来进行定量X射线分析。 通过将来自X射线源的能量E的X射线以入射角ψ1的样品引导到样品的表面上并测量测量的强度Id（θfl），进行X射线衍射测量 X射线检测器以能量E的衍射X射线以与预定分量的X射线衍射峰对应的出射角ψ2。 使用X射线衍射测量中的测量的X射线强度，由元素组成和元素的质量衰减系数计算的样本的校正测量和质量衰减​​系数获得矩阵校正的X射线强度。

公开(公告)号：US20250020601A1

公开(公告)日：2025-01-16

申请号：US18752139

申请日：2024-06-24

Applicant: Malvern Panalytical B.V.

Inventor： Detlef Beckers ,  Alexander Kharchenko ,  Milen Gateshki

IPC: G01N23/20008 ,  A61B6/00 ,  A61B6/40 ,  A61B6/42 ,  G01N23/223 ,  H05G1/52

Abstract: The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 μm. In the second X-ray analysis mode the X-ray source operates at a second operating power that is higher than the first operating power, and the area of the effective focal spot is larger than the area of the effective focal spot in the first X-ray analysis mode.